Search

A comparison study of the interfacial reactions and mechanical shear strengths of normal and thin electroless-nickel electroless-palladium immersion gold (ENEPIG) with Sn–3.0Ag–0.5Cu (SAC305) solder during isothermal aging at 150 °C is presented. The thicknesses of the Ni layers of the normal and thin ENEPIG were 6 and 0.1 μm, respectively. In the normal ENEPIG substrate, small and thin needle-shaped (Cu,Ni)6Sn5 intermetallic compounds (IMCs) were formed at the interface after reflowing, and a relatively thin IMC layer remained despite a long aging period of 1000 h. On the other hand, in the thin ENEPIG substrate, the thin Ni layer as well as the Au and Pd layers were completely reacted, and a relatively thick (Cu,Ni)6Sn5 IMC was formed at the interface after reflowing. In addition, the interfacial IMC layer grew continuously with increasing aging time. During aging at 150 °C, the interfacial IMC layers at the thin ENEPIG joints were consistently thicker than those at the normal ENEPIG joints. During a low-speed shear test, the shear strength did not significantly change depending on the aging time and surface finish, and all the fractures occurred in the ductile mode. On the other hand, in the high-speed shear test, the thick (Cu,Ni)6Sn5 IMC layer significantly deteriorated the shear strength of the thin ENEPIG joints. The thin ENEPIG joints showed inferior mechanical reliability (especially, high impact reliability) than the normal ENEPIG joints during solid-state isothermal aging at 150 °C.

To analyze the effects of Ni(P) layer thickness and Pd layer composition on interfacial reactions and the mechanical reliabilities of Sn–58Bi solder joints, we evaluated a phosphorous-contained Ni (Ni(P)) layer thicknesses ranging from 0.3 to 1.0 μm with Au/Pd/Ni(P) or a phosphorous-contained Pd [Au/Pd(P)/Ni(P)] layer in thin-electroless-nickel electroless-palladium immersion gold (ENEPIG) with Sn–58Bi solder joint after aging test. (Pd, Au)Sn4 and Ni3Sn4 intermetallic compounds (IMCs) were dominantly formed at the interfaces of the 0.3 µm to 1.0 μm Ni(P) layers in the thin-Au/Pd/Ni(P) or thin-Au/Pd(P)/Ni(P) joints after aging at 85 °C and 95 °C for 100 h. However, the Ni3Sn4 IMC layer changed to the (Cu, Ni)6Sn5 IMC layer in the 0.3 μm Ni(P) layer contained the Au/Pd/Ni(P) joint after aging at 85 °C for 300 h, because the Cu elements in a Cu pad penetrated through the P-rich Ni layer. Otherwise, the Ni3Sn4 IMC of the 0.3 μm Ni(P) layer in the Au/Pd(P)/Ni(P) joint changed to (Ni, Cu)3Sn4 IMC after aging at 105 °C and 115 °C for 1000 h, due to the P in the Pd layer, which affects the IMC growth rate. The 0.7 µm and 1.0 μm Ni(P) layers in the Au/Pd/Ni(P) or Au/Pd(P)/Ni(P) joints were attributed to the Ni3Sn4 IMC layer for whole aging conditions because the thick P-rich Ni layer suppress Sn and Cu diffusion during aging. In a high-speed shear tests, the shear strength of the 0.3 μm Ni(P) layer in the Au/Pd/Ni(P) joints was relatively low than that of the Au/Pd(P)/Ni(P) joints after aging at 105 °C and 115 °C for 100 h. Ni3Sn4 IMC was observed at the fracture surfaces of the 0.3 μm Ni(P) layer in the Au/Pd(P)/Ni(P) joints after aging at 115 °C for 1000 h, whereas the fracture surface of the Au/Pd/Ni(P) joint was Cu substrate. Therefore, Ni(P) layer thicknesses in excess of 0.7 μm and the P-contain Pd layer in the thin-ENEPIG surface finish with Sn–58Bi solder joints are expected to be highly reliable after long-term aging treatment.

The suitability of Ni–Sn combination paste as a transient liquid phase sintering (TLPS) bonding material for applications in high-temperature power electronic technologies was investigated. The microstructure and mechanical properties of joints bonded through TLPS with a Sn-30 wt% Ni paste were investigated at varying bonding temperatures (250, 270, 300, and 350 °C) and times using field-emission scanning electron microscopy, field-emission transmission electron microscopy, electron probe micro-analyzer, differential scanning calorimetry, and X-ray diffraction analyses. The results indicated that Ni and Sn reacted and bonded quickly to form Ni–Sn intermetallic compounds, which primarily consisted of Ni3Sn4 and residual Ni particles. The mechanical strength analysis results show that the shear strength values of the joints tended to increase as the bonding temperature increased. As Ni3Sn4 reacted with Ni particles, the joints achieved a stable and dense microstructure. The shear strength values were determined to be 47.9 MPa (300 °C) and 41.4 MPa (350 °C) for 15 and 5 min, respectively. Furthermore, the shear strength value saturated at a bonding temperature of 350 °C for a bonding duration of 5 min.

The microelectronics packaging industry, although rapidly growing, faces several challenges including 3-D integration, issues with multifunctional capability, and fluctuating input/output (I/O) density, among others. Better-performing microelectronics assemblies for mitigating these challenges require alloys with superior solderability and minimal metallization layer thickness. To this end, in this study, we investigated two kinds of electroless-nickel electroless-palladium immersion gold (ENEPIG) with 0.3 μm Ni, 0.1 μm pure Pd or Pd-phosphorous (Pd(P)), and 0.1 μm Au layers plated on a printed circuit board (PCB) substrate. To analyze the effects of the pure Pd and Pd(P) layers in the thin ENEPIG, we evaluated the interfacial reactions and mechanical properties of the SAC305 solder with a pure Pd or Pd(P) layer in the thin ENEPIG joints after aging at 150 °C. Needle-type and chunky-type (Cu,Ni)6Sn5 IMCs were formed at the interfaces of the pure Pd and Pd(P) joints, respectively. The (Cu,Ni)6Sn5 IMC of the pure Pd joint was thinner than that of the Pd(P) joint after reflowing and aging for 100 h. However, the total IMC of the Pd(P) joint was thinner than that of the pure Pd joint from 250 to 1000 h. In a low-speed shear test, the shear strength of the Pd(P) joint was higher than that of the pure Pd joint for the entire aging time. Most fractures occurred at the Sn-rich surface with a ductile mode, regardless of the different substrates and aging times. After high-speed shear testing, the shear strength of the pure Pd joint was higher than that of the Pd(P) joint until aging for 100 h. After aging for 250 h, the shear strength of the Pd(P) joint was higher than that of the pure Pd joint. The results for brittle fracture rate were similar to those for high-speed shear strength. Hence, Pd(P) joints are expected to demonstrate higher reliabilities than pure Pd joints after long aging treatment.

We performed 30Ni–70Sn (wt%) transient liquid phase sintering (TLPS) bonding with micro-sized Ni and Sn powders for high-temperature power applications. A Ni–Sn paste was fabricated and TLPS bonding was performed. We investigated the interfacial reactions, transformations into Ni3Sn4 intermetallic compound (IMC) phases, and joint strength in this study. The Ni–Sn TLPS bonding was an easy and simple process under a relatively low bonding temperature and short bonding time. After TLPS bonding, low melting point Sn element was completely consumed, and the bonded joint was composed of Ni3Sn4 IMCs and the remaining Ni particles. The Ni3Sn4 IMC joint formed with remaining Ni particles was very stable. All the Ni–Sn TLPS samples had high shear strengths of over 70 MPa, and the shear strength was approximately 32% higher than that of the conventional Sn–3.0Ag–0.5Cu solder joint. The Ni–Sn TLPS bonded joints in the present study were not brittle and exhibited superior adhesion strength. This suggests high applicability of the Ni–Sn TLPS bonding for high-temperature power electronic applications in future EV/HEV systems.

The effects of the thickness of the Ni layer in thin electroless-nickel electroless-palladium immersion gold (thin-ENEPIG) surface-finished printed circuit boards (PCB) with Sn-3.0Ag–0.5Cu (SAC305) solder joints during aging treatment were investigated. We evaluated the interfacial reactions and mechanical properties of 0.3–1.0 µm thick Ni layers in thin-ENEPIG PCBs with SAC305 solder joints at aging temperatures of 75, 100, 125, and 150 °C for 1000 h. A needle-type (Cu,aNi)6Sn5 intermetallic compound (IMC) layer formed at the interface of the SAC solder and Cu substrate. In addition, P-rich Ni layers were formed at the interface of the (Cu,Ni)6Sn5 IMC and Cu substrate for the 0.5–1.0 µm thick Ni joints. The thicknesses of the (Cu,Ni)6Sn5 IMCs with 0.3 and 0.5 µm Ni joints were strongly affected by the aging time and temperature. In contrast, the IMC growth rates of the 0.7 and 1.0 µm thick Ni joints were significantly lower than that of the 0.3 µm thick Ni joint. The reason for this behavior is that the P-rich Ni layer acts as a barrier for Sn and Cu diffusion at the joint and was maintained at the IMC/Cu interface after aging. In high-speed shear tests, the shear strengths of all Ni joints aged at 75 °C were similar. However, the rate of reduction in shear strength decreased with increasing Ni layer thickness as the aging time and temperature increased, but the shear strength of the 0.3 µm Ni joint rapidly decreased with increasing aging temperature and time. In contrast, the shear strengths of the 0.7 and 1.0 µm Ni joints slightly decreased with increasing aging temperature and time. The brittle fracture rates of the joints decreased with increasing Ni thickness, and we determined that this occurred because of the remaining P-rich Ni layer, which acts as a diffusion barrier during aging, at the interface of the 0.7 and 1.0 µm Ni joints. In low-speed shear tests, the shear strengths of the 0.7 and 1.0 µm Ni joints were slightly higher than those of the 0.3 and 0.5 µm Ni joints after aging at 125 and 150 °C for the entire aging period. Most fractures occurred via a ductile mode regardless of the Ni layer thickness. Therefore, a Ni layer thickness of more than 0.7 µm in thin-ENEPIG finished PCB with SAC305 solder joints is expected to yield high reliability on aging.

A comparative study of initial interfacial reactions and kinetics of Ag In and Au In as die-attach materials for high-temperature power electronics applications was performed in this study. Sequential interfacial reactions and transformations of the In solder to intermetallic compound (IMC) phases of the Ag/In/Ag and Au/In/Au joints were investigated and compared for transient liquid phase (TLP) bonding at 190 °C for 1 min under different bonding pressures. The interfacial reaction of the Ag/In/Ag joint was faster than that of the Au/In/Au joint under same bonding conditions. In the Ag/In/Ag joints, the TLP joint was fully converted into the Ag-rich Ag2In IMC. On the other hand, the Au/In/Au TLP joint was composed of three Au In IMCs of Au7In3, AuIn, and AuIn2.

A micro-sized Ag paste was fabricated with the metal content of approximately 85% as a sinter-bonding material in this study. The sintering reactions and joint strengths of Ag sintered joints with three different surface finishes of Cu, Ag, and electroless Ni-immersion Au (ENIG) were evaluated at different sinter bonding times during the sintering process. Stable interfacial microstructures and relatively dense Ag sintered layers were formed in the three Ag sintered joints, and the interdiffusion behaviors between the Ag paste and substrate metals promoted in the formation of good metallurgical bonding during the Ag sintering process, regardless of surface finish. The bonding time of 10 min was sufficient for full sintering reactions between the chip and different substrate finishes. The shear strength did not increase with increased sintering time regardless of surface finish. The substrate metals strongly affected the die shear strengths of the Ag sintered joints, and the Ag-finished joint had a more stable interfacial microstructure and superior shear strength compared to the other metal-finished joints.

A new multilayer metallization, electroless-nickel electroless-palladium immersion gold (ENEPIG) with a thin 0.1-μm-thick Ni(P) layer (thin-ENEPIG), was plated onto a Cu printed circuit board substrate for fine-pitch package applications. We evaluated the interfacial reactions and mechanical strengths of Sn–3.0Ag–0.5Cu (SAC305) solder on thin ENEPIG-coated substrates over various reflow times and compared them to those of a conventional ENEPIG-coated substrate with a 6-μm-thick Ni(P) layer. Thin Au, Pd, and Ni layers on the thin ENEPIG substrates were exhausted during the initial reflow time, which brought the underlying Cu layer in direct contact with the molten SAC305 solder, resulting in the formation of scallop-shaped (Cu,Ni)6Sn5 intermetallic compounds (IMCs) at the interface. The interfacial IMC layer for the thin ENEPIG substrate was thicker than that for the normal ENEPIG substrate due to the direct contact between the SAC305 solder and the Cu layer. In the low-speed shear test, all the fractures occurred in the bulk solder regardless of the different substrates and reflow times. In the high-speed shear test, the fracture mode was changed from ductile to brittle on increasing the reflow time. The P-rich Ni layer and thick Cu–Sn IMC formation deteriorated the shear strengths of the normal and thin ENEPIG joints, respectively. The thin ENEPIG joints showed better mechanical strength in the solder joint than the normal ENEPIG joints, despite the thick interfacial IMCs.

Cu-Sn solid–liquid interdiffusion (SLID) bonded joints were fabricated using a Sn-Cu solder paste and Cu for high-temperature power electronics applications. The interfacial reaction behaviors and the mechanical properties of Cu6Sn5 and Cu3Sn SLID-bonded joints were compared. The intermetallic compounds formed at the interfaces in the Cu-Sn SLID-bonded joints significantly affected the die shear strength of the joint. In terms of thermal and mechanical properties, the Cu3Sn SLID-bonded joint was superior to the conventional solder and the Cu6Sn5 SLID-bonded joints.

The sintering reactions and mechanical reliability of Ag sinter paste with three different surface finishes, Cu, Ag, and electroless nickel-immersion gold, were evaluated during the sintering process. We compare the sintering reaction behaviors of the three sintered joints and identify the relationship between the sintering behavior and the sintered Ag/substrate compatibility. Inter-diffusion behaviors result in of good metallurgical bonding during the Ag sintering process in the three sintered joints. The shear strength increases on increasing the bonding pressure, irrespective of the surface finish. The surface finish material of the substrate strongly affects the shear strength of the Ag sintered joints. The Ag finished joint exhibits superior interfacial stability and shear strength compared to the Cu and Au finished joints.

Cu pillar bumps were mechanically enhanced using electroless Ni plating for fine-pitch electronic packaging applications. The interfacial reaction and mechanical properties of the Ni-plated Cu pillar bump joints were evaluated. After reflowing, the plated Ni layer dissolved into the Sn-Ag solder caps. The Ni was incorporated into the interfacial reactions, forming a (Cu,Ni) 6 Sn 5 intermetallic compound on the Cu pillar bumps. Adding Ni to the Cu pillar bumps significantly affected the mechanical properties of the joint and increased the bump shear strength of the solder cap.

The mechanical strength of Sn-3.0Ag-0.5Cu (SAC305) and Au-20Sn solder joints and their interfacial reaction with a Ni-plated ceramic substrate were evaluated to assess their suitability for use as die attach materials in power module applications. The compatibility between the two solder alloys and the Ni substrate was assessed during isothermal long-term aging, while the mechanical strength of the two solder joints was measured by die shear testing. A higher intermetallic compound (IMC) growth rate and Ni consumption rate was observed in the SAC305 solder joint, with the formation of a thick IMC layer and weak interface resulting in brittle fracture. The Au-20Sn solder joint, on the other hand was found to exhibit superior high temperature interfacial stability and joint strength.

Power electronics modules in electric vehicles and hybrid electric vehicles, particularly those containing next-generation power semiconductor devices such as silicon carbide and gallium nitride are operated at high temperatures exceeding 200 °C. Consequently, the reliability requirements for such modules have become highly stringent and new packaging materials and technologies are required to meet the demands of power electronic modules. Some good candidates for high temperature applications include high-temperature solders such as Au–20Sn, Ag or Cu sinter pastes, and transient liquid phase (TLP) bonding materials. In particular, the TLP bonding technology is suitable for use in high temperature environments owing to its low cost and simplicity of the bonding process. In this study, the feasibility of Cu–Sn and Ni–Sn TLP bonding technologies as die-attach methods for power electronics packaging applications is examined. The results of the study indicate that the Cu–Sn and Ni–Sn TLP bonding processes transform the joints fully into Cu6Sn5/Cu3Sn and Ni3Sn4 intermetallic compounds (IMCs), respectively. Further, the mechanical strength and reliability of the two TLP bonding joints are reduced owing to the formation of brittle IMCs.

The wetting behavior, interfacial reactions, and mechanical reliability of Sn-Ag-Cu solder on a plasma-coated printed circuit board (PCB) substrate were evaluated under multiple heat-treatments. Conventional organic solderability preservative (OSP) finished PCBs were used as a reference. The plasma process created a dense and highly cross-linked polymer coating on the Cu substrates. The plasma finished samples had higher wetting forces and shorter zero-cross times than those with OSP surface finish. The OSP sample was degraded after sequential multiple heat treatments and reflow processes, whereas the solderability of the plasma finished sample was retained after multiple heat treatments. After the soldering process, similar microstructures were observed at the interfaces of the two solder joints, where the development of intermetallic compounds was observed. From ball shear tests, it was found that the shear force for the plasma substrate was consistently higher than that for the OSP substrate. Deterioration of the OSP surface finish was observed after multiple heat treatments. Overall, the plasma surface finish was superior to the conventional OSP finish with respect to wettability and joint reliability, indicating that it is a suitable material for the fabrication of complex electronic devices.

A comparative study of Sn–3.0Ag–0.5Cu (SAC305) and Au–20Sn solders as die-attach materials for high-temperature power electronic applications was performed. The solid-state interfacial reactions of SAC305 and Au–20Sn solders with a Ni-plated Si chip and a direct-bonded-copper substrate, as well as the growth of interfacial intermetallic compound layers and interfacial stability, were investigated and compared during aging at 150 and 200 °C for up to 2000 h. The SAC305 solder exhibited a higher interfacial intermetallic compound growth rate and a higher consumption rate of the Ni layer than the Au–20Sn solder. The Au–20Sn solder had a superior interfacial stability for high-temperature power electronic applications. Copyright © 2016 John Wiley & Sons, Ltd.

Cu paste has been considered as a promising substitute for Ag paste for high-temperature-endurable chip-bonding applications, particularly for power electronics packaging, because it is cheaper than Ag. However, the primary disadvantage of using Cu paste is its possible oxidation during the handling and bonding process. In this context, to overcome the oxidation problem of the Cu sinter paste and to exploit the advantages of transient liquid-phase sintering (TLPS) bonding technology, we prepare Sn-coated Cu micro paste in this study, and we evaluate its feasibility as a die-attach material for power electronics packaging. We first prepare various Sn-coated Cu powders under various plating conditions, and we successfully perform TLPS bonding with Sn-coated Cu paste at a relatively low bonding temperature and a short bonding time. During the TLPS bonding, Sn is completely consumed, and the resulting bonded joint is composed of the Cu–Sn intermetallic compounds and remnant Cu particles. The TLPS-bonded joints exhibit relatively high shear strength values of ~40 MPa, and all fractures mainly occur at the chip-side interfaces irrespective of the Cu particle size. We believe that our findings can contribute to the use of Sn-coated Cu paste as an alternative bonding technology for power electronics applications.

Herein, we investigated the interfacial reactions of crystalline Pd (pure Pd) and amorphous Pd (Pd(P)) layers in thin electroless-Ni electroless-Pd immersion-Au (thin-ENEPIG) surface-finished printed circuit board with Sn-3.0Ag-0.5Cu (SAC305) solder joints reflowed at 260 °C for 10–180 s. After 20 s reflow, a thick (Pd,Au)Sn4 IMC was formed at the interface of the pure Pd joint, while thick AuSn4 and thin (Pd,Au)Sn4 IMCs were formed at the interface of the Pd(P) joint. After 30 s reflow, needle-type (Cu,Ni)6Sn5 IMC was mainly formed at the top-side interface of the pure Pd joint, while scallop-type (Cu,Ni)6Sn5 IMC was formed at the top-side interface of Pd(P) joints. Finally, the top-side (Cu,Ni)6Sn5 IMC of the pure Pd and the top- and bottom-side (Cu,Ni)6Sn5 IMCs of the Pd(P) joints coarsened with increasing reflow time up to 180 s. In the results of top-view SEM micrographs, the (Cu,Ni)6Sn5 IMCs on the Pd(P) joint were larger than those on the pure Pd joint for reflow times of 30–180 s. Therefore, P in the Pd layer was concluded to significantly affect the interfacial reactions and IMC morphology of the SAC 305 solder with ENEPIG joints during reflow reactions.

The electromigration behavior of low-melting temperature Sn-58Bi (in wt%) solder joints was investigated with a high current density between 3 and 4.5 × 103 A/cm2 between 80 and 110 °C. In order to analyze the impact of various substrate metallizations on the electromigration performance of the Sn-58Bi joint, we used representative substrate metallizations including electroless nickel immersion gold (ENIG), electroless nickel electroless palladium immersion gold (ENEPIG), and organic solderability preservatives (OSP). As the applied current density increased, the time to failure (TTF) for electromigration decreased regardless of the temperature or substrate metallizations. In addition, the TTF slightly decreased with increasing temperature. The substrate metallization significantly affected the TTF for the electromigration behavior of the Sn-58Bi solder joints. The substrate metallizations for electromigration performance of the Sn-58Bi solder are ranked in the following order: OSP-Cu, ENEPIG, and ENIG. Due to the polarity effect, current stressing enhanced the fast growth of intermetallic compounds (IMCs) at the anode interface. Cracks occurred at the Ni3Sn4 + Ni3P IMC/Cu interfaces on the cathode sides in the Sn-58Bi/ENIG joint and the Sn-58Bi/ENEPIG joint; this was caused by the complete consumption of the Ni(P) layer. Alternatively, failure occurred via deformation of the bulk solder in the Sn-58Bi/OSP-Cu joint. The experimental results confirmed that the electromigration reliability of the Sn-58Bi/OSP-Cu joint was superior to those of the Sn-58Bi/ENIG or Sn-58Bi/ENEPIG joints.

Interfacial reactions and joint mechanical reliability of a representative low melting temperature Sn–58 wt%Bi solder with three different surface finishes were evaluated during a reflow process. The surface materials consisted of organic solderability preservative (OSP), electroless nickel–immersion gold (ENIG), and electroless nickel–electroless palladium–immersion gold (ENEPIG). The relationships between the interfacial reaction, surface finish, shear speed, and shear force were elucidated in this study. The interfacial intermetallic compounds (IMCs) on the ENEPIG substrate were sequentially changed during reflowing at 180 °C in the following order: (Pd,Ni)Sn4, (Pd,Ni)Sn4 + Ni3Sn4, and Ni3Sn4. Compared to the Cu6Sn5 IMC on the OSP-finished Cu substrate, the Ni3Sn4 IMCs on the ENIG and ENEPIG substrates were much thinner. The IMCs of each of the different surface finishes grew as the reflow time increased; however, the morphologies of the IMCs were different each other. Layer-type interfacial IMCs created a stable metallurgical interfacial structure during the reflow reaction, resulting in reduced rates of IMC growth and Ni–P consumption. High-speed shear tests were conducted to evaluate the effects of interfacial reactions on the mechanical properties of three Sn–58Bi solder joints. In spite of the different interfacial reactions and IMC formations, there were no large differences among shear forces in the three Sn–58Bi solder joints. Further, the type of surface finish material did not significantly affect the shear force of the Sn–58Bi solder joints under high-speed shear loading.

The effect of adding a small amount of rare earth cerium (Ce) element to low Ag containing Sn-1wt%Ag Pb-free solder on its interfacial reactions with Cu substrate was investigated. The growth of intermetallic compounds (IMCs) between three Sn-1Ag-xCe solders with different Ce contents and a Cu substrate was studied and the results were compared to those obtained for the Ce-free Sn-1Ag/Cu systems. In the solid-state reactions of the Sn-1Ag(-xCe)/Cu solder joints, the two IMC layers, Cu6Sn5 and Cu3Sn, grew as aging time increased. Compared to the Sn-1Ag/Cu joint, the growth of the Cu6Sn5 and Cu3Sn layers was depressed for the Ce-containing Sn-1Ag-xCe/Cu joint. The addition of Ce to the Sn-Ag solder reduced the growth of the interfacial Cu-Sn IMCs and prevented the IMCs from spalling from the interface. The evenly-distributed Ce elements in the solder region blocked the diffusion of Sn atoms to the interface and retarded the growth of the interfacial IMC layer.

In this study, we investigated the phenomena of electrochemical migration (ECM) on a silicon (Si) substrate with directly printed Ag pattern using the screen-printing method. The microstructures and electrical characteristics of the directly printed Ag patterns under different sintering conditions were estimated. In addition, the ECM characteristics of the directly patterned Ag circuits on Si substrates were evaluated according to the sintering conditions. Clusters were formed by interparticle necking during the sintering process; the cluster size in the patterns increased as the sintering temperature and time increased. Granular Ag films, which were sintered at high temperatures and for long time periods of time, had excellent electrical characteristics as a result of the formation of interparticle necking of sufficient size. Also, the directly printed Ag patterns exposed to higher sintering temperatures and longer sintering times had higher resistances to ECM than those exposed to lower sintering temperatures and shorter sintering times.

In this study, electrodes on a flexible printed circuit board (FPCB) and rigid printed circuit board (RPCB) were bonded by a thermo-compression bonding. Pb-free Sn–3.0Ag–0.5Cu solder was used as an interlayer. In order to determine the optimum bonding conditions for bonding pressure and time, a 90° peel test of the FPCB–RPCB joint was conducted. The relationships between the bonding conditions, interfacial reactions, and peel strength were investigated. The optimum bonding pressure and time were 2.04 MPa and 5 s at 260 °C, respectively. Thin and uniform (Ni,Cu) 3 Sn 4 intermetallic compound (IMC) layers formed at both FPCB/Sn–3.0Ag–0.5Cu/RPCB interfaces. In a high temperature storage (HTS) test of 125 °C, the peel strength decreased as the aging time increased. After the HTS test, brittle interfaces formed in the PCB joints, resulting in the switching of the failure mode from a polyimide–electrode failure to a brittle IMC failure.

We examined the effect of surface treatment using atmospheric pressure plasma on the patternability of screen-printed Ag nanopaste in an attempt to fabricate the ideal patterned shape. We also evaluated the electrical property of conductive circuit according to the kinds and degree of treatments. In hydrophobic treatment, the contact angle was up to 108.94°. In hydrophilic treatment, the contact angle was around 20. The hydrophobic and hydrophilic treatments affected the characteristics of the printed Ag pattern. With the hydrophobic treatment, the thickness of the patterns increased as the treatment time increased but decreased with the hydrophilic treatment. For the electrical property, excessive surface treatment of either treatment increased the insertion losses as compared with a sputtered pattern on a non-treated surface. We confirmed that electrical property and patternability in direct printed conductive circuits could be improved by properly controlled APP treatment.

In this study, we investigated the phenomena of electrochemical migration (ECM) on a silicon (Si) substrate with directly printed Ag paste with epoxy binder (7wt.%) using a screen-printing method. The microstructure and electrical characteristics of the directly printed Ag patterns under different sintering conditions were estimated. In addition, the ECM characteristics of the directly patterned Ag circuits on Si substrates were evaluated according to the sintering conditions. The ECM characteristics of the Ag paste with epoxy binder were compared with the ECM characteristics of Ag paste without epoxy binder. Clusters were formed by interparticle necking during the sintering process; the cluster size in the patterns increased as the sintering temperature and time increased. Granular Ag films, which were sintered at high temperatures and for long time periods of time, had excellent electrical characteristics as a result of the formation of interparticle necking of sufficient size. The directly printed Ag patterns that were exposed to higher sintering temperatures and longer sintering times had higher resistances to ECM than those that were exposed to lower sintering temperatures and shorter sintering times. Also, the directly printed Ag pattern with epoxy binder had a higher resistance to ECM phenomenon than the pattern without epoxy binder.

The shear force and failure behaviors of the Sn-58Bi epoxy solder joints with various surface finishes under the high-speed shear test were investigated. The relationships between the shear speed, shear force, and fracture mode are elucidated in this study. The shear force of the Sn-58Bi solder joints increased with increasing shear speed, mainly due to the high strain-rate sensitivity of the solder alloys. Brittle interfacial fractures were more easily achieved at higher shear speed in the high-speed shear test. This result was discussed in terms of the relationship between the strain-rate of the solder alloy, the work-hardening effect, and the resulting stress concentration in the interfacial regions. The fracture mode changed from ductile solder fracture to brittle interfacial fracture with increasing shear speed. On the other hand, the different surface finish materials did not affect the shear force and fracture mode of the Sn-58Bi solder joints under high-speed shear loading.

We investigated the feasibility of a printing technology for Ag circuit formation on a FR4 substrate. A conductive paste containing Ag nanoparticles (73 wt%) of 20-50 nm diameter was screen printed on an FR4 substrate and sintered under a sintering temperature ranging from 100 degrees C to 200 degrees C for 30 min. We carried out the thermal analysis of the Ag nanopaste to confirm the suitability of the set-up conditions. To investigate the sintering degree with various temperatures, fractured cross-sections were observed by field emission scanning electron microscopy (FESEM). For electrical characterization of the printed Ag circuit, a four-point probe method was used to measure the direct current (DC) resistivity, while a network analyzer and Cascade's probe system in the frequency range from 10 MHz to 20 GHz were used to measure the scattering parameters (S-parameter) of the sintered Ag conducting patterns. The resistivity under the application of a DC signal decreased as the temperature increased. The measured S-parameters indicated that the electrical losses decreased as the sintering temperature increased due to the interparticle neck formation after heat treatment at high temperatures.

The performance of surface finishes as a function of the pH of the utilized plating solution was evaluated by electrochemical impedance spectroscopy (EIS) and potentiodynamic polarization tests in 3.5 wt.% NaCl solution. In addition, the surface finishes were examined by x-ray diffraction (XRD), and the contact angle of the liquid/solid interface was recorded. NiP films on copper substrates with gold coatings exhibited their highest coating performance at pH 5. This was attributed to the films having the highest protective efficiency and charge transfer resistance, lowest porosity value, and highest contact angle among those examined as a result of the strongly preferred Au(111) orientation and the improved surface wettability.

Interfacial reactions and joint reliability of Sn-3.0Ag-0.5Cu solder with two different surface finishes, electroless nickel-immersion gold (ENIG) and electroless nickel-electroless palladium-immersion gold (ENEPIG), were evaluated during a reflow process. We first compared the interfacial reactions of the two solder joints and also successfully revealed a connection between the interfacial reaction behavior and mechanical reliability. The Sn-Ag-Cu/ENIG joint exhibited a higher intermetallic compound (IMC) growth rate and a higher consumption rate of the Ni(P) layer than the Sn-Ag-Cu/ENEPIG joint. The presence of the Pd layer in the ENEPIG suppressed the growth of the interfacial IMC layer and the consumption of the Ni(P) layer, resulting in the superior interfacial stability of the solder joint. The shear test results show that the ENIG joint fractured along the interface, exhibiting indications of brittle failure possibly due to the brittle IMC layer. In contrast, the failure of the ENEPIG joint only went through the bulk solder, supporting the idea that the interface is mechanically reliable. The results from this study confirm that the Sn-Ag-Cu/ENEPIG solder joint is mechanically robust and, thus, the combination is a viable option for a Pb-free package system.

The adhesion strength of a Cu/Ni-Cr/polyimide flexible copper clad laminate (FCCL), was evaluated according to the thickness of the Ni-Cr (Ni:Cr=95:5 ratio) seed layer using the 90^o peel test. The changes in the morphology, chemical bonding and adhesion properties were characterized by SEM, AFM and XPS. The peel strength of the FCCL increased with increasing thickness of the Ni-Cr seed layer, due to the increase in the ion bombardment caused by the higher power used in the Ni-Cr sputtering process. This increase in the FCCL peel strength was attributed to the lower proportion of C-N bonds and higher proportion of C-O bonds in the polyimide surface. The adhesion strength between the metal and polyimide was mostly attributed to the chemical interaction between the metal layer and the functional groups of the polyimide.

In this study, electrodes on a flexible printed circuit board (FPCB) and rigid PCB (RPCB) were bonded by a thermo-compression bonding. The surface finishes on the Cu electrodes of the FPCB and RPCB were organic-solderability-preservative and electroless Ni/immersion Au (ENIG), respectively. Pb-free Sn-3.0 Ag and Sn-3.0 Ag-0.5 Cu solders were used as interlayers. In order to determine the optimum bonding conditions, such as bonding force, time, and temperature, a 90° peel test of the FPCB-RPCB joint was conducted. The relationships between the bonding conditions and peel strength were investigated. We successfully accomplished the thermo-compression bonding of reliable FPCB-RPCB joints by using Sn-Ag and Sn-Ag-Cu interlayers. The thermo-compression bonding method is a stable and well-controlled process and can produce robust and reliable connections.

In this study, we investigated the effect of the current density on the interfacial reaction and mechanical reliability of an electroless Ni/immersion Au (ENIG) substrate with Sn-3.5Ag solder. We first evaluated the interfacial reactions of the solder joint under aging for up to 800h and current stressing with current densities of 3x10^2A/cm^2 and 5x10^3A/cm^2. Also, we successfully revealed the correlation between the interfacial reaction behavior and mechanical reliability under current stressing. With increasing aging time, the thickness of the Ni"3Sn"4 layer increased. At both low and high current densities, the thickness of the Ni"3Sn"4 layer increased up to 400h and decreased thereafter at the cathode, while that of the IMC increased up to 800h at the anode. After the die shear test, the ductile fracture was observed in the as-reflowed joint without current stressing. The fracture mode changed from ductile fracture to brittle fracture when thermal aging and current flow were simultaneously applied. The combination of the current stressing and isothermal aging at high temperature significantly deteriorated the mechanical reliability of the solder joint.

In this study, the effect of a Ni-Cr seed layer on the adhesion strength of flexible copper clad laminate (FCCL) was evaluated after thermal treatment. The changes in the chemical composition, morphology and adhesion property were characterized by scanning electron microscopy (SEM), energy dispersive X-ray spectroscopy (EDS), electron probe micro analyzer (EPMA), X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM) and 90^o peel test. The peel strength of the FCCLs was significantly affected by the thermal treatment and the FCCL with a higher peel strength had a higher thermal stability than that with a lower peel strength. The roughness of the fracture surface for the FCCLs decreased with increasing thermal treatment temperature and holding time. The thermal treatment of the FCCL increased the ratio of the C-N bonds and reduced that of the C-O and carbonyl (C?O) bonds in the polyimide.

This study examined the interfacial reaction in Sn–3.5Ag/electroless Ni(P) solder joints using in situ transmission electron microscopy (TEM). In situ TEM confirmed that the thickness of the ternary layer increased by approximately 70 nm. A new interfacial reaction layer (Ni3P) formed in the P-rich Ni layer/Ni(P) interface. Several Ni–P compounds that formed in the reflow process changed into the stable Ni3P phase. This suggests that the P-rich Ni layer acts as a diffusion barrier layer between the intermetallic compounds and the Ni(P) layer during the annealing process.

This study examined the interfacial reaction in Sn-3.5Ag-0.7Cu/electroless Ni (P) solder joints using various TEM techniques. TEM confirmed that three types of intermetallic compounds (Ag3Sn, (Cu, Ni)6Sn5 and (Ni, Cu)3Sn4) formed in the solder joints. In addition, interfacial reaction layers between the IMCs and the electroless Ni (P) are composed of two reaction layers (ternary and P-rich Ni layers). The ternary layer is composed of orthorhombic Ni2SnP phase and the P-rich Ni layer is dominantly composed of Ni3P. Furthermore, Kirkendall voids were clearly observed in the ternary layer and P-rich Ni layer. The Sn has diffused preferentially along the grain boundaries in the (Ni,Cu)3Sn4 IMCs.

The hygrothermal and mechanical reliability of board-level packages with various underfills under sequential temperature and humidity (TH) testing and drop testing were investigated. Board-level packages with underfill had greater resistance to drop shock than that without underfill, indicating that underfill protects the package from failure by absorption of the applied drop shock. The underfill, which was composed of polypropylene glycol epoxy resin and silane, exhibited good reliability for drop shock because of the improved adhesion of the underfill compared with that without the polypropylene glycol epoxy resin and silane. In addition, the drop reliability of board-level packages with underfill decreased with increasing TH test duration. Adhesion between the substrate and underfill or between the solder and underfill was decreased by moisture absorption. Components positioned at the board center were more susceptible to failure by drop shock than were corner components.

In this study, we investigated the phenomenon of electrochemical migration (ECM) on a silicon (Si) substrate with a silver pattern directly printed using the screen-printing method. The microstructure and electrical characteristics of the directly printed Ag pattern under different sintering conditions were examined. In addition, the ECM characteristics of a directly patterned Ag circuit on a Si substrate were evaluated and compared with those of an immersion Ag circuit. Clusters were formed by interparticle necking during the sintering process; the cluster size in the patterns increased with increasing sintering temperature. The granular Ag films sintered at high temperatures had excellent electrical characteristics as a result of the formation of interparticle necking with sufficient size, despite the presence of porosity and large voids. The directly printed Ag pattern had lower resistance to ECM than the immersion Ag electrode.

This study examined the ternary Ni2SnP layer in Sn–3.5Ag–0.7Cu/electroless Ni (P) solder joints using in situ transmission electron microscopy (TEM). TEM confirmed the formation of an Ni2P phase underneath the ternary Ni2SnP after reflowing. We can directly observe the Sn diffused into Ni2P to form Ni2SnP during annealing in TEM. These results suggested that the ternary Ni2SnP forms through the diffusion of Sn into Ni2P. In addition, small Kirkendall voids were newly formed in the ternary Ni2SnP layer after annealing in TEM.

The adhesion strength of a Cu/Ni-Cr/polyimide flexible copper clad laminate (FCCL), which was manufactured via a roll-to-roll process, was evaluated according to the thickness of the Ni-Cr seed layer using a 90° peel test. The changes in the morphology, chemical bonding, and adhesion properties were characterized using a scanning electron microscopy (SEM), an atomic force microscopy (AFM), and an X-ray photoelectron spectroscopy (XPS). The thickness of the Ni-Cr (Ni:Cr = 80:20) seed layer in which the maximum peel strength of the FCCL was observed was 200A. The higher FCCL peel strength was attributed to the lower proportion of C-N bonds and higher proportion of C-O and carbonyl (C = O) bonds in the polyimide surface compared with the FCCL with a lower adhesion strength. The FCCL with a higher peel strength had a fractured polyimide surface with a higher surface roughness. The adhesion strength between the metal and polyimide was pirmarily attributed to the chemical interaction between the metal layer and the functional groups of the polyimide.