51. Phase diffraction gratings based on a Si(400) crystal
- Author
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Dmitry Irzhak, Dmitry Roshchupkin, S. L. Shabel’nikova, and Alexander Firsov
- Subjects
Diffraction ,Materials science ,business.industry ,Physics::Optics ,Acousto-optics ,Grating ,Isotropic etching ,Surfaces, Coatings and Films ,Crystal ,Optics ,Optoelectronics ,Selected area diffraction ,business ,Diffraction grating ,Electron backscatter diffraction - Abstract
The X-ray optical properties of diffraction gratings fabricated on the basis of a Si(400) crystal with a period of D = 1 μm are studied by triple-crystal X-ray diffractometry. The diffraction gratings are manufactured both by silicon profiling during the process of plasma chemical etching and by forming a phase-shift grating on the surface of a Si crystal. The principal difference in the diffraction properties of these gratings is demonstrated. The presence of an Au phase-shift grating is shown to lead to the formation of a two-dimensional diffraction pattern, whereas Si profiling leads to the formation of only a one-dimensional diffraction pattern.
- Published
- 2013