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Development of incident X-ray flux monitor for coherent X-ray diffraction microscopy
- Publication Year :
- 2009
-
Abstract
- Takahashi Y., Kubo H., Furukawa H., et al. Development of incident X-ray flux monitor for coherent X-ray diffraction microscopy. Journal of Physics: Conference Series, 186, , 012060. https://doi.org/10.1088/1742-6596/186/1/012060.<br />9TH INTERNATIONAL CONFERENCE ON X-RAY MICROSCOPY 21–25 July 2008, Zürich, Switzerland<br />An incident X-ray flux monitor for coherent X-ray diffraction microscopy was developed. The intensities of x-rays passing through the sample were measured using an X-ray photodiode, with the simultaneous measurement of the X-ray diffraction intensities of the sample. As a result of the normalization of the X-ray diffraction intensities by the incident X-ray flux determined from the monitor, the fluctuation of the speckle intensities was successfully suppressed. © 2009 IOP Publishing Ltd.
Details
- Database :
- OAIster
- Notes :
- application/pdf, English
- Publication Type :
- Electronic Resource
- Accession number :
- edsoai.on1375187289
- Document Type :
- Electronic Resource