Search

A common device geometry for measuring the electrical characteristics of organic semiconductors is the thin-film organic field-effect transistor (OTFT). Mostly for reasons of cost, convenience, and availability, this usually involves depositing the organic material on a prefabricated gate structure such as Si/SiO2, the surface chemistry of which is often modified with self-assembled monolayers. The interactions between these surfaces and the deposited organic can have a profound effect on thin-film growth and the resulting electrical characteristics since most of the charge transport in these structures occurs near the organic-insulator interface. An alternative to this traditional technique is to assemble the transistor on top of the organic semiconductor. We have used chemical-vapor deposition of the polymeric dielectric material parylene to create pentacene OTFTs with gate electrodes both on top of and below the semiconductor film, with field-effect mobilities as high as 0.1 cm2/V s and Ion/Ioff ratios greater than 106 in the top-gated OTFTs. Comparing the electronic properties of top- and bottom-gate structures yields insight into the charge transport characteristics as well as the effects of device geometry, contacts, and surface roughness of the organic thin film. [ABSTRACT FROM AUTHOR]

We report structural and electrical properties in thin films of an n-channel organic semiconductor, N,N′-dipentyl-3,4,9,10-perylene tetracarboxylic dimide (PTCDI–C5). The structure of polycrystalline thin films of PTCDI–C5 was studied using x-ray diffraction and atomic force microscopy. Films order with single crystal-like packing, and the direction of π-π overlap is in the substrate plane. Organic thin film transistors (OTFTs) based on PTCDI–C5 were fabricated on hydrophobic and hydrophilic substrates. OTFTs showed effective mobility as high as 0.1 cm2/V s. Contact resistance of operating OTFTs was studied using resistance versus length plots and a four-probe method for three different contact metals (Au, Ag, Ca). Typical OTFTs had a specific contact resistance of 8×104 Ω cm at high gate voltage. There was no dependence of contact resistance with contact metal. Variable temperature measurements revealed that film resistance in the OTFT was activated in the temperature range 100–300 K, with typical activation energies of 60–80 meV. Contact resistance showed similar activated behavior, implying that the Schottky barrier at the contact is not the limiting resistance for the contact. Film resistance data showed a Meyer–Neldel relationship with characteristic energy EMN=20–25 meV, for various samples. The common TFT instability of threshold voltage shift (TVS) was observed in PTCDI–C5 OTFTs. A model is proposed to explain positive TVS in gate bias stress and oxygen exposure experiments. The model is based on the formation of a metastable complex between PTCDI–C5 and oxygen, which creates a deep acceptor-like trap state. © 2004 American Institute of Physics. [ABSTRACT FROM AUTHOR]

Complementary organic inverters were fabricated by inkjet patterning of both the metal contacts and the semiconductors. Bottom-gate, bottom-contact organic thin-film transistors with Ta2O5-polymer bilayer dielectrics, inkjet-printed silver electrodes, and inkjet-printed organic semiconductors exhibit hole and electron mobilities as high as ∼10-2 cm2/V s. Complementary inverters based on these transistors operate in ambient and exhibit a gain of -4.4 with supply voltage VDD=+20 V and -3 dB cutoff at 100 kHz with a load of 0.02 pF. The electrical stability of the inverters was evaluated for analog and digital operation, and a noise margin ≥1.1 V at VDD=+15 V was measured with bias-stress effects included. [ABSTRACT FROM AUTHOR]

The effects of x-ray irradiation on the electrical performance of organic thin film transistors (OTFTs) have been examined up to equivalent lifetime doses for medical digital x-ray imaging backplanes. Transistor performance metrics have been assessed before and after exposures up to 500 Gy for bottom-gate, bottom-contact OTFTs of p-channel polytriarylamine and polyfluorene semiconductors. There is no discernible degradation in device performance for either material and no indication of the creation of additional trap states. In situ measurements indicate that x-ray exposure tends to reverse undesirable shifts in the threshold voltage due to prolonged atmospheric exposure and bias stress. [ABSTRACT FROM AUTHOR]