962 results on '"Yamauchi, Kazuto"'
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202. Development of split-delay x-ray optics using Si(220) crystals at SACLA
203. Optics for coherent X-ray applications
204. Basic Study on Etching Selectivity of Plasma Chemical Vaporization Machining by Introducing Crystallographic Damage into Work Surface
205. Generation of 1020 W cm−2 hard X-ray laser pulses with two-stage reflective focusing system
206. X-ray two-photon absorption competing against single and sequential multiphoton processes
207. High-Resolution Multislice X-Ray Ptychography of Extended Thick Objects
208. Dicing of SiC Wafer by Atmospheric-Pressure Plasma Etching Process with Slit Mask for Plasma Confinement
209. Thinning of a Two-Inch Silicon Carbide Wafer by Plasma Chemical Vaporization Machining Using a Slit Electrode
210. Planarization of the Gallium Nitride Substrate Grown by the Na Flux Method Applying Catalyst-Referred Etching
211. 4H-SiC Planarization Using Catalyst-Referred Etching with Pure Water
212. Investigation of the Barrier Heights for Dissociative Adsorption of HF on SiC Surfaces in the Catalyst-Referred Etching Process
213. Enhancement of photoluminescence efficiency from GaN(0001) by surface treatments
214. Development of Hard X-Ray Split-Delay Optics Based on Si(220) Crystals
215. Global Center of Excellence Review
216. Coherent x-ray zoom condenser lens for diffractive and scanning microscopy
217. Coherent x-ray zoom condenser lens for diffractive and scanning microscopy
218. High-resolution and high-sensitivity phase-contrast imaging by focused hard x-ray ptychography with a spatial filter
219. Bragg x-ray ptychography of a silicon crystal: Visualization of the dislocation strain field and the production of a vortex beam
220. Damage characteristics of platinum/carbon multilayers under X-ray free-electron laser irradiation
221. Thin crystal development and applications for hard x-ray free-electron lasers
222. Fabrication of atomically precise, super smooth, and damage-free x-ray optics
223. Role of Photoelectrochemical Oxidation in Enabling High-Efficiency Polishing of Gallium Nitride
224. Optimization of machining conditions of basic-type CMP/P-CVM fusion processing using SiC substrate.
225. Experimental and simulation study of undesirable short-period deformation in piezoelectric deformable x-ray mirrors
226. An experimental procedure for precise evaluation of electron density distribution of a nanostructured material by coherent x-ray diffraction microscopy
227. High-resolution projection image reconstruction of thick objects by hard x-ray diffraction microscopy
228. Wavefield characterization of nearly diffraction-limited focused hard x-ray beam with size less than 10 nm
229. Three-Dimensional Electron Density Mapping of Shape-Controlled Nanoparticle by Focused Hard X-ray Diffraction Microscopy
230. Three-Dimensional Electron Density Mapping of Shape-Controlled Nanoparticle by Focused Hard X-ray Diffraction Microscopy
231. Termination dependence of surface stacking at 4H-SiC (0001) -1×1: Density functional theory calculations
232. Development of incident X-ray flux monitor for coherent X-ray diffraction microscopy
233. High-resolution diffraction microscopy using the plane-wave field of a nearly diffraction limited focused x-ray beam
234. Direct determination of the wave field of an x-ray nanobeam
235. Element-specific hard x-ray diffraction microscopy
236. Element-specific hard x-ray diffraction microscopy
237. Coherent x-ray diffraction measurements of Cu thin lines
238. Development of high-accuracy X-ray ptychography apparatus
239. Damage characteristics of platinum/carbon multilayers under x-ray free-electron laser irradiation
240. Thin crystal development and applications for hard x-ray free-electron lasers
241. A Precision Grazing-incidence Angle Error Measurement of a Hard X-ray Condenser Mirror Using Single-grating Interferometry
242. Investigation of ablation thresholds of optical materials using 1-µm-focusing beam at hard X-ray free electron laser
243. Nonlinear optical phenomena in ultra-intense X-ray interaction with matter
244. X-ray nanofocusing using a piezoelectric deformable mirror and at-wavelength metrology methods
245. Absolute calibration of optical flats using the three-flat test by considering the relative humidity change
246. Coherent x-ray zoom condenser lens for diffractive and scanning microscopy
247. Bragg x-ray ptychography of a silicon crystal: Visualization of the dislocation strain field and the production of a vortex beam
248. High-resolution and high-sensitivity phase-contrast imaging by focused hard x-ray ptychography with a spatial filter
249. Bias-Assisted Photochemical Planarization of GaN(0001) Substrate with Damage Layer
250. A Bragg beam splitter for hard x-ray free-electron lasers
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