1. Growth of Ge1−xSnx heteroepitaxial layers with very high Sn contents on InP(001) substrates
- Author
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Nakamura, Marika, Shimura, Yosuke, Takeuchi, Shotaro, Nakatsuka, Osamu, and Zaima, Shigeaki
- Subjects
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EPITAXY , *INDIUM phosphide , *CRYSTAL lattices , *ANNEALING of semiconductors , *CHEMICAL systems , *GERMANIUM , *TIN , *PRECIPITATION (Chemistry) - Abstract
Abstract: We investigated the crystalline structures of Ge1−xSnx heteroepitaxial layers with Sn contents greater than 20% grown on InP and Ge substrates. Considering the lattice mismatch between the Ge1−xSnx layers and the substrates, we achieved epitaxial growth of Ge1−xSnx layers with very high Sn content by suppressing the Sn precipitation; in addition, we improved upon the crystalline quality of Ge1−xSnx heteroepitaxial layers. As a result, we could successfully form a 130nm-thick Ge1−xSnx heteroepitaxial layer on an InP substrate with a Sn content as high as 27% without Sn precipitation. We also improved the crystalline quality of Ge1−xSnx layers by annealing at a temperature as low as 290°C. [Copyright &y& Elsevier]
- Published
- 2012
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