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110. A ribonucleotide reductase gene involved in a p53-dependent cell-cycle checkpoint for DNA damage

113. Role of the Ionicity in Defect Formation in Hf-Based Dielectrics

114. Theoretical Studies on Fermi Level Pining of Hf-Based High-k Gate Stacks Based on Thermodynamics

115. Vacancy-Type Defects in MOSFETs with High-k Gate Dielectrics Probed by Monoenergetic Positron Beams

116. Improvement in Fermi-Level Pinning of p-MOS Metal Gate Electrodes on HfSiON by Employing Ru Gate Electrodes

118. Theoretical Studies on Metal/High-k Gate Stacks

119. Tight Distribution of Dielectric Characteristics of HfSiON in Metal Gate Devices

121. Effect of Annealing on Electronic Characteristics of HfSiON Films fabricated by Damascene Gate Process

126. (Invited) Negatively Charged Defects Generated by Rare-Earth Materials Incorporation into HfO2 and the Impact on the Gate Dielectrics Reliability

129. Electron Tunneling Between Si Quantum Dots and Two Dimensional Electron Gas under Optical Excitation at Low Temperatures

130. Si Nanowire FET Technology

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