151. Epitaxial KNbO3:Yb3+,Er3+ nanopattern for enhanced upconversion photoluminescence.
- Author
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Park, Heeyeon, Lee, Kyu-Tae, Kwon, Soon-Hong, Ahn, In Hwan, Kim, Byunghoon, Ko, Doo-Hyun, and Kim, Woong
- Subjects
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PHOTON upconversion , *NANOIMPRINT lithography , *LIGHT absorption , *PHOTOLUMINESCENCE , *OPTICAL properties , *SOL-gel processes - Abstract
Nanopatterned epitaxial films of upconversion (UC) materials are desirable for various applications such as display lighting, waveguides, and optical imaging. In this study, we demonstrate that a nanopatterned epitaxial film of a UC material can be fabricated by combining a sol–gel process and nanoimprint lithography. An epitaxial KNbO 3 :Yb3+,Er3+ film is grown on a lattice-matched SrTiO 3 single-crystal substrate, which exhibits an approximately 70 times enhanced UC photoluminescence (PL) intensity compared to that of a non-epitaxial KNbO 3 :Yb3+,Er3+ film grown on a Si substrate. Moreover, the introduction of a nanopattern enhances the UCPL intensity ∼20 times compared to that of a planar film with the same volume of material. Our study paves the way for a better fundamental understanding and expansion in the application of UC materials. Image 1 • Dopant site and concentration influences the crystallinity and optical properties. • Epitaxial KNbO 3 :Yb3+,Er3+ films can be successfully grown via a sol gel process. • Nanopatterns of KNbO 3 :Yb3+,Er3+ can be fabricated with nanoimprint lithography. • High crystallinity of the epitaxial film significantly enhances the UCPL intensity. • Nanopatterns greatly improve light absorption and extraction efficiency. [ABSTRACT FROM AUTHOR]
- Published
- 2020
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