Back to Search
Start Over
A Promising Evaluation Method of Ultra-Low-Expansion Glasses for the Extreme Ultra-Violet Lithography System by the Line-Focus-Beam Ultrasonic Material Characterization System
- Source :
- Japanese Journal of Applied Physics. 43:L1455-L1457
- Publication Year :
- 2004
- Publisher :
- IOP Publishing, 2004.
-
Abstract
- A super-precise method of evaluating the coefficient of thermal expansion (CTE) of ultra-low-expansion glasses was developed using the line-focus-beam ultrasonic material characterization (LFB-UMC) system and was demonstrated for TiO2-doped SiO2 glass. The sensitivity and resolution in the velocity measurement of leaky surface acoustic waves (LSAWs) in CTE were estimated to be 4.40 (ppb/K)/(m/s) and ±0.77 ppb/K for ±2σ (σ: standard deviation) at 225 MHz. LSAW velocity differences caused by different TiO2 concentrations and distributions or striae in the specimens were successfully detected and evaluated, providing two-dimensional information. This ultrasonic method is effective for evaluating ultra-low-expansion glasses needed for extreme ultra-violet lithography (EUVL) systems.
- Subjects :
- Materials science
Physics and Astronomy (miscellaneous)
business.industry
Extreme ultraviolet lithography
Resolution (electron density)
General Engineering
General Physics and Astronomy
Acoustic wave
Thermal expansion
Characterization (materials science)
Optics
Ultrasonic sensor
business
Lithography
Beam (structure)
Subjects
Details
- ISSN :
- 00214922
- Volume :
- 43
- Database :
- OpenAIRE
- Journal :
- Japanese Journal of Applied Physics
- Accession number :
- edsair.doi...........93897b81b08147d69ca7c97794f7e1a7
- Full Text :
- https://doi.org/10.1143/jjap.43.l1455