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Abstract: In this paper, we present the fabrication procedures as well as the preliminary experimental results of a novel method for significantly simplified deposition of charged nanoparticles at specific patterns based on focused ion beam (FIB) technology. The deposition method relies on the implantation of positive gallium ions on an insulated material which creates the basis for attracting the nanoparticles to the substrate. In order to substantiate the theory two patterns were generated on a silicon on insulator (SOI) chip with an upper layer of silicon of 200nm. The two patterns are as follows: resolution target – consisting of six squares and 400nm×400nm circular sinusoidal tunnel. In addition, we demonstrate the utilization and applicability of the aforementioned method in a tunable radiation nano device as well as show its experimental characterization. [Copyright &y& Elsevier]

Abstract: In this paper, we present the fabrication and preliminary measurements of a novel electro optical nano modulator on silicon chip based on light scattering by a movable 50nm charged gold colloid particle. The idea is to modulate the 1.55μm light by electrically manipulating the highly conductive particle in a nano air gap created in a silicon waveguide to cause high scattering and absorption. With a length of 150nm of the air gap, the expected modulation rates can exceed few GHz while being implemented on a highly dense silicon chip. [Copyright &y& Elsevier]