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Thin hydrogenated amorphous silicon (a-Si:H) films deposited on crystalline silicon (c-Si) surfaces are sensitive probes for the bulk electronic properties of a-Si:H. Here, we use such samples during repeated low-temperature annealing and visible-light soaking to investigate the long-term stability of a-Si:H films. We observe that during annealing the electronic improvement of the interfaces follows stretched exponentials as long as hydrogen evolution in the films can be detected. Once such evolution is no longer observed, the electronic improvement occurs much faster. Based on these findings, we discuss how the reversibility of light-induced defects depends on (the lack of observable) hydrogen evolution.

We explore substoichiometric molybdenum trioxide (MoOx, x

In amorphous/crystalline silicon heterojunction solar cells, optical losses can be mitigated by replacing the amorphous silicon films by wider bandgap amorphous silicon oxide layers. In this article, we use stacks of intrinsic amorphous silicon and amorphous silicon oxide as front intrinsic buffer layers and show that this increases the short-circuit current density by up to 0.43 mA/cm2 due to less reflection and a higher transparency at short wavelengths. Additionally, high open-circuit voltages can be maintained, thanks to good interface passivation. However, we find that the gain in current is more than offset by losses in fill factor. Aided by device simulations, we link these losses to impeded carrier collection fundamentally caused by the increased valence band offset at the amorphous/crystalline interface. Despite this, carrier extraction can be improved by raising the temperature; we find that cells with amorphous silicon oxide window layers show an even lower temperature coefficient than reference heterojunction solar cells (-0.1%/K relative drop in efficiency, compared to -0.3%/K). Hence, even though cells with oxide layers do not outperform cells with the standard design at room temperature, at higher temperatures—which are closer to the real working conditions encountered in the field—they show superior performance in both experiment and simulation.

Excellent amorphous/crystalline silicon interface passivation is of extreme importance for high-efficiency silicon heterojunction solar cells. This can be obtained by inserting hydrogen-plasma treatments during deposition of the amorphous silicon passivation layers. Prolonged hydrogen-plasmas lead to film etching. We report on the defect creation induced by such treatments: A severe drop in interface-passivation quality is observed when films are etched to a thickness of less than 8 nm. Detailed characterization shows that this decay is due to persistent defects created at the crystalline silicon surface. Pristine interfaces are preserved when the post-etching film thickness exceeds 8 nm, yielding high quality interface passivation. (C) 2013 AIP Publishing LLC.

Silicon heterojunction solar cells have record-high open-circuit voltages but suffer from reduced short-circuit currents due in large part to parasitic absorption in the amorphous silicon, transparent conductive oxide (TCO), and metal layers. We previously identified and quantified visible and ultraviolet parasitic absorption in heterojunctions; here, we extend the analysis to infrared light in heterojunction solar cells with efficiencies exceeding 20%. An extensive experimental investigation of the TCO layers indicates that the rear layer serves as a crucial electrical contact between amorphous silicon and the metal reflector. If very transparent and at least 150 nm thick, the rear TCO layer also maximizes infrared response. An optical model that combines a ray-tracing algorithm and a thin-film simulator reveals why: parallel-polarized light arriving at the rear surface at oblique incidence excites surface plasmons in the metal reflector, and this parasitic absorption in the metal can exceed the absorption in the TCO layer itself. Thick TCO layers—or dielectric layers, in rear-passivated diffused-junction silicon solar cells—reduce the penetration of the evanescent waves to the metal, thereby increasing internal reflectance at the rear surface. With an optimized rear TCO layer, the front TCO dominates the infrared losses in heterojunction solar cells. As its thickness and carrier density are constrained by anti-reflection and lateral conduction requirements, the front TCO can be improved only by increasing its electron mobility. Cell results attest to the power of TCO optimization: With a high-mobility front TCO and a 150-nm-thick, highly transparent rear ITO layer, we recently reported a 4-cm2 silicon heterojunction solar cell with an active-area short-circuit current density of nearly 39 mA/cm2 and a certified efficiency of over 22%.

Silicon heterojunction solar cells have high open-circuit voltages thanks to excellent passivation of the wafer surfaces by thin intrinsic amorphous silicon (a-Si:H) layers deposited by plasma-enhanced chemical vapor deposition. We show a dramatic improvement in passivation when H2 plasma treatments are used during film deposition. Although the bulk of the a-Si:H layers is slightly more disordered after H2 treatment, the hydrogenation of the wafer/film interface is nevertheless improved with as-deposited layers. Employing H2 treatments, 4 cm2 heterojunction solar cells were produced with industry-compatible processes, yielding open-circuit voltages up to 725 mV and aperture area efficiencies up to 21. © 2011 American Institute of Physics.

We investigate the performance of hydrogenated indium oxide as a transparent front electrode for micromorph thin-film silicon solar cells on glass. Light trapping is achieved by replicating the morphology of state-of-the-art zinc oxide electrodes, known for their outstanding light trapping properties, via ultraviolet nanoimprint lithography. As a result of the high electron mobility and excellent near-infrared transparency of hydrogenated indium oxide, the short-circuit current density of the cells is improved with respect to indium tin oxide and zinc oxide electrodes. We assess the potential for further current gains by identifying remaining sources of parasitic absorption and evaluate the light trapping capacity of each electrode. We further present a method, based on nonabsorbing insulating silicon nitride electrodes, allowing one to directly relate the optical reflectance to the external quantum efficiency. Our method provides a useful experimental tool to evaluate the light trapping potential of novel photonic nanostructures by a simple optical reflectance measurement, avoiding complications with electrical cell performance.

In silicon heterojunction solar cells, thin amorphous silicon layers passivate the crystalline silicon wafer surfaces. By using in situ diagnostics during plasma-enhanced chemical vapor deposition (PECVD), the authors report how the passivation quality of such layers directly relate to the plasma conditions. Good interface passivation is obtained from highly depleted silane plasmas. Based upon this finding, layers deposited in a large-area very high frequency (40.68 MHz) PECVD reactor were optimized for heterojunction solar cells, yielding aperture efficiencies up to 20.3% on 4 cm2 cells.

The electronic properties of hydrogenated amorphous silicon (a-Si:H) relax following stretched exponentials. This phenomenon was explained in the past by dispersive hydrogen diffusion, or by retrapping included hydrogen motion. In this letter, the authors report that the electronic passivation properties of intrinsic a-Si:H/crystalline silicon (c-Si) interfaces relax following a similar law. Carrier injection dependent a-Si:H∕c-Si interface recombination calculations suggest this originates from amphoteric interface state (or Si dangling bond) reduction, rather than from a field effect. These findings underline the similarity between a-Si:H∕c-Si interface recombination and the electronic properties of a-Si:H bulk material.

Intrinsic hydrogenated amorphous silicon films can yield outstanding electronic surface passivation of crystalline silicon wafers. In this letter the authors confirm that this is strongly determined by the abruptness of the interface. For completely amorphous films the passivation quality improves by annealing at temperatures up to 260°C, most likely by film relaxation. This is different when an epitaxial layer has been grown at the interface during film deposition. Annealing is in such a case detrimental for the passivation. Consequently, the authors argue that annealing followed by carrier lifetime measurements allows determining whether the interface is abrupt.

Heterostructures, such as the crystalline silicon (c-Si)/plasma-enhanced chemical vapor deposited (PECVD) hydrogenated amorphous silicon (a-Si:H) structure, form a possibility in the development of a low recombination rear contact for photovoltaic devices fabricated from p-type c-Si(p) substrates. To find a good compromise between limited charge carrier recombination at the surface and a limited resistivity of the contact, a sandwich structure, such as c-Si(p)∕a-Si:H(i)∕a-Si:H(p+) has been proposed in the past. However, in this letter, we report that whereas a very thin intrinsic a-Si:H layer (∼3nm) may still yield very low values for the surface recombination velocity of low resistivity (0.5–1.5Ωcm) c-Si(p) wafers, the surface passivation properties are lost when this intrinsic film is subsequently covered by a PECVD a-Si:H(p+) layer. This phenomenon suggests that surface recombination does not take place at the c-Si(p)∕a-Si:H(i) interface, but more likely in the defect-rich PECVD a-Si:H(p+) material, by tunneling of minority carriers through the thin a-Si:H(i) layer.

In this article, we report on the use of direct plasma-enhanced chemical vapor deposited silicon nitride (SiNx) films deposited at low excitation frequency (440 kHz) on low-resistivity (1.5 Ω cm) p-type Czochralski silicon substrate surfaces with different textures, to elucidate the influence of microroughness of the substrate surface on the surface-passivating properties of thin SiNx films. Whereas flat surfaces get the best passivation from Si-rich SiNx films, the optimum passivation shifts towards stoichiometric nitride as the microroughness increases, which points to the increasing relative importance of a charge-induced field effect. When short high-temperature (firing) treatments are applied upon passivation layer deposition, the process window to yield good surface passivation broadens, although very Si-rich films tend to suffer from blistering.

This work shows that RF sputter-deposited hydrogenated amorphous silicon (a-Si:H) films are very effective in passivating silicon surfaces. We have previously found that sputter-deposited 45nm thick intrinsic a-Si:H provides outstanding surface passivation on n-type silicon, similar to that achieved by ‘classic’ plasma enhanced chemical vapour deposition [1]. In this paper, we show that p-type silicon surfaces can be well passivated as well, achieving effective carrier lifetimes of 1.1ms for a 1Ω cm p-type wafer, compared to 4.5ms for a 1.5Ω cm n-type sample. Next, on n-type textured surfaces reasonable passivation is also achieved. Post-deposition annealing of our samples shows that sputtered a-Si:H films can perform similarly to PECVD deposited films in terms of thermal stability. Importantly, with stacks of intrinsic and doped (n or p) amorphous silicon effective carrier lifetimes of 1.9ms and 1.6ms on 1.5Ω cm n-type wafers were obtained for i/n+ and i/p+ stacks respectively. These results underline the promise of sputter-deposited a-Si:H as an attractive alternative for heterojunction solar cell fabrication. However, dark conductivity measurements show that sputter-deposited doped a-Si:H films feature a relatively low conductivity, so far. We speculate that this may be caused by differences in microstructure compared to PECVD a-Si:H films, as suggested from the extracted optical band gap values for the respective films.

Ni/Cu plated front contacts are applied to large-area hybrid silicon heterojunction (SHJ) solar cells consisting of a diffused front surface field and intrinsic and boron doped a-Si:H(i/p + ) layers forming the rear SHJ emitter. Nickel silicide front contacts are formed by excimer laser annealing (ELA) which unlike rapid thermal annealing (RTA) is shown to be compatible with a rear SHJ emitter. A top efficiency of 20.1% (externally confirmed at FhG-ISE CalLab), with j sc =39.0 mA/cm 2 , V oc =675.1 mV, and FF=76.5% is obtained on 15.6x15.6 cm 2 n-type Cz-Si in a first trial and this without compromising solder tab adhesion results at the front side. Limitations arising from series resistance at the rear side and from recombination at the front side are discussed.

Damage of the hydrogenated amorphous/crystalline silicon interface passivation during transparent conductive oxide sputtering is reported. This occurs in the fabrication process of silicon heterojunction solar cells. We observe that this damage is at least partially caused by luminescence of the sputter plasma. Following low-temperature annealing, the electronic interface properties are recovered. However, the silicon-hydrogen configuration of the amorphous silicon film is permanently changed, as observed from infra-red absorbance spectra. In silicon heterojunction solar cells, although the as-deposited film's microstructure cannot be restored after sputtering, no significant losses are observed in their open-circuit voltage.

Inserting a dielectric between the absorber and rear metal electrode of a solar cell increases rear internal reflectance by both limiting the transmission cone and suppressing the plasmonic absorption of light arriving outside of the cone. We fabricate rear reflectors with low-refractive-index magnesium fluoride (MgF2) as the dielectric, and with local electrical contacts through the MgF2 layer. These MgF2/metal reflectors are introduced into amorphous silicon/crystalline silicon heterojunction solar cells in place of the usual transparent conductive oxide/metal reflector. An MgF2/Ag reflector yields an average rear internal reflectance of greater than 99.5% and an infrared internal quantum efficiency that exceeds that of the world-record UNSW PERL cell. An MgF2/Al reflector performs nearly as well, enabling an efficiency of 21.3% and a short-circuit current density of nearly 38 mA/cm(2) in a silicon heterojunction solar cell without silver or indium tin oxide at the rear.

Charge carrier collection in silicon heterojunction solar cells occurs via intrinsic/doped hydrogenated amorphous silicon layer stacks deposited on the crystalline silicon wafer surfaces. Usually, both the electron and hole collecting stacks are externally capped by an n-type transparent conductive oxide, which is primarily needed for carrier extraction. Earlier, it has been demonstrated that the mere presence of such oxides can affect the carrier recombination in the crystalline silicon absorber. Here, we present a detailed investigation of the impact of this phenomenon on both the electron and hole collecting sides, including its consequences for the operating voltages of silicon heterojunction solar cells. Based on our findings, we define guiding principles for improved passivating contact design for high-efficiency silicon solar cells.

Thin, light-absorbing films attenuate the Raman signal of underlying substrates. In this article, we exploit this phenomenon to develop a contactless thickness profiling method for thin films deposited on rough substrates. We demonstrate this technique by probing profiles of thin amorphous silicon stripes deposited on rough crystalline silicon surfaces, which is a structure exploited in high-efficiency silicon heterojunction solar cells. Our spatially-resolved Raman measurements enable the thickness mapping of amorphous silicon over the whole active area of test solar cells with very high precision; the thickness detection limit is well below 1 nm and the spatial resolution is down to 500 nm, limited only by the optical resolution. We also discuss the wider applicability of this technique for the characterization of thin layers prepared on Raman/photoluminescence-active substrates, as well as its use for single-layer counting in multilayer 2D materials such as graphene, MoS2 and WS2.

Doped hydrogenated amorphous silicon a-Si:H films of only a few nanometer thin find application in a-Si:H/crystalline silicon heterojunction solar cells. Although such films may yield a field effect at the interface, their electronic passivation properties are often found to be inferior, compared to those of their intrinsic counterparts. In this article, based on H2 effusion experiments, the authors argue that this phenomenon is caused by Fermi energy dependent Si–H bond rupture in the a-Si:H films, for either type of doping. This results in the creation of Si dangling bonds, counteracting intentional doping of the a-Si:H matrix, and lowering the passivation quality. © 2009 American Institute of Physics.

Monolithically integrated two-terminal perovskite/Si tandem solar cells promise to achieve high power conversion efficiency. However, there is a concern that the stability of the perovskite top cell will limit the long-term performance of tandem devices. To investigate the impact of perovskite cell degradation on the photocurrent generation and collection in the individual subcells, we employed light beam induced current mapping to spatially resolve the photocurrent under controlled humidity conditions. The evolution of the device behavior is consistent with the formation of an optically transparent hydrated perovskite phase that allows the bottom Si cell to continue to generate photocurrent at the probing wavelength (532 nm). Additional measurements were performed on perovskite thin films on glass substrates to verify the interpretation.

In amorphous/crystalline silicon heterojunction solar cells, an inversion layer is present at the front interface. By combining numerical simulations and experiments, we examine the contribution of the inversion layer to lateral transport and assess whether this layer can be exploited to replace the front transparent conductive oxide (TCO) in devices. For this, heterojunction solar cells of different areas (2 x 2, 4 x 4, and 6 x 6 mm(2)) with and without TCO layers on the front side were prepared. Laser-beam-induced current measurements are compared with simulation results from the ASPIN2 semiconductor simulator. Current collection is constant across millimeter distances for cells with TCO; however, carriers traveling more than a few hundred microns in cells without TCO recombine before they can be collected. Simulations show that increasing the valence band offset increases the concentration of holes under the surface of n-type crystalline silicon, which increases the conductivity of the inversion layer. Unfortunately, this also impedes transport across the barrier to the emitter. We conclude that the lateral conductivity of the inversion layer may not suffice to fully replace the front TCO in heterojunction devices. (C) 2013 AIP Publishing LLC.

Transition metal oxides (TMOs) are commonly used in a wide spectrum of device applications, thanks to their interesting electronic, photochromic, and electrochromic properties. Their environmental sensitivity, exploited for gas and chemical sensors, is however undesirable for application in optoelectronic devices, where TMOs are used as charge injection or extraction layers. In this work, we first study the coloration of molybdenum and tungsten oxide layers, induced by thermal annealing, Ar plasma exposure, or transparent conducting oxide overlayer deposition, typically used in solar cell fabrication. We then propose a discoloration method based on an oxidizing CO2 plasma treatment, which allows for a complete bleaching of colored TMO films and prevents any subsequent recoloration during following cell processing steps. Then, we show that tungsten oxide is intrinsically more resilient to damage induced by Ar plasma exposure as compared to the commonly used molybdenum oxide. Finally, we show that parasitic absorption in TMO-based transparent electrodes, as used for semitransparent perovskite solar cells, silicon heterojunction solar cells, or perovskite/silicon tandem solar cells, can be drastically reduced by replacing molybdenum oxide with tungsten oxide and by applying a CO2 plasma pretreatment prior to the transparent conductive oxide overlayer deposition.

Substituting the doped amorphous silicon films at the front of silicon heterojunction solar cells with wide-bandgap transition metal oxides can mitigate parasitic light absorption losses. This was recently proven by replacing p-type amorphous silicon with molybdenum oxide films. In this article, we evidence that annealing above 130 degrees C-often needed for the curing of printed metal contacts-detrimentally impacts hole collection of such devices. We circumvent this issue by using electrodeposited copper front metallization and demonstrate a silicon heterojunction solar cell with molybdenum oxide hole collector, featuring a fill factor value higher than 80% and certified energy conversion efficiency of 22.5%. (C) 2015 AIP Publishing LLC.

Highly transparent electrodes with a well-tuned refractive index are essential for a wide range of optoelectronic devices, such as light emitting diodes and solar cells. Here, it is shown that the transparency of ZnO:Al can be improved and its refractive index can be reduced simultaneously by the addition of SiO2 into the layer. It is found that for low SiO2 concentrations, Si quenches oxygen vacancies and improves the layer transparency. At higher SiO2 concentrations a highly transparent amorphous compound of ZnxSiyO:Al forms, with a refractive index that scales down with the relative Si/Zn ratio. These layers are tested in Si heterojunction solar cells by inserting them between Si and the metallic rear contact of such devices. A consistent improvement is found in the cell short-circuit current density and external quantum efficiency with increasing Si incorporation. Our findings establish a general strategy to tune the optical properties of transparent conductive oxides for improved light management in solar cells.

Intrinsic hydrogenated amorphous silicon (a-Si:H) films can yield in outstanding electronic surface passivation of crystalline silicon (c-Si) wafers as utilized in the HIT (heterojunction with intrinsic thin layer) solar cells. We have studied the correlation between the passivation quality and the interface nature between thin amorphous layers and an underlying c-Si substrate for understanding the passivation mechanism. We found that a thin (∼5nm) intrinsic layer is inhomogeneous along the growth direction with the presence of a hydrogen rich layer at the interface and that completely amorphous films result in better passivation quality and device performance than an epitaxial layer. Post annealing improves carrier lifetime for the amorphous layer, whereas the annealing is detrimental for the epitaxial layer. We have also found that the passivation quality of intrinsic a Si:H(i) film deteriorates severely by the presence of a boron-doped a-Si:H(p+) overlayer due to Si-H rupture in the a-Si:H(i) film. Finally, for a passivation layer in the hetero-junction structure, a-Si1−xOx will be demonstrated in comparison with a-Si:H.

We report the results of scanning laser-beam-induced current (LBIC) measurements on silicon heterojunction solar cells that indicate the length scale over which photogenerated carriers are sensitive to local defects at the amorphous silicon/crystalline silicon heterojunction interface. The defects were intentionally created with focused ion beam irradiation, enabling us to study how defects at a predefined and known location affect carrier collection and transport in neighboring regions where the device remains pristine. The characteristic length scale over which carriers in the pristine areas of the device are vulnerable to loss via recombination in the adjacent defective region increases to over 50 mu m as the device is forward biased. For photocarriers generated near the amorphous-crystalline interface, LBIC measurements suggest that lateral transport in the near-junction inversion layer in the c-Si is an important transport mechanism.

The tunable bandgaps and facile fabrication of perovskites make them attractive for multi-junction photovoltaics(1,2). However, light-induced phase segregation limits their efficiency and stability(3-5): this occurs in wide-bandgap (>1.65 electron volts) iodide/bromide mixed perovskite absorbers, and becomes even more acute in the top cells of triple-junction solar photovoltaics that require a fully 2.0-electron-volt bandgap absorber(2,6). Here we report that lattice distortion in iodide/bromide mixed perovskites is correlated with the suppression of phase segregation, generating an increased ion-migration energy barrier arising from the decreased average interatomic distance between the A-site cation and iodide. Using an approximately 2.0-electron-volt rubidium/caesium mixed-cation inorganic perovskite with large lattice distortion in the top subcell, we fabricated all-perovskite triple-junction solar cells and achieved an efficiency of 24.3 per cent (23.3 per cent certified quasi-steady-state efficiency) with an open-circuit voltage of 3.21 volts. This is, to our knowledge, the first reported certified efficiency for perovskite-based triple-junction solar cells. The triple-junction devices retain 80 per cent of their initial efficiency following 420 hours of operation at the maximum power point.

Silicon heterojunction solar cells critically depend on the detailed properties of their amorphous/crystalline silicon interfaces. We report here on the use of attenuated total reflectance Fourier-transform infrared (ATR-FTIR) spectroscopy to gain precise insight into the vibrational properties of the surfaces and ultrathin layers present in such solar cells. We fabricate ATR prisms from standard silicon wafers similar to those used for device fabrication. In this fashion, we acquire very-high sensitivity FTIR information on device-relevant structures. Our method has no requirement for minimum layer thickness, enabling the study of the impact of the different fabrication process steps on the film microstructure. We discuss the necessary requirements for the method implementation and give a comprehensive overview of all observed vibration modes. In particular, we study vibrational signatures of Si-H-X, Si-H-X(SiYOZ), B-H, hydroxyl groups, and hydrocarbons on the Si(111) surface. We observe subtle effects in the evolution of the chemical state of the surface during sample storage and process-related wafer handling and discuss their effect on the electronic properties of the involved interfaces. (C) 2015 AIP Publishing LLC.

Multijunction cells may offer a cost-effective route to boost the efficiency of industrial photovoltaics. For any technology to be deployed in the field, its performance under actual operating conditions is extremely important. In this perspective, we evaluate the impact of spectrum, light intensity, and module temperature variations on the efficiency of tandem devices with crystalline silicon bottom cells with a particular focus on perovskite top cells. We consider devices with different efficiencies and calculate their energy yields using field data from Denver. We find that annual losses due to differences between operating conditions and standard test conditions are similar for single-junction and four-terminal tandem devices. The additional loss for the two-terminal tandem con- figuration caused by current mismatch reduces its performance ratio by only 1.7% when an optimal top cell bandgap is used. Additionally, the unusual bandgap temperature dependence of perovskites is shown to have a positive, compensating effect on current mismatch.

Parasitic absorption in the transparent conductive oxide (TCO) front electrode is one of the limitations of silicon heterojunction (SHJ) solar cells efficiency. To avoid such absorption while retaining high conductivity, TCOs with high electron mobility are preferred over those with high carrier density. Here, we demonstrate improved SHJ solar cell efficiencies by applying high-mobility amorphous indium zinc oxide ( a -IZO) as the front TCO. We sputtered a -IZO at low substrate temperature and low power density and investigated the optical and electrical properties, as well as subband tail formation—quantified by the Urbach energy ( $E_{U}$ )–as a function of the sputtering oxygen partial pressure. We obtain an $E_{U}$ as low as 128 meV for films with the highest Hall mobility of 60 cm2/V · s. When comparing the performance of a -IZO films with indium tin oxide (ITO) and hydrogenated indium oxide (IO:H), we find that IO:H (115 cm2 /V · s) exhibits a similar $E_{U}$ of 130 meV, while ITO (25 cm2/V · s) presents a much larger $E_{U}$ of up to 270 meV. The high film quality, indicated by the low $E_{U}$ , the high mobility, and low free carrier absorption of the developed a -IZO electrodes, result in a significant current improvement, achieving conversion efficiencies over 21.5%, outperforming those with standard ITO.

Silicon heterojunction solar cells enable high conversion efficiencies, thanks to their passivating contacts which consist of layered stacks of intrinsic and doped amorphous silicon. However, such contacts may reduce the photo current, when present on the illuminated side of the cell. This motivates the search for wider bandgap contacting materials, such as metal oxides. In this paper, we elucidate the precise impact of the material parameters of MoO x on device characteristics, based on numerical simulations. The simulation results allow us to propose design principles for hole-collecting induced junctions. We find that if MoOx has a sufficiently high electron affinity ( $\geq \text{{5.7 eV}}$ ), direct band-to-band tunneling is the dominant transport mechanism; whereas if it has a lower electron affinity ( $ ), trap-assisted tunneling dominates, which might introduce additional series resistance. At even lower electron affinity, S-shaped J–V curves may appear for these solar cells, which are found to be due to an insufficient trap state density in the MoOx film in contrast to the expectation of better performance at low trap density. These traps may assist carrier transport when present near the conduction band edge of the MoOx film. Our simulations predict that performance optimization for the MoOx film has to target either 1) a high electron affinity and a moderate doping density film or, 2) if the electron affinity is lower than the optimum value, a high defect density not exceeding the doping density inside the film.

Imperfect internal reflectance of near-bandgap light reduces the performance of all solar cells, and becomes increasingly detrimental as absorbers become thinner. We consider light incident on the silicon/dielectric/metal structure at the back of rear-passivated crystalline silicon solar cells with surface textures that are large enough for geometric optics. By calculating the absorbance in the metal as a function of the angle of incidence, we discover three results that are important for understanding and improving rear reflectors in many types of solar cells. First, significant parasitic absorption occurs in the metal layer in two cases: s- and p-polarized propagating modes (near-normal angles of incidence) when the dielectric thickness is adjusted to cause destructive interference of the reflected beams, and p-polarized evanescent modes (angles of incidence above the semiconductor/dielectric critical angle) that excite surface plasmon polaritons at the metal surface. Second, the latter loss dominates; a well-designed rear dielectric passivation layer must suppress the penetration of evanescent waves to the metal. Third, when used as an input in a simple analytical model, the average rear internal reflectance calculated by assuming a Lambertian angular distribution of light accurately predicts the total reflectance and absorbance of a solar cell.

Owing to the wide application of metal oxides in energy conversion devices, the fabrication of these oxides using conventional, damage-free, and upscalable techniques is of critical importance in the optoelectronics community. Here, the authors demonstrate the growth of hydrogenated amorphous gallium oxide (a-GaOx:H) thin-films by plasma-enhanced chemical vapor deposition (PECVD) at temperatures below 200 °C. In this way, conformal films are deposited at high deposition rates, achieving high broadband transparency, wide band gap (3.5–4 eV), and low refractive index (1.6 at 500 nm). The authors link this low refractive index to the presence of nanoscale voids enclosing H2, as indicated by electron energy-loss spectroscopy. This work opens the path for further metal-oxide developments by low-temperature, scalable and damage-free PECVD processes.

We investigated Si nanowires (SiNWs) fabricated by wet etching and chemical vapor deposition (CVD), and core-shell structures, formed by depositing silicon layers around the SiNWs, with respect to their crystallinity, the doping level, and the influence of surface passivation on carrier lifetime. The effects expected to be critical to improve the performance of nanowire-based solar cells are discussed. ©2010 IEEE.

Silicon heterojunction (SHJ) solar cells feature amorphous silicon passivation films, which enable very high voltages. We report how such passivation increases with operating temperature for amorphous silicon stacks involving doped layers and decreases for intrinsic-layer-only passivation. We discuss the implications of this phenomenon on the solar cell's temperature coefficient, which represents an important figure-of-merit for the energy yield of devices deployed in the field. We show evidence that both open-circuit voltage (V-oc) and fill factor (FF) are affected by these variations in passivation and quantify these temperature-mediated effects, compared with those expected from standard diode equations. We confirm that devices with high V-oc values at 25 degrees C show better high-temperature performance. However, we also argue that the precise device architecture, such as the presence of charge-transport barriers, may affect the temperature-dependent device performance as well.