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Extreme ultraviolet (EUV) lithography is a promising candidate for next-generation lithography. To achieve an 11-nm node, a six-mirror EUV projection objective with a numerical aperture (NA) of 0.5 is designed with the grouping design method. In this design, pupil obscuration is introduced to decrease the angular spread on the mirrors, which still makes the six-mirror objective with aspheric surfaces sufficient for aberration correction. The grouping design allocates the complexity of designing a whole system to each of the mirror groups and could compatibly apply to designing EUV projection objectives with obscuration. The x8 reduction design serves as an example for illustrating the grouping design principles for this type of system. In addition, the specific design forms with different reductions are presented and discussed. Design of these six-mirror objective systems provides potential solutions for 11-nm node EUV lithography. [ABSTRACT FROM AUTHOR]

In this paper, we develop a model-based color halftoning method using the direct binary search (DBS) algorithm. Our method strives to minimize the perceived error between the continuous tone original color image and the color halftone image. We exploit the differences in how the human viewers respond to luminance and chrominance information and use the total squared error in a luminance/chrominance based space as our metric. Starting with an initial halftone, we minimize this error metric using the DBS algorithm. Our method also incorporates a measurement based color printer dot interaction model to prevent the artifacts due to dot overlap and to improve color texture quality. We calibrate our halftoning algorithm to ensure accurate colorant distributions in resulting halftones. We present the color halftones which demonstrate the efficacy of our method. [ABSTRACT FROM AUTHOR]

The article cites the printing of the book "Plans, Sections, Elevations and Details of the Alhambra," by Owen Jones and Jules Goury. The book was considered a landmark work, both in the history of architectural books and in the development of color printing. The successful printing of the book was believed to establish the name of British architect Owen Jones as an authority upon Moorish architecture and as a pioneer in the new technique of chromolithographic printing. The circumstances behind Jones' unusual sidestep into the role of printer are also investigated.

The author offers his view on an article written by Paul Lindström about Delta-E color in printing and its measurement devices. He argues that the article's conclusion that the printing industry should stick to Delta E*ab is wrong. He points out that a print job is out of tolerance when it exceeds Delta E 5, thus, it does not matter whether the formula is a bit better or worse in the region above 5. He assesses that measuring the same color with two different devices often produce two different results. He stresses that when the devices are of different models or brands, the difference can be even greater.