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Determines the levels of strains in germanium (Ge) epilayers on silicon(100) substrates grown by molecular beam epitaxy using antimony as a surfactant. Direction Ge-Ge mode peaks as revealed by Raman spectra; Relationship between Raman shift of this mode and strain in partially relaxed samples.

X-ray diffraction measurements at different grazing angles for self-organized Ge dots grown on Si(001) are carried out by using synchrotron radiation as a light source. The lattice parameters parallel and perpendicular to the surface are determined from the grazing angle and ordinary x-ray diffraction spectra. A 1.2% lattice constant expansion parallel to the interface and a 3.1% lattice expansion along the growth direction, as compared with the Si lattice, are found within the Ge dots. Based on the Poisson equation and the Vegard law, the Ge dot should be a partially strain relaxed SiGe alloy with the Ge content of 55%. The composition change in Ge dots is suggested to be caused by the atomic intermixing during the islanding growth. In the small grazing angle x-ray diffraction spectrum, a peak located at the higher angle side of Si(220) is observed. The origin of this peak is attributed to the near surface compressive strain in the peripheral substrate regions surrounding the Ge dots. This compressive strain is induced by the formation of Ge dots and leads to a -0.8% lattice constant change parallel to the interface. © 2000 American Institute of Physics. [ABSTRACT FROM AUTHOR]