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Development of incident X-ray flux monitor for coherent X-ray diffraction microscopy

Authors :
1000000415217
Takahashi, Yukio
Kubo, Hideto
Furukawa, Hayato
1000010174575
Yamauchi, Kazuto
1000090173864
Matsubara, Eiichiro
1000080159699
Ishikawa, Tetsuya
1000040392063
Nishino, Yoshinori
1000000415217
Takahashi, Yukio
Kubo, Hideto
Furukawa, Hayato
1000010174575
Yamauchi, Kazuto
1000090173864
Matsubara, Eiichiro
1000080159699
Ishikawa, Tetsuya
1000040392063
Nishino, Yoshinori
Publication Year :
2009

Abstract

Takahashi Y., Kubo H., Furukawa H., et al. Development of incident X-ray flux monitor for coherent X-ray diffraction microscopy. Journal of Physics: Conference Series, 186, , 012060. https://doi.org/10.1088/1742-6596/186/1/012060.<br />9TH INTERNATIONAL CONFERENCE ON X-RAY MICROSCOPY 21–25 July 2008, Zürich, Switzerland<br />An incident X-ray flux monitor for coherent X-ray diffraction microscopy was developed. The intensities of x-rays passing through the sample were measured using an X-ray photodiode, with the simultaneous measurement of the X-ray diffraction intensities of the sample. As a result of the normalization of the X-ray diffraction intensities by the incident X-ray flux determined from the monitor, the fluctuation of the speckle intensities was successfully suppressed. © 2009 IOP Publishing Ltd.

Details

Database :
OAIster
Notes :
application/pdf, English
Publication Type :
Electronic Resource
Accession number :
edsoai.on1375187289
Document Type :
Electronic Resource