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In this work, we have characterized by transmission electron microscopy techniques the structural properties of InAlAsSb/InGaAs/InP heterostructures, with target applications in high efficiency solar cells. Previous photoluminescence (PL) 1 analysis suggested the existence of compositional fluctuations in the active layer of these heterostructures. 220 bright field (BF) 2 diffraction contrast micrographs have revealed strong strain contrast in the InGaAs buffer layer, related to the existence of these compositional fluctuations. The effect of a decomposed buffer on the growth of the InAlAsSb layer has been analyzed through the simulation of the strain fields in the heterostructure using the finite elements method (FEM). 3 These simulations have shown that the strain in the buffer layer due to the compositional fluctuations only affects the first few nm of the InAlAsSb layer. The analysis by aberration corrected high angle annular dark field scanning transmission electron microscopy (HAADF-STEM) 4 and electron energy loss spectroscopy (EELS) 5 of the composition of the InAlAsSb layer reveals that any compositional fluctuation is only observed as an average effect, rather than in the form of clustering or atomically sharp transitions. The limitations of these techniques for the detection of small 3D compositional fluctuations are discussed.

The effect of a post-growth thermal treatment in two different heterostructures with InAlAsSb as the top layer grown by molecular beam epitaxy lattice-matched to InP, have been studied by diffraction contrast transmission electron microscopy (TEM). 1 This novel top cell layer material with application in ultra-high efficiency solar cells were grown on (001) InP substrate with or without an InGaAs buffer layer. Initial photoluminescence (PL) 2 measurements revealed deviations from their predicted bandgap, suggesting non-random atomic distribution of the quaternary layer. Then, a thermal annealing was performed at different temperatures and times. The effect on the structure of the InAlAsSb active layer caused by the new arrangement of layers and the post-growth annealing treatments has been reported. Our results show that the small compositional fluctuations of the as-grown heterostructures disappear after being annealed, and the bandgap energy correspondingly increases towards the predicted value.

The Bi content in GaAs/GaAs1 − xBi x /GaAs heterostructures grown by molecular beam epitaxy at a substrate temperature close to 340 °C is investigated by aberration-corrected high-angle annular dark-field techniques. The analysis at low magnification of high-angle annular dark-field scanning transmission electron microscopy images, corroborated by EDX analysis, revealed planar defect-free layers and a non-homogeneous Bi distribution at the interfaces and within the GaAsBi layer. At high magnification, the qHAADF analysis confirmed the inhomogeneous distribution and Bi segregation at the GaAsBi/GaAs interface at low Bi flux and distorted dumbbell shape in areas with higher Bi content. At higher Bi flux, the size of the Bi gathering increases leading to roughly equiaxial Bi-rich particles faceted along zinc blende {111} and uniformly dispersed around the matrix and interfaces. FFT analysis checks the coexistence of two phases in some clusters: a rhombohedral pure Bi (rh-Bi) one surrounded by a zinc blende GaAs1 − xBi x matrix. Clusters may be affecting to the local lattice relaxation and leading to a partially relaxed GaAsBi/GaAs system, in good agreement with XRD analysis.

The influence of post-growth annealing on the microstructure and photoluminescence (PL) of GaAsBi alloys grown on (3 1 1)B GaAs is analyzed. Conventional transmission electron microscopy (TEM) performed on as-grown samples evidence the presence of structural defects and a mosaic structure in the GaAsBi layer. A sequence of stacking faults at regions close to the GaAs/GaAsBi interface are observed in high resolution TEM images. After annealing at 473 K during 3 h the mosaic structure disappears, the presence of defects is reduced and the PL peak intensely enhances. © 2010 Elsevier B.V. All rights reserved.

3 páginas, 3 figuras.-- Progress in Applied Surface, Interface and Thin Film Science - SURFINT SREN II.-- PACS codes: 68.37.Lp; 81.05.Ea; 81.15.Hi, The compositional distribution of InAs quantum dots grown by molecular beam epitaxy on GaAs capped InAs quantum dots has been studied in this work. Upper quantum dots are nucleated preferentially on top of the quantum dots underneath, which have been nucleated by droplet epitaxy. The growth process of these nanostructures, which are usually called as quantum dots molecules, has been explained. In order to understand this growth process, the analysis of the strain has been carried out from a 3D model of the nanostructure built from transmission electron microscopy images sensitive to the composition., This work was supported by the Spanish MCI (TEC2008-06756-C03-02/TEC), CONSOLIDER CSD2009-00013, and the Junta de Andalucia (PAI research groups TEP-120 and TIC-145, project P08-TEP-03516).

The effect of growth interruption time on the structural properties of InAs/GaAs self-assembled quantum dots grown by molecular beam epitaxy on (3 1 1)B GaAs substrates is studied. Changes both in the density and the size of the dots in comparison with a sample without growth interruption are presented. The trends of both parameters with the interruption time are closely related to red shift and increased photoluminescence intensity observed in the set of samples. Growth interruption allows larger dots; however there is a limit after which dots exceed a critical size and become defective.

The structure and composition of single GaAsBi/GaAs epilayers grown by molecular beam epitaxy were investigated by optical and transmission electron microscopy techniques. Firstly, the GaAsBi layers exhibit two distinct regions and a varying Bi composition profile in the growth direction. In the lower (25 nm) region, the Bi content decays exponentially from an initial maximum value, while the upper region comprises an almost constant Bi content until the end of the layer. Secondly, despite the relatively low Bi content, CuPtB-type ordering was observed both in electron diffraction patterns and in fast Fourier transform reconstructions from high-resolution transmission electron microscopy images. The estimation of the long-range ordering parameter and the development of ordering maps by using geometrical phase algorithms indicate a direct connection between the solubility of Bi and the amount of ordering. The occurrence of both phase separation and atomic ordering has a significant effect on the optical properties of these layers. PACS: 78.55.Cr III-V semiconductors; 68.55.Nq composition and phase identification; 68.55.Ln defects and impurities: doping, implantation, distribution, concentration, etc; 64.75.St phase separation and segregation in.

The use of GaAsSbN capping layers on InAs/GaAs quantum dots (QDs) has recently been proposed for micro- and optoelectronic applications for their ability to independently tailor electron and hole confinement potentials. However, there is a lack of knowledge about the structural and compositional changes associated with the process of simultaneous Sb and N incorporation. In the present work, we have characterized using transmission electron microscopy techniques the effects of adding N in the GaAsSb/InAs/GaAs QD system. Firstly, strain maps of the regions away from the InAs QDs had revealed a huge reduction of the strain fields with the N incorporation but a higher inhomogeneity, which points to a composition modulation enhancement with the presence of Sb-rich and Sb-poor regions in the range of a few nanometers. On the other hand, the average strain in the QDs and surroundings is also similar in both cases. It could be explained by the accumulation of Sb above the QDs, compensating the tensile strain induced by the N incorporation together with an In-Ga intermixing inhibition. Indeed, compositional maps of column resolution from aberration-corrected Z-contrast images confirmed that the addition of N enhances the preferential deposition of Sb above the InAs QD, giving rise to an undulation of the growth front. As an outcome, the strong redshift in the photoluminescence spectrum of the GaAsSbN sample cannot be attributed only to the N-related reduction of the conduction band offset but also to an enhancement of the effect of Sb on the QD band structure.

This article is distributed under the terms of the Creative Commons Attribution Noncommercial License.-- This article is part of the series 8th International Workshop on Epitaxial Semiconductors on Patterned Substrates and Novel Index Surfaces., In this work, we present results on the formation of vertical molecule structures formed by two vertically aligned InAs quantum dots (QD) in which a deliberate control of energy emission is achieved. The emission energy of the first layer of QD forming the molecule can be tuned by the deposition of controlled amounts of InAs at a nanohole template formed by GaAs droplet epitaxy. The QD of the second layer are formed directly on top of the buried ones by a strain-driven process. In this way, either symmetric or asymmetric vertically coupled structures can be obtained. As a characteristic when using a droplet epitaxy patterning process, the density of quantum dot molecules finally obtained is low enough (2 × 108 cm−2) to permit their integration as active elements in advanced photonic devices where spectroscopic studies at the single nanostructure level are required., The authors wish to acknowledge to Spanish MICINN through projects Consolider-Ingenio 2010 QOIT (CSD2006-0019) and IMAGINE (CSD2009-00013), NANINPHO-QD (TEC2008-06756-C03-01/03 and 02), the Junta de Andalucía (PAI research group TEP-120 and project P08-TEP-03516) and CAM 2010 Q&CLight (S2009ESP-1503).

Evolution of the size, shape and composition of self-assembled InAs/InP quantum wires through the Stranski–Krastanov transition has been determined by aberration-corrected Z-contrast imaging. High resolution compositional maps of the wires in the initial, intermediate and final formation stages are presented. (001) is the main facet at their very initial stage of formation, which is gradually reduced in favour of {114} or {118}, ending with the formation of mature quantum wires with {114} facets. Significant changes in wire dimensions are measured when varying slightly the amount of InAs deposited. These results are used as input parameters to build three-dimensional models that allow calculation of the strain energy during the quantum wire formation process. The observed morphological evolution is explained in terms of the calculated elastic energy changes at the growth front. Regions of the wetting layer close to the nanostructure perimeters have higher strain energy, causing migration of As atoms towards the quantum wire terraces, where the structure is partially relaxed; the thickness of the wetting layer is reduced in these zones and the island height increases until the (001) facet is removed., This work was supported by the Spanish MCI (TEC2008-06756-C03-02 and 03, Consolider-Ingenio 2010 IMAGINE CSD2009-00013 and QOIT CSD2006-0019), the Junta de Andalucia (PAI research groups TEP-120 and TIC-145; project P08-TEP-03516), the CAM (Q&CLight S2009ESP-1503) and the Office of Basic Energy Sciences, Division of Materials Sciences and Engineering, US DOE (MV and SJP).

3 páginas, 3 figuras., In this work we report on the ability to form low density Ga(As)Sb quantum ring-shaped nanostructures (Q-rings) on GaAs(001) substrates by the droplet epitaxy technique. The Q-rings are formed by crystallization of Ga droplets under antimony flux. After being capped by a GaAs layer, these nanostructures show surface mounding features that are correlated with the buried nanostructures, as demonstrated by TEM analysis, permitting an easy surface location of the optically active Q-rings., The authors gratefully acknowledge the financial support by the Spanish MEC (TEC-2005-05781-C03- 01/-03, NAN2004-09109-C04-01/-03, Consolider-QOIT CSD- 2006-0019), CAM (S-505/ESP/000200), JA (TEP383) and by the European Commission through SANDIE Network of Excellence (No. NMP4-CT-2004-500101). P.A.G. thanks the I3P program.

5 páginas, 4 figuras., We determine the compositional distribution with atomic column resolution in a horizontal nanowire from the analysis of aberration-corrected high resolution Z-contrast images. The strain field in a layer capping the analysed nanowire is determined by anisotropic elastic theory from the resulting compositional map. The reported method allows preferential nucleation sites for epitaxial nanowires to be predicted with high spatial resolution, as required for accurate tuning of desired optical properties. The application of this method has been exemplified in this work for stacked InAs(P) horizontal nanowires grown on InP separated by 3 nm thick InP layers, but we propose it as a general method to be applied to other stacked nano-objects., This work was supported by the DOE Office of Basic Energy Sciences, Division of Materials Sciences and Engineering, the SANDiE European Network of Excellence (Contract No NMP4-CT- 2004-500101), the Spanish MEC (TEC2005-05781-C03- 01 y 02, NAN2004-09109-C04-01, Consolider-Ingenio 2010 CSD2006-00019), the CAM (S 0505ESP 0200) and the Junta de Andalucia (PAI research groups TEP-120 and TIC-145; project PAI05-TEP-00383).

To manufacture improved nanostructures for telecommunication devices which respond to increasing requirements of data transmission speed and stability, the self-assembly process is an interesting approach to be followed. In this context, the control of the morphology, position, composition and strain of the nano-objects constituting these nanostructures is a crucial factor to improve their functionality [1]. It is well known that, during the growth of stacked layers, the upper nano-objects are strongly influenced by the distribution and intensity of the heterogeneous strain field caused by the ones underneath. Key aspects such as substrate temperature and spacer layer thickness between layers alter the strain field at the growth surface and therefore the nucleation sites of the stacked nano-objects.

Reactive epitaxy of Co on vicinal Si(111) surfaces is found to be a flexible and a convenient method for the preparation of dense arrays of Co silicide quantum dots. In the present work, submonolayer amounts of Co were deposited at 800 K on vicinal and flat Si surfaces, analyzing the resulting structures by scanning tunneling microscopy. On vicinal Si(111) surfaces with relatively narrow (~40–100 Å) terrace width, such reactive epitaxy leads to self-assembled arrays of CoSi2 quantum dots with a sharp size distribution function. In contrast, the growth of Co on flat Si(111) results in an inhomogeneous array of dots mixed with a variety of silicide phases, This work was supported by the Office of Basic Energy Sciences, Division of Materials Sciences and Engineering, US DOE (MFC, MV and SJP), the SANDiE European Network of Excellence (Contract No. NMP4-CT-2004-500101), the Spanish MEC (TEC2005-05781-C03-01 y 02, NAN2004-09109-C04-01, Consolider-Ingenio 2010 CSD2006-00019 and -0004), the CAM (S 0505ESP 0200), and the Junta de Andalucia (PAI research groups TEP-120 and TIC-145; Project No. PAI05-TEP-00383)

Optical transitions in coupled $\mathrm{In}\mathrm{As}∕\mathrm{In}\mathrm{P}$ self-assembled quantum wires are studied within the single-band effective-mass approximation including effects due to strain. Both vertically and horizontally coupled quantum wires are investigated and the ground state, excited states, and the photoluminescence peak energies are calculated. Where possible, we compare with available photoluminescence data from which it was possible to determine the height of the quantum wires. An anticrossing of the energy of excited states is found for vertically coupled wires signaling a change of symmetry of the exciton wave function. This crossing is the signature of two different coupling regimes.

Type II emission optoelectronic devices using GaAsSb strain reduction layers (SRL) over InAs quantum dots (QDs) have aroused great interest. Recent studies have demonstrated an extraordinary increase in photoluminescence (PL) intensity maintaining type II emission after a rapid thermal anneal (RTA), but with an undesirable blueshift. In this work, we have characterized the effect of RTA on InAs/GaAs QDs embedded in a SRL of GaAsSb by transmission electron microscopy (TEM) and finite element simulations. We find that annealing alters both the distribution of Sb in the SRL as well as the exchange of cations (In and Ga) between the QDs and the SRL. First, annealing causes modifications in the capping layer, reducing its thickness but maintaining the maximum Sb content and improving its homogeneity. In addition, the formation of Sb-rich clusters with loop dislocations is noticed, which seems not to be an impediment for an increased PL intensity. Second, RTA produces flatter QDs with larger base diameter and induces a more homogeneous QD height distribution. The Sb is accumulated over the QDs and the RTA enlarges the Sb-rich region, but the Sb contents are very similar. This fact leaves the type II alignment without major changes. Atomic-scale strain analysis of the nanostructures reveal a strong intermixing of In/Ga between the QDs and the capping layer, which is the main responsible mechanism of the PL blueshift. The improvement of the crystalline quality of the capping layer together with higher homogeneity QD sizes could be the origin of the enhancement of the PL emission.

The optical and structural properties of GaAsBi bulk and quantum well (QW) samples grown under various conditions were studied by photoluminescence (PL), high resolution x-ray diffraction (HR-XRD) and transmission electron microscopy (TEM). At 10 K, the 90 nm bulk sample shows two PL peaks at 1.18 and 1.3 eV. The temperature and power dependent PL data suggest that both PL peaks originate from the GaAsBi layer which consists of two regions with different Bi concentrations. The TEM images verify that the Bi concentration decreases monotonically across the layer, showing a high Bi concentration (~0.053) close to the bottom interface which then reduces to ~0.02 for thicknesses >25 nm. Besides, the high Bi content region cannot be detected by HR-XRD due to a broad and weak diffraction intensity. For multiple QW samples, a similar Bi profile was also observed in which the first well has a significantly higher Bi content compared to the other wells. The energy separation between the PL peaks is 0.12 eV and is consistent with the energy difference observed for the bulk sample. However, two PL peaks were not observed in the other GaAsBi bulk sample which was grown under different conditions, showing the importance of growth optimizations.

The distribution of bismuth in InAs1-xBix/GaAs quantum dots is analyzed by atomic-column resolution electron microscopy and imaging simulation techniques. A random Bi distribution is measured in the case of

The effect of low N-alloying on the structure of capped InAs/GaAs quantum dots is analyzed by transmission electron microscopy related techniques. A statistical study of interplanar distances in InAsN quantum dots shows an increase in the lattice parameter compared to the InAs case. We suggest that the addition of nitrogen blocks the Ga/In exchange processes during the quantum dot capping process, leading to an In enrichment. The observed strong photoluminescence redshift of InAsN structures must therefore be attributed not only to the effect of nitrogen in the band gap, but also to a minor depletion of indium during the capping process.

A novel peak finding method to map the strain from high resolution transmission electron micrographs, known as the Peak Pairs method, has been applied to In(Ga)As/AlGaAs quantum dot (QD) samples, which present stacking faults emerging from the QD edges. Moreover, strain distribution has been simulated by the finite element method applying the elastic theory on a 3D QD model. The agreement existing between determined and simulated strain values reveals that these techniques are consistent enough to qualitatively characterize the strain distribution of nanostructured materials. The correct application of both methods allows the localization of critical strain zones in semiconductor QDs, predicting the nucleation of defects, and being a very useful tool for the design of semiconductor devices.