151. Fabrication using x-ray nanolithography and measurement of Coulomb blockade in a variable-sized quantum dot
- Author
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Dimitri A. Antoniadis, Henry I. Smith, Terry P. Orlando, K. W. Rhee, Martin Burkhardt, Michael R. Melloch, and Martin C. Peckerar
- Subjects
Fabrication ,Condensed matter physics ,business.industry ,Quantum point contact ,General Engineering ,Coulomb blockade ,Condensed Matter::Mesoscopic Systems and Quantum Hall Effect ,Nanolithography ,Quantum dot laser ,Quantum dot ,Optoelectronics ,business ,Quantum ,Lithography - Abstract
We report on the fabrication and measurement of a novel type of quantum dot device in which the shape and size of the dot can be controlled. The device consists of four uniformly spaced quantum point contacts which can be biased to produce quantum dots ranging in size from 600 nm to below 200 nm. The capacitances of the gates controlling the dot are small. Measurements were made at a temperature of 0.3 K for three different dot sizes. Devices were fabricated in three lithography steps, with x‐ray nanolithography used to define the final gate layer. The device exhibits conductance maxima whose spacing depends on which quantum point contacts are used to define the quantum dot.
- Published
- 1994