1. Amorphous-to-Nanocrystalline Transition in Silicon Thin Films by Hydrogen Diluted Silane Using PE-CVD Method
- Author
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Ashok Jadhavar, Ashvini Punde, Ashish Waghmare, Sandesh Jadkar, Pratibha Shinde, Priti Vairale, Dinkar S. Patil, Nilesh Patil, Subhash Pandharkar, Vidya Doiphode, Mohit Prasad, Yogesh Hase, Ajinkya Bhorde, and Shruthi Nair
- Subjects
chemistry.chemical_compound ,Materials science ,chemistry ,Hydrogen ,Chemical engineering ,General Chemical Engineering ,chemistry.chemical_element ,Silicon thin film ,Silane ,Nanocrystalline material ,Amorphous solid - Abstract
Objective: Herein, we report the effect of variation of hydrogen flow rate on the properties of Si:H films synthesized using PE-CVD method. Raman spectroscopy analysis show an increase in crystalline volume fraction and crystallite size implying that hydrogen flow in PE-CVD promotes the growth of crystallinity in nc-Si:H films with an expense of a reduction in deposition rate. Methods: FTIR spectroscopy analysis indicates that hydrogen content in the film increases with an increase in hydrogen flow rate and hydrogen is predominantly incorporated in Si-H2 and (Si-H2)n bonding configuration. The optical band gap determined using E04 method and Tauc method (ETauc) show an increasing trend with an increase in hydrogen flow rate and E04 is found higher than ETauc over the entire range of hydrogen flow rate studied. Results and Conclusion: We found that the defect density and Urbach energy increases with an increase in hydrogen flow rate. Photosensitivity (σPhoto /σDark) decreases from ~103 to ~1 when hydrogen flow rate is increased from 30 sccm to 100 sccm and can be attributed to amorphous-to-nanocrystallization transition in Si:H films. The results obtained from the present study demonstrated that hydrogen flow rate is an important deposition parameter in PECVD to synthesize nc-Si:H films.
- Published
- 2021
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