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Mask rule standards: A baby step for DfM.

Authors :
Mason, Mark
Source :
Microlithography World. May2006, Vol. 15 Issue 2, p4-8. 4p.
Publication Year :
2006

Abstract

Features the standardized mask design rules (MDR) for the manufacturing of integrated circuits. Challenges facing a photomask manufacturing facility; Definition of MDR; Tools utilized by the mask manufacturing process.

Subjects

Subjects :
*STANDARDS
*MASKS (Electronics)
*INTEGRATED circuit design
*FACTORIES
*MANUFACTURING processes
*PHOTOMASK manufacturing

Details

Language :
English
ISSN :
1074407X
Volume :
15
Issue :
2
Database :
Academic Search Index
Journal :
Microlithography World
Publication Type :
Periodical
Accession number :
21068792

Tools

Authors Abstract Subjects Details