101. Fabrication and Characterization of 3C-SiC-Based MOSFETs
- Author
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Michael Krieger, Hiroyuki Nagasawa, Adolf Schöner, Masayuki Abe, and Gerhard Pensl
- Subjects
Condensed matter physics ,Chemistry ,Bar (music) ,business.industry ,Process Chemistry and Technology ,Transistor ,Surfaces and Interfaces ,General Chemistry ,law.invention ,chemistry.chemical_compound ,Capacitor ,Semiconductor ,Hall effect ,law ,MOSFET ,Silicon carbide ,Field-effect transistor ,business - Abstract
In this article, the electrical properties of 3C-SiC are described and its potential for metal-oxide semiconductor field-effect transistors (MOSFETs) is demonstrated. The density of traps, D IT , at the interface of 3C-SiC/SiO 2 capacitors is determined by the conductance method subsequent to various processing steps; the origin of the interface traps is discussed. Lateral and vertical 3C-SiC MOSFET devices of varying cell and device size are designed with hexagonal and squared cell geometry, and are fabricated side by side with MOS Hall bar structures. The electrical parameters of the MOSFETs are determined, and the free electron areal density and Hall mobility are measured in the channel of the MOS Hall bar structures. Based on the charge-sheet model, D IT is also obtained from the Hall investigations.
- Published
- 2006
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