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The effect of EUV modification of WC-Co indexable knives on the tool life during particleboard milling. The paper presents the results of lifetime tests of WC-Co composite blades after modification of their flank surfaces using intense pulses of extreme ultraviolet (EUV). Wear tests consisting in milling a three-layer particleboard with constant cutting parameters were carried out on a CNC machining center. A statistically insignificant increase in the lifetime of modified tools was demonstrated, as well as an inversely proportional relationship with the duration of the EUV pulses. The EUV modification increased the coefficient of variation in the lifetime of WC-Co indexable knives.

A near 1-keV photons from the Xe/He plasma produced by the interaction of laser beam with a double stream gas puff target were employed for studies of L absorption edges of period 4 transitional metals with atomic number Z from 26 to 30. The dual-channel, compact NEXAFS system was employed for the acquisition of the absorption spectra. L1–3 absorption edges of the samples were identified in transmission mode using broadband emission from the Xe/He plasma to show the applicability of such source and measurement system to the NEXAFS studies of the transition metals, including magnetic materials.

Polyetheretherketone (PEEK), due to its excellent mechanical and physico-chemical parameters, is an attractive substitute for hard tissues in orthopedic applications. However, PEEK is hydrophobic and lacks surface-active functional groups promoting cell adhesion. Therefore, the PEEK surface must be modified in order to improve its cytocompatibility. In this work, extreme ultraviolet (EUV) radiation and two low-temperature, EUV induced, oxygen and nitrogen plasmas were used for surface modification of polyetheretherketone. Polymer samples were irradiated with 100, 150, and 200 pulses at a 10 Hz repetition rate. The physical and chemical properties of EUV and plasma modified PEEK surfaces, such as changes of the surface topography, chemical composition, and wettability, were examined using atomic force microscopy (AFM), scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), and goniometry. The human osteoblast-like MG63 cells were used for the analysis of cell viability and cell adhesion on all modified PEEK surfaces. EUV radiation and two types of plasma treatment led to significant changes in surface topography of PEEK, increasing surface roughness and formation of conical structures. Additionally, significant changes in the chemical composition were found and were manifested with the appearance of new functional groups, incorporation of nitrogen atoms up to ~12.3 at.% (when modified in the presence of nitrogen), and doubling the oxygen content up to ~25.7 at.% (when modified in the presence of oxygen), compared to non-modified PEEK. All chemically and physically changed surfaces demonstrated cyto-compatible and non-cytotoxic properties, an enhancement of MG63 cell adhesion was also observed.

This work is to study the relationship between the exposure conditions and the quality of cell imaging with soft X-ray contact microscopy (SXCM). It is a crucial step in the efficient visualization of cell structures. Three different human cell lines: DU145 prostate carcinoma cells, HCC38 breast cancer cells, and Poietics mesenchymal stem cells were used to establish the optimal exposure conditions in SXCM. The image quality depended on the soft X-ray (SXR) absorbed energy and photoresist development conditions. At lower SXR energy (200 or 400 SXR pulses), sharp cell edges, membrane projections, and cell&ndash, cell connections were visible. In contrast, higher energy (600 or 800 SXR pulses) allowed observation of the cytoskeleton and the nucleus in a cell type-dependent manner (the influence of cell thickness and internal complexity was noted).

In this work, the effect of extreme ultraviolet (EUV) radiation and the combination of EUV radiation and low-temperature nitrogen plasma on the physico-chemical properties of polyetheretherketone (PEEK) surfaces were presented. The laser-plasma EUV source based on a double gas puff target was used in this experiment to irradiate PEEK surfaces with nanosecond pulses of EUV radiation and to produce low-temperature plasma through the photoionization of nitrogen with EUV photons. The changes in surface morphology on irradiated polymer samples were examined using atomic force microscopy (AFM) and scanning electron microscopy (SEM). Chemical changes of the PEEK surfaces were analysed using X-ray photoelectron spectroscopy (XPS). EUV radiation and nitrogen plasma treatment caused significant changes in the topography of modified PEEK&rsquo, s surfaces and an increase in their average roughness. Strong chemical decomposition, appearance of new functional groups as well as incorporation of nitrogen atoms up to ~17 at.% on the PEEK&rsquo, s surface were observed.

A standard Fricke dosimeter was used to measure the absorbed dose via the oxidation yields of Fe3+ ions in an aqueous environment induced by soft X rays within the "water window" spectral range. We also exploited the property of a neutral solution containing terephthalic acid as a tool for selective detection of OH radicals. Both dosimetric systems were irradiated using the experimental pulsed laser-plasma soft X-ray source as well as conventional 1.25-MeV gamma rays. Radiation chemical yields of Fe3+ ions and OH radicals were determined to be (5.13 ± 0.94) × 10-1 µmol·J-1 (4.95 ± 0.91 100eV-1) and (2.33 ± 0.35) × 10-2 µmol·J-1 (0.23 ± 0.03 100eV-1), respectively. Measurements were supported by Monte Carlo simulations to estimate the linear energy transfer of the water window radiation. The simulation results are in good agreement with expected linear energy transfer of ions inducing the same Fe3+ ion and OH radical radiation chemical yield.

Over the last decades, remarkable efforts have been made to improve the resolution in photon-based microscopes. The employment of compact sources based on table-top laser-produced soft X-ray (SXR) in the “water window” spectral range (λ = 2.3–4.4 nm) and extreme ultraviolet (EUV) plasma allowed to overcome the limitations imposed by large facilities, such as synchrotrons and X-ray free electron lasers (XFEL), because of their high complexity, costs, and limited user access. A laser-plasma double stream gas-puff target source represents a powerful tool for microscopy operating in transmission mode, significantly improving the spatial resolution into the nanometric scale, comparing to the traditional visible light (optical) microscopes. Such an approach allows generating the plasma efficiently, without debris, providing a high flux of EUV and SXR photons. In this review, we present the development and optimization of desktop imaging systems: a EUV and an SXR full field microscope, allowing to achieve a sub-50 nm spatial resolution with short exposure time and an SXR contact microscope, capable to resolve internal structures in a thin layer of sensitive photoresist. Details about the source, as well as imaging results for biological applications, will be presented and discussed.

We present a near edge X-ray fine structure (NEXAFS) spectromicroscopy, that was developed based on a compact laboratory laser-plasma soft X-ray light source. The presented approach to spectromicroscopy is different from the usual synchrotron-based one when the series of full-field microscopy images are obtained at different energies. Herein, spatially localized NEXAFS spectra are obtained using a broad-band SXR emission, and the microscopic image is obtained by a raster scanning. The plasma is formed by the interaction of nanosecond laser pulses with a double stream gas puff target. The laser plasma source was optimized for efficient soft X-ray emission from a krypton plasma in the range ~2 nm to 5 nm wavelength radiation (energy of ~250 eV – 620 eV). This emission is used to acquire simultaneously emission and absorption spectra of soft X-ray light from the source and from the investigated sample. The spectra were acquired from a small area of PET polymer ~30 × 30 μm2 in size. A raster scanning was implemented to obtain 2-D elemental composition maps. A chemical (elemental) composition of EUV-irradiated PET was investigated. The data are in agreement with the reference measurements and the theoretical values. EUV irradiated PET spectra are showing hydrogen decrease in the PET structure due to the EUV irradiation. In the paper, a detailed information about the source, the system, the spectral measurements and the results are presented and discussed.

We present optical coherence tomography (OCT) with 2 nm axial resolution using broadband soft X-ray radiation (SXR) from a compact laser plasma light source. The laser plasma was formed by the interaction of nanosecond laser pulses with a gaseous target in a double stream gas puff target approach. The source was optimized for efficient SXR emission from the krypton/helium gas puff target in the 2 to 5 nm spectral range, encompassing the entire “water-window” spectral range from 2.3 nm to 4.4 nm wavelength. The coherence parameters of the SXR radiation allowed for the OCT measurements of a bulk multilayer structure with 10 nm period and 40% bottom layer thickness to period ratio, with an axial resolution of about 2 nm and detect multilayer interfaces up to a depth of about 100 nm. The experimental data are in agreement with OCT simulations performed on ideal multilayer structure. In the paper, detailed information about the source, its optimization, the optical system, OCT measurements and the results are presented and discussed.

Characterization of Xe emission in the spectral range between 1 and 1.5 keV is presented in the case when the laser-plasma is generated by nanosecond laser pulse irradiation of a double stream Xe/He gas-puff target. Gas target density was estimated using extreme ultraviolet (EUV) radiography. Emission spectral characteristics in the wavelength range from 0.8 to 5.2 nm were determined by using a flat field SXR spectrometer. Significant emission was recorded in two high-energy bands, the first one at wavelengths 0.8–1.6 nm (photon energy range 0.78–1.5 keV) and the second one at 1.6–2.5 nm (0.5–0.78 keV). Both plasma size and photon yield in each band were measured separately to individually assess radiation and source characteristics. Moreover, a proof-of-principle experiment for near-edge X-ray absorption fine structure spectroscopy of metallic sample near the L2,3 absorption edge was performed to show one of the applicability areas of such a compact source.

Laser plasma sources of soft X-rays and extreme ultraviolet (EUV) have been developed for application in various fields of science and technology. The sources are based on a gas puff target irradiated with a nanosecond laser pulse. The targets are created using an electromagnetic valve system equipped with a double-nozzle. The valve system, which is supplied with two different gases, produces a double-stream gas puff target which consists of an elongated stream of high-Z gas surrounded by a stream of low-Z gas. The double-stream gas puff target approach secures high conversion efficiency of laser energy into soft X-ray and EUV energy without degradation of the nozzle. The targets are irradiated with laser pulses produced by commercial Nd:YAG lasers (EKSPLA) with a duration of 1 ns to 10 ns, energy in the pulse from 0.5 J to 10 J with a repetition of 10 Hz. The sources have been applied in various fields, including metrology, processing of materials, nanoimaging, radiography and tomography, photoionized plasma studies, and radiobiology. In this paper the recent results on application of the sources in X-ray absorption spectroscopy and optical coherence tomography (OCT) are presented. The use of the source in laboratory systems for the near-edge X-ray absorption fine structure (NEXAFS) spectroscopy is demonstrated. The NEXAFS system was applied for 2-D elemental mapping of EUV-modified polymer samples. A single-shot exposure NEXAFS spectroscopy is presented. Application of the source in X-ray optical coherence tomography (XCT) has been also demonstrated. The preliminary results on XCT imaging of Mo/Si multilayers with 2 nm axial resolution, using broad-band soft X-ray emission, are presented.

New instruments and methods for nanoimaging with the use of a compact laser plasma soft X-ray source are presented. The source is based on a double-stream gas puff target irradiated with nanosecond laser pulses from a Nd:YAG laser. Three imaging instruments, operating in the soft X-ray ‘water window’ range, namely two soft X-ray transmission microscopes and a soft X-ray contact microscope, have been developed. The transmission microscopes are based on grazing incidence Wolter type or diffractive Fresnel type optics. Application of these instruments for nanoimaging of hydrated and dry biological samples is presented. A new method for X-ray nanoimaging based on optical coherence tomography (OCT) technique using broad-band soft X-ray emission from the laser plasma source is also demonstrated.

In the paper recently developed microscopes operating in the soft X-rays and extreme ultraviolet (EUV) spectral regions are presented. Soft X-rays and EUV were generated using laser plasma light sources with a double-stream gas puff target. Compact Nd:YAG lasers, generating 4 ns pulses with energy up to 0.8 J at 10 Hz repetition rate, were used to irradiate the targets. Two full-field microscopes based on Fresnel optics have been developed with the use of these sources. The EUV microscope was operating at the wavelength of 13.8 nm and used for imaging of nanostructures with sub-100 nm spatial resolution. The soft X-ray microscope was operating at the wavelength of 2.8 nm and was used for imaging of dry and hydrated biological samples with spatial resolution below 100 nm. The third microscope is based on soft X-ray contact microscopy (SXCM) approach. The new microscopes and their application for imaging at the nanoscale are presented and discussed.

The optical coherence tomography (OCT), typically used in the visible wavelength range, due to relatively long wavelength is limited by the axial resolution to approximately a few hundreds of nanometers to a micron. Visible light is also incapable of resolving multilayered structures of tens of nanometers periods. Thus, the extension of the OCT to shorter wavelengths, such as the extreme ultraviolet (EUV) and soft X-ray (SXR), in the so-called X-ray coherence tomography (XCT), allows mitigating those problems. We present a nanometer resolution XCT using broadband SXR radiation with 2 nm axial resolution using a compact laser plasma soft X-ray source. The laser-produced Kr/He plasma was formed by the interaction of nanosecond laser pulses with a gaseous target in a double stream gas puff target approach, emitting 2 to 5 nm wavelength broadband radiation. The coherence parameters of the SXR radiation allowed for the OCT measurements of a bulk multilayer structure composed of Mo/Si multilayers with 10 nm period, with an axial resolution of about 2 nm, the interface position accuracy of sub-nm and detection of multilayer interfaces up to a depth of about 100 nm. The experimental data were compared to the OCT simulations.

In this work investigations concerning interaction of intense, nanosecond EUV pulses with matter were performed. Various laser-produced plasma radiation sources were employed for creation of the driving EUV pulses. The sources were based on two different laser systems with pulse energies ranging from 0.8 J to 10J and pulse duration 4 ÷ 10 ns. They were equipped with the EUV collectors for focusing of the radiation. This way radiation fluence up to 0.5 J/cm2 in the interaction region was obtained. In our experiments solid material samples or gases injected into the vacuum chamber synchronously with the EUV pulses were irradiated. Irradiation of the gases resulted in ionization and excitation of atoms and molecules forming low temperature plasmas with a relatively high electron density. Emission spectra obtained from these plasmas, contained spectral lines corresponding to radiative transitions in atoms, molecules, atomic or molecular ions. For analysis of the EUV spectra numerical simulations were performed, using a collisional-radiative PrismSPECT code. For computer simulations of the molecular spectra measured in the UV/VIS range a LIFBASE and Specair codes were employed. This way ionization states together with various thermodynamic parameters were deduced. Irradiation of solid samples resulted in melting of a thin near-surface layer or, in some cases its ablation or even conversion to a low temperature plasma. It depended on physico-chemical properties of the material and its thickness. In case of organic polymers, usually ablation connected with fragmentation of the polymer molecules, took place. In case of thick samples of inorganic solids, a thin near surface layer was heated up to a high temperature exceeding melting or even boiling point. In most cases different kinds of micro- or nanostructures were created, modifying the surface morphology. Except the EUV interaction with solid materials, simultaneous EUV and the EUV induced plasma treatment was investigated. Plasmas were created in gases injected close to the exposed surface. Part of the EUV radiation was absorbed in the injected gas forming the low temperature plasma near the surface, while the other part of radiation, that was not absorbed, interacted with the surface material. This way additional atoms could be incorporated into the molecular structure of the exposed material, or reactive etching took place. Especially interesting results were obtained using molecular gases for creation the reactive plasmas.

We present a brief review of radiography technique (shadowgraphy) and its extension to tomography. We used both techniques to characterize i.e. multi-jet gas puff target for different gases with a variable number of jets for various applications. The characterization measurements have been performed with the use of EUV shadowgraphy at 13.5 nm wavelength. Pulses of the EUV radiation were produced with a laser plasma EUV source based on a double-stream gas puff target. The shadowgrams of the characterized gas puff targets were registered using a back-illuminated CCD camera, sensitive to the EUV radiation. The gas density maps were calculated based on 2D transmission map and an atomic photoabsorption cross-section. To obtain 3D tomography reconstruction of multi-jet gas puff target we acquired projections at different viewing angles and performed the reconstruction numerically. This unique technique based on a compact laser-produced plasma source allows imaging 2D and 3D objects having a density 3 orders of magnitude smaller than the density of water.

A desktop tomography system, based on laser-interaction with a gas puff target, which results in efficient plasma formation emitting in the soft X-ray (SXR, λ = 0.1 - 10 nm) region, was developed at IOE-WAT (Warsaw, Poland). The system, coupled with an ellipsoidal condenser and a Fresnel zone-plate and working in the "water window" spectral range (λ = 2.3 - 4.4 nm) at the quasi-monochromatic He-like nitrogen spectral line (λ=2.88nm), allows acquiring images approaching a resolution of few microns. The development of such setup offers the possibility to obtain a reconstruction of three-dimensional images in a laboratory environment, without the involvement of large "photon facilities". Details about the system and its optimization as well as some imaged samples will be presented and discussed.

Surface modification of polymers is often required to make the material suitable for specific application. Physical and chemical properties can be altered using a number of well developed techniques, such as plasma treatment, excimer lasers, chemical treatment, surface coating, plasma immersion ion implantation-deposition and laser surface structuring. Extreme ultraviolet radiations have limited penetration depth as they are readily absorbed even in low dense medium. However, their interaction with polymer surfaces is very strong due to high energy level of these photons. Therefore, EUV photons can be used to induce surface modifications in the polymer surfaces. This study is focused on the use of EUV photons for chemical surface modification of Polyethylene terephthalate (PET) films to incorporate nitrogen atoms. Nitrogen doping is often desirable in biomaterials to enhance the biocompatibility. EUV treated PET films in the presence of nitrogen and helium environments were studied using X-ray photoelectron spectroscopy (XPS) to examine the EUV induce chemical modifications.Surface modification of polymers is often required to make the material suitable for specific application. Physical and chemical properties can be altered using a number of well developed techniques, such as plasma treatment, excimer lasers, chemical treatment, surface coating, plasma immersion ion implantation-deposition and laser surface structuring. Extreme ultraviolet radiations have limited penetration depth as they are readily absorbed even in low dense medium. However, their interaction with polymer surfaces is very strong due to high energy level of these photons. Therefore, EUV photons can be used to induce surface modifications in the polymer surfaces. This study is focused on the use of EUV photons for chemical surface modification of Polyethylene terephthalate (PET) films to incorporate nitrogen atoms. Nitrogen doping is often desirable in biomaterials to enhance the biocompatibility. EUV treated PET films in the presence of nitrogen and helium environments were studied using X-ray photoelectr...

Low temperature plasmas induced by irradiation of molecular gases with extreme ultraviolet (EUV) pulses were studied. The EUV pulsed beams of high intensity, were formed using laser-produced plasma (LPP) sources, based on Nd:YAG laser systems and a double-stream Xe/He gas-puff target. The EUV beams were used for irradiation of small portions of gases, injected into a vacuum chamber synchronously with the radiation pulses. Low temperature plasmas produced this way in oxygen, nitrogen or sulfur hexafluoride gas emitted radiation in a wide spectral range. The corresponding EUV spectra were dominated by emission lines originating from singly charged, atomic ions. In case of spectra recorded in an optical range, emission lines, corresponding to radiative transitions in atomic or molecular species, were detected. Taking into account a Stark broadening of F I emission lines an electron density was estimated. Its value exceeded 1017cm-3, which is a few orders of magnitude higher comparing to plasmas produced in standard generators. Employing the SF6 – based plasmas an experiment concerning plasma treatment of a silicon surface was performed. A possibility to create different kinds of nanostructures was demonstrated.

In this work, a near edge X-ray fine structure spectroscopy (NEXAFS) based on a laser-plasma compact soft X-ray (SXR) source is presented. The NEXAFS spectrum was acquired simultaneously for all energies near the absorption edge, using a broadband emission from krypton plasma, in contrary to the existing, synchrotron-based spectroscopic systems. In such SXR source, a plasma is produced by an interaction of a laser beam with a double stream gas puff target. The plasma efficiently emits SXR radiation from 2-5 nm wavelength (250-620 eV photon energy). Such broadband emission allows acquiring simultaneously a sample and a reference spectra, to obtain optical density spectrum of the sample near C-Kα absorption edge, due to a special construction of the SXR spectrometer. The NEXAFS spectra were obtained using PET polymer test sample, from both, the large area and spatially localized to ~30×30 μm2 area. The spatially localized spectra were used to construct 2-D spectromicroscopic maps of sample constituents. Single-shot spectra were also acquired with laser pulse energies of ~10 times larger than in the case of multiple exposures. A short overview of those NEXAFS experiments will be presented.

Recently, extreme ultraviolet (EUV) radiation has been increasingly used to modify polymers. Properties such as the extremely short absorption lengths in polymers and the very strong interaction of EUV photons with materials may play a key role in achieving new biomaterials. The purpose of the study was to examine the impact of EUV radiation on cell adhesion to the surface of modified polymers that are widely used in medicine: poly(tetrafluoroethylene) (PTFE), poly (vinylidene fluoride) (PVDF), and poly-L-(lactic acid) (PLLA). After EUV surface modification, which has been performed using a home-made laboratory system, changes in surface wettability, morphology, chemical composition and cell adhesion polymers were analyzed. For each of the three polymers, the EUV radiation differently effects the process of endothelial cell adhesion, dependent of the parameters applied in the modification process. In the case of PVDF and PTFE, higher cell number and cellular coverage were obtained after EUV radiation with oxygen. In the case of PLLA, better results were obtained for EUV modification with nitrogen. For all three polymers tested, significant improvements in endothelial cell adhesion after EUV modification have been demonstrated.

Extreme ultraviolet (EUV) surface modification of polytetrafluoroethylene (PTFE) was performed in order to enhance the degree of biocompatibility. Polymer samples were irradiated by different number of EUV shots using a laser–plasma based EUV source in the presence of nitrogen gas. The physical and chemical properties of EUV modified PTFE samples were studied using Atomic Force Microscopy, X-ray photoelectron spectroscopy and water contact angle (WCA) methods. Pronounced wall type micro and nano-structures appeared on the EUV treated polymer surfaces resulting in increased surface roughness and hydrophobicity. Stronger cell adhesion and good cell morphology were observed on EUV modified surfaces by in-vitro cell culture studies performed using L929 fibroblasts.

We present a 2-D mapping of a sample thickness with nanometer accuracy employing a compact arrangement of near-edge X-ray absorption fine structure (NEXAFS) technique. A NEXAFS spectrum coupled with a scanning system was used to generate a 2-D thickness map of the TiO2 sample (anatase form) deposited on the top of a SiN membrane. The thickness values were retrieved from the experimental data by applying different methods of data processing. In the paper, the detailed analysis of the data processing methods and the identified sources of the errors show that the proposed procedure based on averaging two imperfect estimates reduces the error caused by the uncontrolled bias of the measured signals. This procedure was termed as the average one. The estimates from the proposed average approach and the standard absorption-jump ratio in the absorption edge vicinity were compared with the direct results obtained by applying scanning electron microscopy (SEM). The experimental arrangement of the NEXAFS spectroscopy system, the data acquisition method, as well as the possible error sources, are presented and discussed in detail.

In the paper new experimental techniques for nano-imaging and nano-spectroscopy operating with electromagnetic radiation in the nanometer wavelength range (soft X-rays - SXR and extreme ultraviolet – EUV) are presented. SXR and EUV radiation is generated using laser plasma sources in which a laser plasma is produced by irradiation of a gas puff target with nanosecond laser pulses at intensities of about 1011-1012 Wcm-2 in the interaction region. Commercially available Nd:YAG lasers (EXPLA) generating 4 ns pulses with energy up to 0.8 J at 10 Hz repetition rate are used to irradiate the targets that are formed by pulsed injection of working gas (Xe, Kr, Ar, N2) in an additional annular stream of He gas under high-pressure using a double-nozzle set up (a double-stream gas puff target approach [1]). Laboratory microscopy systems with the use of compact laser plasma sources of soft X-rays and EUV, operating in the ‘water window’ spectral range (wavelength: 2.3–4.4 nm; photon energy: 280–560 eV) or the EUV range at the wavelength of 13.8 nm have been developed [2]. Application of these microscopes for nano-imaging of hydrated and dry biological samples with spatial resolution from 50 nm to 100 nm and relatively short exposition time is presented. Moreover, a recently developed laboratory system for the near-edge X-ray absorption fine structure (NEXAFS) spectroscopy [3] is also presented. The new NEXAFS system has been used for elemental composition analysis of polymer samples. [1] H. Fiedorowicz et al. Appl. Phys. B 70 (2000) 305 [2] P. Wachulak et al. Appl. Sci. 7 (2017) 548 [3] P. Wachulak et al. (2018) - submitted

We present a proof of principle experiment on single-shot near edge soft X-ray fine structure (NEXAFS) spectroscopy with the use of a laboratory laser-plasma light source. The source is based on a plasma created as a result of the interaction of a nanosecond laser pulse with a double stream gas puff target. The laser-plasma source was optimized for efficient soft X-ray (SXR) emission from the krypton/helium target in the wavelength range from 2 nm to 5 nm. This emission was used to acquire simultaneously emission and absorption spectra of soft X-ray light from the source and from the investigated sample using a grazing incidence grating spectrometer. NEXAFS measurements in a transmission mode revealed the spectral features near the carbon K-&alpha, absorption edge of thin polyethylene terephthalate (PET) film and L-ascorbic acid in a single-shot. From these features, the composition of the PET sample was successfully obtained. The NEXAFS spectrum of the L-ascorbic acid obtained in a single-shot exposure was also compared to the spectrum obtained a multi-shot exposure and to numerical simulations showing good agreement. In the paper, the detailed information about the source, the spectroscopy system, the absorption spectra measurements and the results of the studies are presented and discussed.

In this work a laser-produced plasma (LPP) source was used to create low temperature plasmas. An extreme ultraviolet and soft X-ray (EUV/SXR) radiation pulse was used for ionization of molecular gases, injected into a vacuum chamber synchronously with the EUV/SXR pulse. Energies of photons exceeding 100 eV were sufficient for dissociative ionization, ionization of atoms or even ions. The resulting photoelectrons had also enough energy for further ionizations or excitations. Time resolved UV/VIS spectra, corresponding to single charged ions, molecules and molecular ions, were recorded. For spectral lines, corresponding to radiative transitions in F II and S II ions, electron temperature was calculated based on a Boltzmann plot method. Numerical simulations of the molecular spectra were fitted to the experimental spectra allowing for determination of vibrational and rotational temperatures.

A laser-plasma double stream gas-puff target source coupled with Fresnel zone plate (FZP) optics, operating at He-like nitrogen spectral line λ=2.88nm, is capable of acquire complementary information in respect to optical and electron microscopy, allowing to obtain high resolution imaging, compared to the traditional visible light microscopes, with an exposition time of a few seconds. The compact size and versatility of the microscope offers the possibility to perform imaging experiments in the university laboratories, previously restricted to large-scale photon facilities. Source and microscope optimization, and examples of applications will be presented and discussed.

Application of a compact laser plasma source of soft X-rays and extreme ultraviolet (EUV) in imaging with nanometer resolution is demonstrated. The source is based on a gas puff target irradiated with nanosecond laser pulses from a small commercial Nd:YAG laser. Soft X-ray radiation in the ‘water window’ spectral range and EUV near 10 nm are generated efficiently without production of target debris. Nanoscale imaging of biological samples as well as micro- and nanostructures using transmission soft X-ray and EUV microscopy based on Fresnel optics and soft X-ray contact microscopy is demonstrated.

In this study, surface modification of fluoropolymer Polyvinyl fluoride (PVF) films was performed using Extreme Ultraviolet (EUV) radiations to induce patterned structures on surface and to provide control over the surface wettability. Specially developed laser produced plasma based EUV source was used for surface structuring. The double stream gas-puff target was produced by injection of krypton and xenon (KrXe) gas mixture into a hollow stream of helium. Commercially available EKSPLA Nd:YAG 1.06 micron laser was used to irradiate the KrXe gas puff target with 3 nanosecond pulse duration having 0.8 J energy. The PVF films were irradiated with 50 and 200 EUV pulses. The surface characterisation of the pristine and EUV modified PVF polymer films was performed by Atomic Force Microscopy (AFM) for morphological modifications. To investigate chemical modifications, X-ray Photoelectron Spectroscopy was used. The wettability of the sample surfaces was examined by Water Contact Angle (W CA) measurements. EUV surface modification of PVF films resulted in formation of wall type rippled structures on the polymer surfaces. The surface roughness of the EUV treated surfaces was increased up to 287 nm and 21° reduction was observed in the WCA of the PVF films. Successful surface structuring and wettability control was obtained using EUV surface modification of PVF films.

Short illumination wavelength allows an extension of the diffraction limit toward nanometer scale; thus, improving spatial resolution in optical systems. Soft X-ray (SXR) radiation, from “water window” spectral range, λ=2.3–4.4 nm wavelength, which is particularly suitable for biological imaging due to natural optical contrast provides better spatial resolution than one obtained with visible light microscopes. The high contrast in the “water window” is obtained because of selective radiation absorption by carbon and water, which are constituents of the biological samples. The development of SXR microscopes permits the visualization of features on the nanometer scale, but often with a tradeoff, which can be seen between the exposure time and the size and complexity of the microscopes. Thus, herein, we present a desk-top system, which overcomes the already mentioned limitations and is capable of resolving 60 nm features with very short exposure time. Even though the system is in its initial stage of development, we present different applications of the system for biology and nanotechnology. Construction of the microscope with recently acquired images of various samples will be presented and discussed. Such a high resolution imaging system represents an interesting solution for biomedical, material science, and nanotechnology applications.

The results of formation of elongated krypton/helium plasma channels are presented. Two laser pulses were used: one to produce plasma channels and the second one for conversion to soft X rays. The soft X-ray radiation was in turn used for backlighting the channels and their visualization. The study of their formation and uniformity was performed using a combination of soft X-ray shadowgraphy and pinhole camera imaging. The plasma channels, with various lengths and various densities, were visualized and the results of their characterization are presented. Using moderate laser pulse energy quite uniform channels, up to 9 mm in length, were demonstrated.

In this work, two laser-produced plasma (LPP) sources – extreme ultraviolet (EUV) and a LPP soft X-ray (SXR) source were used to create Ne photoionized plasmas. A radiation beam was focused onto a gas stream, injected into a vacuum chamber synchronously with the radiation pulse. EUV radiation spanned a wide spectral range with pronounced maximum centered at λ≈11 nm, while in case of the SXR source spectral maximum was at λ≈1.4 nm. Emission spectra of photoionized plasmas created this way were measured in a wide spectral range λ = 10–100 nm. The dominating spectral lines originated from singly charged ions (Ne II) and neutral atoms (Ne I). For the highest radiation fluence, spectral lines originating from Ne III and even Ne IV species were detected. Differences between the experimental spectra, obtained for all irradiation conditions, were analyzed. They were attributed either to different fluence or spectral distribution of driving photons.

A compact soft X-ray microscope based on a nitrogen double-stream gas puff target soft X-ray source, operating at He-like nitrogen spectral line at the wavelength of λ = 2.88 nm is presented. The desk-top size microscope was successfully demonstrated in transmission mode using the Fresnel zone-plate objective and it is suitable for soft X-ray source microscopy in the "water window" spectral range (λ = 2.3 ÷ 4.4 nm). Details about the soft X-ray source source, the microscope and an example of application in the biomedical field are shown and discussed.

A silicon carbide (SiC) detector was calibrated in terms of quantum efficiency (QE) as well as its spectral responsivity at two different wavelength radiations ( $\lambda _{N_{2}} = 2.88$ nm and $\lambda _{N_{e}}= 1.35$ nm), using two different calibrated Si detectors, sensitive to the soft X-ray radiation ( $\lambda = 0.1\div 10$ nm). An Nd:YAG laser was employed to irradiate a nitrogen and a neon gas-puff target, producing a plasma, which is emitting radiation used for estimation of the detector parameters. A possibility to characterize a new generation of not commercial SiC detectors, with a higher band gap with respect to Si, employing a gas-puff target source, will be presented. Measurements show the SiC detectors QE, equal to 3.4 and 7.1 e/ph for 2.88- and 1.35-nm wavelength radiations, respectively. Calculations and results are reported and discussed.

A compact microscope based on nitrogen double stream gas puff target soft X-ray source, which emits radiation in the water-window spectral range, at the wavelength of λ = 2.88 nm, is presented. The microscope, employing ellipsoidal grazing incidence condenser and a Fresnel zone plate objective, is capable of capturing images with a 60 nm spatial resolution and exposure time as low as a few seconds. Examples of different applications of the SXR microscopy, and its applicability for various fields of science, are presented and discussed.

Surface roughness control of polymeric materials is often desirable in various biomedical engineering applications related to biocompatibility control, separation science and surface wettability control. In this study, Polyethylene terephthalate (PET) polymer films were irradiated with Extreme ultraviolet (EUV) photons in nitrogen environment and investigations were performed on surface roughness modification via EUV exposure. The samples were irradiated at 3 mm and 4 mm distance from the focal spot to investigate the effect of EUV fluence on topography. The topography of the EUV treated PET samples were studied by AFM. The detailed scanning was also performed on the sample irradiated at 3 mm. It was observed that the average surface roughness of PET samples was increased from 9 nm (pristine sample) to 280 nm and 253 nm for EUV irradiated samples. Detailed AFM studies confirmed the presence of 1.8 mm wide period U-shaped channels in EUV exposed PET samples. The walls of the channels were having FWHM of about 0.4 mm. The channels were created due to translatory movements of the sample in horizontal and transverse directions during the EUV exposure. The increased surface roughness is useful for many applications. The nanoscale channels fabricated by EUV exposure could be interesting for microfluidic applications based on lab-on-a-chip (LOC) devices.

We present our recent results, related to nanoscale imaging in the extreme ultraviolet (EUV) and soft X-ray (SXR) spectral ranges and demonstrate three novel imaging systems recently developed for the purpose of obtaining high spatial resolution images of nanoscale objects with the EUV and SXR radiations. All the systems are based on laser-plasma EUV and SXR sources, employing a double stream gas puff target. The EUV and SXR full field microscopes—operating at 13.8 nm and 2.88 nm wavelengths, respectively—are currently capable of imaging nanostructures with a sub-50 nm spatial resolution with relatively short (seconds) exposure times. The third system is a SXR contact microscope, operating in the “water-window” spectral range (2.3–4.4 nm wavelength), to produce an imprint of the internal structure of the investigated object in a thin surface layer of SXR light sensitive poly(methyl methacrylate) photoresist. The development of such compact imaging systems is essential to the new research related to biological science, material science, and nanotechnology applications in the near future. Applications of all the microscopes for studies of biological samples including carcinoma cells, diatoms, and neurons are presented. Details about the sources, the microscopes, as well as the imaging results for various objects will be shown and discussed.

A compact size microscope based on nitrogen double stream gas puff target soft X-ray source, which emits radiation in water-window spectral range at the wavelength of λ = 2.88 nm is presented. The microscope employs ellipsoidal grazing incidence condenser mirror for sample illumination and silicon nitride Fresnel zone plate objective for object magnification and imaging. The microscope is capable of capturing water-window images of objects with 60 nm spatial resolution and exposure time as low as a few seconds. Details about the microscopy system as well as some examples of different applications from various fields of science, are presented and discussed.

We present a possibility of reaching higher energy absorption edges of organic materials, beyond the carbon K-edge, in the near edge X-ray absorption fine structure (NEXAFS) spectroscopy technique using a compact laser-produced plasma soft X-ray (SXR) source based on a double-stream gas puff target. The source was optimized for emission in the SXR spectral range from 1.5 to 5 nm wavelength using the krypton/helium target. The emission spectrum of the source and the absorption spectrum of the investigated sample were measured simultaneously by means of a grazing incidence spectrometer, equipped with a single, large aperture diffractive element. Based on both spectra, the optical density was computed for the silicon nitride membranes in a transmission mode, to reveal the NEXAFS features near the nitrogen K-edge. Moreover, due to spectral narrowing of the SXR emission by the use of titanium filter, reaching the titanium L-edge was also possible. Multiple SXR pulse data were compared to single SXR pulse (single-shot) data as well as to the numerical simulations. In this paper, the detailed information about the source, spectroscopy system, and the results of NEXAFS measurements is presented and discussed.

New developments in nanoscience and nanotechnology require nanometer scale resolution imaging tools and techniques such as an extreme ultraviolet (EUV) and soft X-ray (SXR) microscopy, based on Fresnel zone plates. In this paper, we report on applications of a desk-top microscopy using a laser-plasma EUV source based on a gas-puff target for studies of morphology of thin silicon membranes coated with NaCl crystals and samples composed of ZnO nanofibers.

Polymeric biomaterials are being widely used for the treatment of various traumata, diseases and defects in human beings due to ease in their synthesis. As biomaterials have direct interaction with the extracellular environment in the biological world, biocompatibility is a topic of great significance. The introduction or enhancement of biocompatibility in certain polymers is still a challenge to overcome. Polymer biocompatibility can be controlled by surface modification. Various physical and chemical methods (e.g., chemical and plasma treatment, ion implantation, and ultraviolet irradiation etc.) are in use or being developed for the modification of polymer surfaces. However an important limitation in their employment is the alteration of bulk material. Different surface and bulk properties of biomaterials are often desirable for biomedical applications. Because extreme ultraviolet (EUV) radiation penetration is quite limited even in low density mediums, it could be possible to use it for surface modification without influencing the bulk material. This article reviews the degree of biocompatibility of different polymeric biomaterials being currently employed in various biomedical applications, the surface properties required to be modified for biocompatibility control, plasma and laser ablation based surface modification techniques, and research studies indicating possible use of EUV for enhancing biocompatibility.

Using a table-top size soft X-ray (SXR) microscope, based on a laser plasma source with a double stream gas-puff target and a Fresnel zone plate objective, series of images of test samples were acquired. Characterization and optimization of the acquisition parameters were studied and evaluated in terms of signal to noise ratio (SNR). Conclusions for the optimization of SXR imaging were reached. Similar SNR measurements might be performed to characterize other SXR imaging systems as well. Software enabling live calculation of the SNR during the image acquisition might be introduced in future in the compact imaging systems for optimal image acquisition or for benchmarking purposes.

Laser-produced plasma sources of short-wavelength radiation offer an interesting alternative to synchrotron and free-electron laser installations. Recently, we reported on a newly developed desktop EUV microscope based on plasma generated from a gas-puff target and diffractive optics. The half-pitch resolution of the microscope approached 50 nm. Compared to analogous microscopes based on synchrotron sources, our system is compact and cost-effective. In this paper, we present the results of imaging experiments on a thin polycrystalline object that was carried out in order to further examine the applicability of the microscope. We have demonstrated here that EUV microscopy can provide structural information that cannot be accessed by conventional optical microscopy or SEM.

Various imaging methods and techniques capable of reaching a nanometer spatial resolution are currentlyunder development. One of them is an extreme ultraviolet microscopy, based on the Fresnel zone plates. Inthis paper a compact, high-repetition, laser-plasma EUV source, with a gas puff target, capable of emittingquasi-monochromatic radiation at 13.8 nm wavelength was used in the first demonstration of a desk-top EUVtransmissionmicroscopywithaspatial(half-pitch)resolutionof50nm. EUVmicroscopyimagesofobjectswithvariousthicknessesandthespatialresolutionmeasurementsusingtheknife-edgetestarepresented.PACS:52.38.Ph,52.50.Dg,41.50.+h,42.30.Va,42.79.Ci

In this paper an efficient micromachining of poly(vinylidene fluoride) (PVDF) by direct photo-etching with a laser-plasma EUV (extreme ultraviolet) source was demonstrated for the first time. Mass spectroscopy was employed to investigate the ablation products and revealed emission of numerous molecular species of C-containing fragments of the polymer chain. Chemical surface changes after irradiation were investigated using X-ray photoelectron spectroscopy (XPS). The XPS spectra obtained for PVDF samples, irradiated with low and high EUV fluence, indicate significant differences between chemical structures in near-surface layers. It was shown that irradiation with low fluence results in defluorination and thus carbon enrichment of the polymer in near-surface layer. In contrary, irradiation with high fluence leads to intense material ablation and hardly modifies the chemical structure of the remaining material.

In this work a laser-plasma EUV source based on a gas puff target was used for micro- and nanostructuring of polyethylene terephthalate (PET), polyethylene naphthalate (PEN) and poly-oxydiphenylene-pyromellitimide (Kapton HN) foils. The plasma radiation was focused using a gold-plated grazing incidence ellipsoidal collector. The collector allowed for effective focusing of Kr plasma radiation from the wavelength range λ = 9–70 nm. The polymer foils were irradiated in the focal plane or at some distance downstream the focal plane of the EUV collector. The surface morphology of the irradiated polymer samples was investigated using a scanning electron microscope (SEM) and the chemical changes by X-ray photoelectron spectroscopy (XPS). Different kinds of micro- and nanostructures created in near-surface layers of the polymers were obtained. The form of the structures depends on the type of polymer and the EUV exposure. In case of PEN even a single shot was sufficient to obtain visible changes in surface morphology. In case of Kapton clearly visible surface modification requires tens of EUV pulses. To investigate the changes in the chemical structure XPS spectra, corresponding to the valence band of the polymer samples, were measured. Significant differences were revealed in the XPS spectra of irradiated and not-irradiated polymers showing decrease of functional groups containing oxygen was indicated.

In this paper a new approach to a laser-produced plasma EUV source based on a tin target is presented. A thin layer of pure tin and composite layers consisting of Sn with Si, SiO and LiF are investigated. The target composed of several thin layers produces less debris than the other targets and provides a conversion efficiency (CE) in the 13.5-nm±1% band at least comparable to the CE for the pure tin slab target. The largest CE was observed for the target composed of a mixture of Sn and LiF, due to the fact that lithium, similarly to tin, is a strong emitter at 13.5 nm.