1. Plume shielding effects in ultrafast laser surface texturing of silicon at high repetition rate in air
- Author
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Loredana Parlato, Jijil Jj Nivas, Rosalba Fittipaldi, Salvatore Amoruso, Mohammadhassan Valadan, Carlo Altucci, Antonio Vecchione, Elaheh Allahyari, Riccardo Bruzzese, Allahyari, E., JJ Nivas, J., Valadan, M., Fittipaldi, R., Vecchione, A., Parlato, L., Bruzzese, R., Altucci, C., and Amoruso, S.
- Subjects
Materials science ,Silicon ,General Physics and Astronomy ,chemistry.chemical_element ,02 engineering and technology ,Surface finish ,010402 general chemistry ,01 natural sciences ,law.invention ,Optics ,law ,Direct fs laser surface structuring ,Irradiation ,business.industry ,Laser fabrication method ,Surfaces and Interfaces ,General Chemistry ,021001 nanoscience & nanotechnology ,Condensed Matter Physics ,Laser ,0104 chemical sciences ,Surfaces, Coatings and Films ,Plume ,chemistry ,Femtosecond ,Electromagnetic shielding ,Laser processing at high repetition rate ,0210 nano-technology ,business ,Ultrashort pulse - Abstract
We analyze surface texturing induced by femtosecond laser irradiation of a silicon target at high repetition rates. The features of the produced surface structures in ablative conditions, i.e. at fluences larger than the ablation threshold, are investigated as a function of number of pulses and pulse energy, for various repetition rates, in the range 10 Hz–200 kHz. Our experimental findings highlight a significant influence of the pulse repetition rate on both surface texture and crater size produced by irradiation with a fixed sequence of N laser pulses. This effect is ascribed to plume shielding occurring at repetition rates larger than ≈10 kHz.
- Published
- 2019