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Abstract: Nickel oxide (NiO) thin films were prepared on glass substrates at various bias voltages using dc reactive magnetron sputtering technique. The influence of substrate bias voltage on structural, optical and electrical properties was systematically investigated using X-ray diffraction (XRD), SEM, EDS, spectrophotometer and Hall effect studies. The NiO films are crystalline with preferential growth along (200) plane. The NiO films exhibit optical transmittance of 55% and direct band gap of 3.78eV at the substrate bias voltage of −75V. The electrical resistivity decreases as substrate bias voltage increases from 0 to −75V thereafter it was slightly increased. [ABSTRACT FROM AUTHOR]

Abstract: Nanostructured Zn1− x Mn x S films (0⩽ x ⩽0.25) were deposited on glass substrates by simple resistive thermal evaporation technique. All the films were deposited at 300K in a vacuum of 2×10−6 m bar. All the films temperature dependence of resistivity revealed semiconducting behaviour of the samples. Hot probe test revealed that all the samples exhibited n-type conductivity. The nanohardness of the films ranges from 4.7 to 9.9GPa, Young’s modulus value ranging 69.7–94.2GPa. [Copyright &y& Elsevier]