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Your search keyword '"*PHOTOMASK manufacturing"' showing total 2 results
Start Over Descriptor "*PHOTOMASK manufacturing" Topic standards
2 results on '"*PHOTOMASK manufacturing"'

1. Is it time to switch to OASIS.MASK?

Author

MOREY-CHAISEMARTIN, PHILIPPE and BRAULT, FREDERIC

Subjects
*STANDARDS, *PHOTOMASKS, *DATABASES, *INTEGRATED circuits, *PHOTOMASK manufacturing
Abstract

The article reports on the introduction of the Open Artwork System Interchange Standard (OASIS).MASK standard to deal the requirements particular to photomask layout representation. OASIS.MASK introduces constraints that reflect mask manufacturing's real-world limitations. The OASIS.MASK file is the layout description based on the topology, while a design database is a description based on the functions applied in a chip.

Published
2015

2. Mask rule standards: A baby step for DfM.

Author

Mason, Mark

Subjects
*STANDARDS, *MASKS (Electronics), *INTEGRATED circuit design, *FACTORIES, *MANUFACTURING processes, *PHOTOMASK manufacturing
Abstract

Features the standardized mask design rules (MDR) for the manufacturing of integrated circuits. Challenges facing a photomask manufacturing facility; Definition of MDR; Tools utilized by the mask manufacturing process.

Published
2006

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