101. (Invited) Nanoscale Probing of Field-Driven Ion Migration in TaOx for Neuromorphic Memristor Applications
- Author
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Atsushi Tsurumaki-Fukuchi, Hiromichi Ohta, Yasuo Takahashi, Masashi Arita, and Takayoshi Katase
- Subjects
Materials science ,business.industry ,Flatness (systems theory) ,technology, industry, and agriculture ,Electrical breakdown ,Surface finish ,Memristor ,Conductive atomic force microscopy ,Amorphous solid ,Pulsed laser deposition ,law.invention ,law ,Optoelectronics ,Thin film ,business - Abstract
Stable operations as resistive switching memory were demonstrated in amorphous TaOx (a-TaOx) thin films with very flat surfaces by conductive atomic force microscopy (c-AFM). The a-TaOx thin films fabricated on glass and Nb-doped SrTiO3 substrates by pulsed laser deposition showed high surface flatness with root-mean-square roughness of less than 0.2 nm. The c-AFM observations on the surfaces revealed that the resistive switching in a-TaOx causes almost no change in the topographic structures, and the significant structural deformation appears after the electrical breakdown by longer-range migration of the constituent ions. The possible mechanisms of the resistive switching phenomena were discussed based on the changes in the topographic structures and conduction states.
- Published
- 2021