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Enhancement of Cu pillar bumps by electroless Ni plating
- Source :
- Microelectronic Engineering. 180:52-55
- Publication Year :
- 2017
- Publisher :
- Elsevier BV, 2017.
-
Abstract
- Cu pillar bumps were mechanically enhanced using electroless Ni plating for fine-pitch electronic packaging applications. The interfacial reaction and mechanical properties of the Ni-plated Cu pillar bump joints were evaluated. After reflowing, the plated Ni layer dissolved into the Sn-Ag solder caps. The Ni was incorporated into the interfacial reactions, forming a (Cu,Ni) 6 Sn 5 intermetallic compound on the Cu pillar bumps. Adding Ni to the Cu pillar bumps significantly affected the mechanical properties of the joint and increased the bump shear strength of the solder cap.
- Subjects :
- 010302 applied physics
Interfacial reaction
Materials science
Metallurgy
Pillar
Electronic packaging
Intermetallic
02 engineering and technology
021001 nanoscience & nanotechnology
Condensed Matter Physics
01 natural sciences
Atomic and Molecular Physics, and Optics
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
Soldering
Plating
0103 physical sciences
Shear strength
Electrical and Electronic Engineering
Composite material
0210 nano-technology
Layer (electronics)
Subjects
Details
- ISSN :
- 01679317
- Volume :
- 180
- Database :
- OpenAIRE
- Journal :
- Microelectronic Engineering
- Accession number :
- edsair.doi...........6285a5a05e086134487b4373648bbe26