1. Fabrication of patterned magnetic nanodots by laser interference lithography
- Author
-
J. C. Lodder, H.A.G.M. van Wolferen, Leon Abelmann, and R. Murillo
- Subjects
Materials science ,business.industry ,technology, industry, and agriculture ,Photoresist ,TST-LIL: Laser Interference Lithography ,Condensed Matter Physics ,SMI-TST: From 2006 in EWI-TST ,Atomic and Molecular Physics, and Optics ,Surfaces, Coatings and Films ,Electronic, Optical and Magnetic Materials ,law.invention ,SMI-MAT: MATERIALS ,Optics ,Anti-reflective coating ,Etching (microfabrication) ,law ,Patterned media ,Nanodot ,TST-uSPAM: micro Scanning Probe Array Memory ,Electrical and Electronic Engineering ,Photolithography ,Magnetic force microscope ,business ,Lithography - Abstract
A method of fabrication of patterned magnetic nanodots by means of laser interference lithography is presented. This method includes the use of a diluted positive photoresist, and modifcations in the etching angle and acceleration voltage of the ion beam etching process. Vertical standing waves were suppressed by using a high exposure dose (supra-exposure) instead of an antireflective coating. Field dependent magnetic force microscopy was used to measure the switching field distribution, which was found to range from 80 to 192 kA/m.
- Published
- 2005
- Full Text
- View/download PDF