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Striae configurations in TiO2–SiO2 ultra-low-expansion glasses caused by variations in TiO2 concentration were investigated through measurement of leaky surface acoustic wave (LSAW) velocities by the line-focus-beam (LFB) ultrasonic material characterization system. LSAW velocity distributions were measured on the surface of a specimen substrate prepared from a large circular plate glass ingot produced by the direct method using a flame hydrolysis process. A subsequent procedure that included polishing the surface of the specimen to reduce the specimen thickness by 40 µm and measuring the LSAW velocity distributions on the surface was repeated five times in order to examine at least one period of the striae. TiO2 concentration variations were clearly observed in the deposit direction of the glass ingot and in its radial direction. The maximum LSAW velocity difference over the whole examined region was 11.7 m/s, corresponding to 0.70 wt % TiO2 concentration. The three-dimensional striae structure revealed that the striae plane in the examined region was almost parallel to the substrate surface but gently curved down in the radial direction. The plane had a slightly convex-shaped cross section layered with a striae periodicity of about 0.16 mm and a curvature radius of about 440 mm, and also existed in a circular form with a curvature radius of about 450 mm. The ultrasonic method will contribute to improvement of characteristics and homogeneity of glass associated with production-process conditions.

We obtained an accurate relationship between the leaky surface acoustic wave (LSAW) velocities and TiO2 concentrations. Such a relationship is needed for the line-focus-beam ultrasonic material characterization (LFB-UMC) system as a new technology for evaluating the coefficient of thermal expansion (CTE) of ultra-low-expansion glasses with extremely high precision. Using commercially available TiO2–SiO2 glass with periodic striae, averaged velocities for LSAW propagation parallel to the striae plane at 225 MHz and averaged TiO2 concentrations by X-ray fluorescence analysis were measured on the surface of seven specimen substrates prepared perpendicular to the striae plane. The obtained sensitivity of LSAW velocity to TiO2 concentration was -0.0601 wt %/(m/s), and the measurement resolution was estimated to be ±0.0084 wt % for ±2 σ (σ: standard deviation) from the LSAW velocity measurement resolution of ±0.14 m/s. The TiO2 concentration for the standard TiO2–SiO2 glass specimen with a LSAW velocity of 3308.18 m/s for system calibration was determined to be 7.09 wt %. This ultrasonic technology will contribute greatly to the development of the ultra-low-expansion glasses needed for extreme ultraviolet lithography (EUVL) systems.

The crystal structure change of sputtered Ta metal according to the nonmetal underlayer film was studied. The bcc-structure Ta was grown on TaNx, NbNx and bcc Mo underlayer films, whereas tetragonal-structure Ta was grown on glass, Ta2O5 and some metals. The crystal structure of Ta varied from tetragonal to bcc according to the N composition of the TaNx and NbNx underlayer films. The bcc Ta growth on TaNx was explained in terms of crystal structure compatibility of the Ta lattice arrangement between TaNx and bcc Ta, and tetragonal Ta growth on Ta2O5 film could be explained by partial Ta lattice matching between Ta2O5 and Ta crystals. Bcc Ta on the TaNx film gave a low resistivity of 25 µΩcm, in contrast to that of conventional tetragonal Ta of 180 µΩcm. The resistivity of Ta anodic oxide was increased by five orders of magnitude by adding N compared to that of conventional Ta anodic oxide. Low-resistivity bcc Ta on TaNx and high-resistivity TaN anodic oxide are applied as gate bus lines of TFT-LCD.

An advanced multi-field-driving method that reduces not only the dynamic power consumption, but also the static power consumption of LCD driving circuits has been developed. The applicability of this method was confirmed by using a 9.5″ VGA TFT-LCD. Total driving circuit power consumption was reduced to less than half that of a conventional 60 Hz driving method for all displayed images. In addition, the displayed images obtained were sufficient for practical use and had no visible image degradation, such as flicker and crosstalk.

A super-precise method of evaluating the coefficient of thermal expansion (CTE) of ultra-low-expansion glasses was developed using the line-focus-beam ultrasonic material characterization (LFB-UMC) system and was demonstrated for TiO2-doped SiO2 glass. The sensitivity and resolution in the velocity measurement of leaky surface acoustic waves (LSAWs) in CTE were estimated to be 4.40 (ppb/K)/(m/s) and ±0.77 ppb/K for ±2σ (σ: standard deviation) at 225 MHz. LSAW velocity differences caused by different TiO2 concentrations and distributions or striae in the specimens were successfully detected and evaluated, providing two-dimensional information. This ultrasonic method is effective for evaluating ultra-low-expansion glasses needed for extreme ultra-violet lithography (EUVL) systems.

A large-area high-resolution TFT-LCD is fabricated using a step-aligner, because it's screen size exceeds the photo-mask size A shot-block boundary is sometimes perceived and deteriorates picture quality. The purpose of this paper is to investigate the shot-block perceptibility and the influences to TFT-LCD pixel design, theoretically. A new model with a level-shift voltage induced by a TFT parasitic capacitance has been introduced and an estimation of the currently available step-aligners, which have a maximum pattern-discontinuity of 1.2-1.5μm, showed that they would cause the shot-block images. A generalized design rule related to the shot-block image has been introduced. Using this rule, the aperture ratio of high-resolution TFT-LCDs were estimated and the results showed that the aperture ratio would decrease, as the number of gate lines increased. Possible methods to improve this phenomenon have been summarized.

The evaluation of periodic striae layers in TiO2–SiO2 ultra-low-expansion glasses, formed during production, is discussed through the measurement of leaky surface acoustic-wave (LSAW) velocities by the line-focus-beam (LFB) ultrasonic material-characterization system. The averaging effect associated with an LSAW propagation region interacting with periodic striae on a specimen surface was examined at 225 MHz, taking several specimens prepared with inclination angles of θ=0, 2, 5, 10, 20, and 90° to the plane of striae layers with a periodicity of 0.16 mm. LSAW velocities corresponding to TiO2 concentrations in the glass were properly measured for the specimens with θ less than 10°, and the perpendicular specimen (θ=90°) was suitable for accurate determination of the striae periodicities for LSAW propagation perpendicular to the striae plane.

A super-precise method of evaluating the coefficient of thermal expansion (CTE) of ultra-low-expansion glasses for future extreme ultra-violet lithography (EUVL) systems was developed using the line-focus-beam ultrasonic material characterization (LFB-UMC) system. Evaluation was demonstrated for two commercial glasses, TiO2-SiO2 glass (C-7971) and Li2O-Al2O3-SiO2 glass ceramic (Zerodur). For the C-7971 specimens, the sensitivity and resolution in the velocity measurement of leaky surface acoustic waves (LSAWs) for the CTE were estimated to be 4.40 (ppb/K)/(m/s) and ±0.77 ppb/K for ±2σ (σ: standard deviation). LSAW velocity differences caused by different TiO2 concentrations and distributions or striae in each specimen were successfully detected and evaluated. For the Zerodur specimens, LSAW velocity differences associated with the chemical compositions and crystallization conditions were observed among different ingots and specimens. This ultrasonic method is expected to be an extremely useful and effective CTE evaluation technology and to contribute to improving and developing EUVL-grade glass materials.

Lead-zirconate-titanate (PZT) thin films were prepared on non-alkaline glass substrates widely used in liquid crystal display (LCD) devices, by plasma-assisted magnetron RF sputtering with an immersed coil. After preparation of the PZT thin film, the glass was available for use in LCD device processing. No mutual diffusion of the elements was recognized between the glass substrate and the bottom electrode. The PZT layer had a dense film structure with rectangular and columnar grains, and only its perovskite phase was crystalline. PZT thin films on a glass substrate had leakage current densities of about 10-8 A/cm2, acceptable hysteresis loop shapes with the remanent polarization (P r ) of 45 µC/cm2 and the coercive field (E c ) of 90 kV/cm. Ferroelectric properties on a glass substrate almost conform with those on a Si-based substrate.

A novel plasma-assisted RF magnetron sputtering system with an immersed coil antenna between a target and a substrate was applied for preparing Pb(Zr, Ti)O3 (PZT) thin films. The antenna enabled the generation of inductively coupled plasma (ICP) independently of the target RF source. The plasma assisted by the antenna resulted in the changes of ion fluxes and these energy distributions irradiating to the substrate. The crystalline phase of the deposited PZT thin films was occupied by the perovskite phase depending on the antenna power. In addition, a high deposition rate, modified uniformity of film thickness, and a dense film structure with large columnar grains were obtained as a result of effects of the assisted plasma. The application of the plasma-assisted sputtering method may enable the preparation of PZT thin films that have excellent properties.

Resist pattern transformation by backside exposure, which is a key process for a self-alignment technique is investigated. The light intensity and a-Si:H thickness markedly affect the pattern transformation, while the effect of gate insulator thickness is small. Numerical simulations based on Fresnel diffraction showed fairly good agreement with the experimental results.

A fairly reliable capacity of 300 Mbytes has been achieved on a single side of a 90 mm high-density phase-change optical disk, using a 0.6-mm-thick disk and an optical head which had a 690 nm laser diode and a 0.6 numerical aperture objective lens. The carrier-to-noise ratio (CNR), erasability, and the bit error rate (BER) of the optical disk were investigated. It has been confirmed that these parameters have a wide laser power tolerance for most inner and outer tracks.

Thin films of Bi2Sr2CuO y were grown with MBE (Molecular Beam Epitaxy) by the separated evaporation/oxidation/crystallization technique on a MgO (100) substrate. The proposed technique is the unit-by-unit process consisting of three steps: multilayer deposition of (Bi-Sr-Cu-Sr-Bi)×2, low-temperature oxidation (300°C) in low concentration O3 (O2/O3(0.3%)) atmosphere (5×10-5 Torr) and crystallization (750°C, 1×10-8 Torr). After growth of ten units, clear streaks on the RHEED pattern showing the twin structure and a fairly fine X-ray diffraction pattern were observed.