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Hydrothermal liquefaction (HTL) of fractionated two types herbaceous biomass (kenaf and miscanthus) by dilute acid, organosolv, alkaline, or demineralization process was carried out under ethanol water co-solvent at 350 °C for 30 min to examine the biocrude yield and characteristics. The biocrude properties were comprehensively characterized by HPLC, elemental, GC-MS, and TGA analysis. Fractionation technologies before HTL effectively increased biocrude yield up to 38% compared to that of untreated herbaceous biomass (31%), except for organosolv fractionation of miscanthus, especially, HTL after alkaline fractionation showed high yield and energy recovery ratio up to 70%. Elemental analysis showed that HHV of biocrude was negatively affected by hydrolysis reaction of high lignin content after dilute acid fractionation. The GC-MS analysis revealed that carbohydrates-derived compound significantly increased in the biocrude obtained after organosolv and alkaline fractionation due to holocellulose increases through fractionation process. Additionally, TGA results indicated that the ratio of high-boiling-point compounds in biocrude obtained after demineralization was expanded compared with untreated due to ash removal, which could act as a catalyst.

Ethanol organosolv (EO) fractionation is a promising technology for producing high-purity lignin from kenaf, a lignocellulosic biomass. However, EO fractionation could not be used for the hemicellulose fraction because of the removal of hemicellulose into black liquor, which is a major drawback. Dilute hydrochloric acid (DHA) fractionation prior to EO fractionation has been proposed as a strategy to overcome this problem. In this study, the hemicellulose fraction of kenaf was maximally fractioned using 0.5% (w/w) HCl at 145 °C for 60 min. Subsequently, the non-washed and dried fibers, the cellulose-lignin fraction, were also fractionated to extract lignin using 60% (v/v) ethanol at 180 °C for 60 min through an optimization process. In each fractionation process, hemicellulose and lignin were removed at 86.11 and 68.86 % from untreated kenaf, respectively. Thus, DHA and EO fractionations are effective procedures to separate the lignin (94.73% purity) and hemicellulosic hydrolysate (19.65 g/L sugar) fractions in addition to cellulose-rich solid (glucan content 80.05%).

Yellow poplar sawdust (YPS), a wood waste that can be easily collected from a local furniture factory, was fractionated using continuous twin screw-driven reactor for high hemicellulosic sugar recovery. The highest total sugar yields were attained under the following conditions: a barrel temperature of 127°C, sulfuric acid concentration of 0.8wt%, liquid feeding rate of 25mL/min, solid feeding rate of 2.0g/min, screw rotation speed of 25rpm, and residence time of 14.5min. The glucan and hemicellulose contents of the CTSR-fractionated YPS were 47.8% and 10.4%, respectively, and these results indicated that 44.9% of cellulose and 76.3% of the hemicellulose were extracted into liquid hydrolyzate. Meanwhile, the batch fractionation of YPS at the same reaction conditions showed a little fractionation effect, i.e., only 20.5% of hemicellulosic sugar yield was obtained.

Precipitation behavior and its effect on hydrogen embrittlement during tempering process of hot-rolled API steel designed with 0.4 wt% Cr and 0.25 wt% Mo were investigated. The base steel was normalized and then tempered at 650 °C for up to 60 min. The precipitation behavior of the examined steel was explored using transmission electron microscopy (TEM) analysis, and it was found that the precipitation sequence during tempering at 650 °C were as follows: MX+M 3 C→MX→MX+M 7 C 3 +M 23 C 6 . The change of particle fraction was measured by electrolytic extraction technique. At the early stage of tempering, the particle fraction greatly decreased due to dissolution of M 3 C particle, and increased after 10 min by the precipitation of M 7 C 3 and M 23 C 6 particles. The particle fraction showed a peak at 30 min tempering and decreased again due to the dissolution of M 7 C 3 particle. Vickers hardness tests of base steel and tempered samples were carried out, and then the hardness was changed by accompanying with the change of particle fraction. The sensitivity of hydrogen embrittlement was evaluated through hydrogen induced cracking (HIC) tests, and the results clearly proved that HIC resistance of tempered samples was better than that of base steel due to the formation of tempered martensite, and then the HIC resistance changed depending on the precipitation behavior during tempering, i.e., the precipitation of coarse M 23 C 6 and M 7 C 3 particles deteriorated the HIC resistance.

Hydrothermal liquefaction (HTL) is a promising technology of producing biocrude from biomass. The operating condition of HTL using Korean native kenaf (KNK) was investigated and all products were analyzed to determine the condition for highest biocrude production. The effect of reaction time (15−120 min), temperature (250−350 °C), and alkali loading (0−5 wt%) on biocrude yield were also examined. The condition to obtain highest biocrude yield was determined to be 350 °C and 1 % by weight NaOH for 30 min with a biocrude yield of 23.74 %. This result indicated that the biocrude yield was increased with increasing the reaction temperature, but near critical point and high alkali loading above 3 wt% had an adverse effect on it.

Discrepancies remain about nature of dislocation-interstitial interaction governing yielding discontinuity in fcc materials. Here, we show that outward diffusion of nitrogen from stacking fault (SF) into matrix causes strain redistribution, leading to lowering stacking fault energy. Local fluctuation of nitrogen promotes fault growth coupled with nitrogen-enriched zone, contributing to enhanced plasticity.

A combined ball milling and ethanol organosolv process is proposed for the pretreatment of three types of herbaceous biomass, giant miscanthus, corn stover, and wheat straw. The combined pretreatment was effective at both removing lignin and increasing the glucan content. After 120 min pretreatment, the glucan content increased to 63.09%, and 55.89% of the acid-insoluble lignin was removed from the giant miscanthus sample. The removal of cellulose, hemicellulose, and acetyl groups were correlated with the removal of lignin. The pretreatment of corn stover showed the highest removal of cellulose, but this was dependent on the removal of acid-insoluble lignin. The slope of the regression lines, which shows the correlation between the removal of lignin and cellulose, was lower than other correlations. The changes in biomass size were analyzed using size distribution graphs. With increasing pretreatment time, the particle size reduction improved in the three types of herbaceous biomass. Because of the combined physicochemical pretreatment, the enzymatic digestibility improved, and a maximum of 91% glucan digestibility was obtained from the pretreated corn stover when 30 FPU/g-glucan enzyme was added. Finally, compositional analysis of the recovered lignin from the remaining black liquor was investigated.

In order to produce bioethanol from yellow poplar sawdust without detoxification, deacetylation (mild alkali treatment) was performed with aqueous ammonia solution. To select the optimal conditions, deacetylation process was carried out using different conditions: NH4OH loading (2–10% (w/v)) and solid-to-liquid ratio (1:4–10) at 121 °C for 60 min. In order to assess the effectiveness of deacetylation, fractionation of deacetylated yellow poplar sawdust was performed using dilute acid (H2SO4, 0.5–2.0% (w/v)), reaction temperature (130–150 °C) and time (10–80 min). The toxicity-reduced hemicellulosic hydrolysates that were obtained through a two-step treatment at optimized conditions were fermented using Pichia stipitis for ethanol production, without any further detoxification. The maximum ethanol production was 4.84 g/L, corresponding to a theoretical ethanol yield of 82.52%, which is comparable to those of intentionally made hydrolyzates as controls.

Extractions of hard- and softwood chips were carried out using green liquor with varying alkali charges (1%, 3%, and 5% on dry wood weight). The pulp yield of a mill was sustained while producing a by-product stream of extracted hemicellulose. The extractions were performed at 180 °C for 18 min and the pre-pulping extracts contained mostly xmg (= xylose + mannose + galactose), acetic acid, and formic acid. We investigated the use of a liquid extractive agent in removing fermentation inhibitors. The extraction potential of each solvent was examined at an organic to aqueous phase ratio of 1:1. The liquid–liquid extractions were performed at different temperatures (25–65 °C) and pH values (0.5–3.5) for 36 min. The extraction potentials of trioctylphosphine oxide (TOPO) and trialkylphosphine oxide (TAPO) were compared to determine their application in industrial-scale extraction. It was determined that the acetic acid extraction efficiency of TAPO was higher than that of TOPO. The maximum acetic acid extraction yields for the extracts derived from hard- and softwood were 83.1% and 82.1%, respectively, using TAPO as an extractant at 25 °C and pH 0.5.

Objectives: Vitamin D deficiency has been shown to influence the development of some cardiovascular disease. In this study, the association between the existence of coronary artery plaque and vitamin D was examined among participants who were not previously diagnosed with coronary artery disease. Methods: A total of 339 participants (246 men and 93 women) who visited a health examination center for check-up including blood test for serum vitamin D level and coronary computed tomography angiography (CCTA) were selected for this study. Results: Among the total 339 participants, 106 displayed coronary artery plaques. The serum 25-hydroxy vitamin D (25(OH)D) level of the group with plaque was lower than that of the group without (17.7 ± 7.72 ng/mL vs. 19.6 ± 7.12 ng/mL, P = 0.0316). The group with plaque had higher incidence rates of diabetes mellitus, hypertension, and dyslipidemia than that without (P = 0.0078, P = 0.0065, and P = 0.0174, respectively). The former displayed higher serum glucose and glycated hemoglobin levels than the latter (P = 0.0055 and P = 0.0137, respectively). The group with plaque showed higher systolic and diastolic blood pressure than that without (P

This study was carried out to find out the optimum method of preparation of indigo standard solution and its stability, and to investigate the indigo contents in Niram, blue dye extract, from a total of 7 indigo plants and 34 breeding lines of Persicaria tinctoria H. Gross. Proper solvent for indigo standard was dimethyl sulfoxide (DMSO), and appropriate concentration was 1 ㎎ of indigo in 10 mL of DMSO. Absorbance value of UV/Vis Spectrophotometer at 620 ㎚ of standard solution was changed decreasingly 12 hours after the preparation of standard solution irrespective of the storage conditions such as temperature and light. Average value of absorbance of 8-fold diluted standard solutions prepared daily during 16 days was 0.210 ± 0.005, indicating the powder of indigo compound was stable chemically. Calibration curve was made for quantitative analysis of indigo of 7 Niram samples, and indigo contents ranged from 0.69% to 18.76% showing relatively larger variation. Across all 34 breeding lines, the range of indigo content was from 7.9 ㎎ to 56.4 ㎎ per 100 g of fresh leaves, averaging 25.2 ㎎ of indigo content and showing a 47.7% coefficient of variation.

The effect of Ca treatment on hydrogen-induced cracking (HIC) resistance of hot rolled pipeline steel was evaluated. HIC testing was carried out in acidic condition according to NACE standard; results clearly prove that HIC resistance is very sensitive to Ca/S ratio. When Ca/S ratio is below the stoichiometric ratio, HIC occurred at mid-thickness of the steel regardless of the S content. This is closely related to the formation of spherical CaS inclusion with Ca treatment instead of MnS inclusion, which acts on crack initiation sites.

In this study, Hydrogen Induced Cracking (HIC) testing of high strength API 5L grade X70 linepipe hot rolled steel containing Ti was performed to investigate the effects of (Nb, Ti, V)(C, N) particles on HIC susceptibility. By controlling chemical composition and hot rolling parameters, experimental steel with Bainitic ferrite and Bainite microstructures was fabricated. HIC testing was carried out within an acidic condition (pH=2.7±0.1) according to NACE standards with test results showing cracking propagated along coarse (Nb, Ti, V)(C, N) particles at mid-thickness. This is mainly due to centerline segregation and hydrogen blistering between matrix and coarse (Nb, Ti, V)(C, N) particles without external stress.

Jeung-pyun was irradiated at 0, 5, 10 kGy and pH, reducing sugar, microbiological quality, texture profile analysis and sensory quality were investigated during storage for 2 weeks at . Irradiation significantly reduced total bacteria counts and indicated an increase in hardness with increasing irradiation dose. Treatments with 5, 10 kGy did not cause significant change in the PH, reducing sugar, but pH, reducing sugar, microbacterial counts in 0 kGy were increased during storage. Main putrefactive microorganisms of Jeung-pyun were identified as Bacillus subtlis. In texture profile analysis, cohesiveness and chewiness of all irradiated samples were observed to reduce during storage. In the result of sensory evaluation, the irradiated samples had higher scores than non-irradiated samples after 4 days.

Ssamjang samples were prepared by central composite design for five independent variables, Gochujang mash aging period , Doenjang aging period , Doenjang content , sterilization temperature and storage temperature . Browning characteristics of Ssamjang were analyzed such as water activity, free amino acids, free sugars and color during storage. Water activities of Ssamjang were ranged from 0.605 to 0.666 at the beginning of storage, and were shown to be the highest at the 8th week of storage and then decreased gradually. Among free amino acids the content of glutamic acid was the highest. Proline, leucine, phenylalanine, lysine and serine were slightly higher than the others. Larger amounts of free amino acids and free sugars were observed from the sample sterilized at when compared to that at . Glucose, fructose and maltose as free sugars were identified from Ssamjang and glucose content was the largest among. During the storage, lightness , redness and yellowness of Ssamjang were decreased and total color difference was increased. The color changes in the sample surface were more affected by temperature of which storage temperature was more influenced than sterilization temperature.

We have designed and synthesized peculiar copolymers of norbornene-alt-malefic anhydride derivatives for 193nm lithography.1, 2 These polymers were synthesized by copolymerization of norbornene-malefic anhydride and substitution reaction with bulky alicyclic acid-labile protecting groups. They showed a good physical properties such as high thermal stability and high transmittance for 193nm UV light. Also, photoresists made of our polymers showed a good pattern profile, high resolution, high dry-etching resistance. In this study, we have investigated several polymers and photoresists for line-and-space lithography and contact-hole one.

This study investigates the effects of different pre-pulping extraction conditions on two types of raw material, hardwood oak chips and softwood pine chips. The chips were air-dried, and 2-g samples were extracted in a Dionex ASE-200 with alkaline solutions of a partially recovered form of kraft pulping liquor called green liquor (GL). The GL was applied at different alkali charges of 0–5 % on dry wood weight. The extractions were performed at various H-factors from 500 to 1100 with temperatures ranging from 170 to 190 °C. As the alkali charge decreased, the amount of monosaccharides in the extracts increased while the remaining solids decreased. The highest xylose + mannose + galactose (xmg) concentrations (12.73 and 11.12 g/L for extracts derived from hardwood and softwood, respectively) were detected with a hot water extraction (GL 0 %) at 180 °C and an H-factor of 900. However, low amounts of remaining solids were obtained under these conditions (65.77% and 74.42%, for hard- and soft woods, respectively). We also performed an extraction that was scaled-up in a 1-L Parr reactor with 80 g of woodchips under pre-optimized condition through ASE-200. In this condition, the xmg and acetic acid concentrations of the hardwood extracts were 9.74 and 9.94 g/L, respectively, whereas their concentrations in the softwood extracts were 3.59 and 3.76 g/L, respectively.

Soluble 1:1 alternating copolymers of p-tert-butylstyrene, p-(trimethyl silyl)styrene, p-(trimethylgermyl)styrene, and 3-vinylbenzyltrimethylsilane with sulfur dioxide have been synthesized by tert-butylhydroperoxide-initiated copolymerization at T < -60°C. Oxygen plasma etch resistance of poly[p-(trimethyl germyl)styrene sulfone resist is higher than that of poly[p-(trimetylsilyl)styrene sulfone resist by a factor of 4.5, and that of cresol-novolac by a factor of 9. Among the polysulfone resists, poly[p-(trimethylgermyl)styrene sulfone shows the best lithographic characteristics.

t-BOC protected hexakis(4-t-BOC-phenoxy)cyclotriphosphazene, TBP, was synthesized from a semiinorganic phosphazene compound and its acid-catalyzed thermal deprotection was utilized in the design of a three-component positive resist system based on the combined principles of chemical amplification and dissolution inhibition. The new resist system, PTPNS(NR/TBP/PAG), is formulated with novolac resin (NR), TBP and a photoacid generator (PAG). The dissolution characteristics of PTPNS in alkaline development are ideally suited for application to positive type resists which are based on a dissolution inhibition mechanism. The t-BOC protected TBP of the PTPNS resist system effectively acts as an acid-labile dissolution inhibitor of novolac resin when TBP concentration is more than 10% by weight. As a representative, PTPNS(100/15/5) (by weight parts) exhibited high sensitivity in the range of 20 to 25mJ/cm2 with contrast of 5 after exposure at 250nm light and PEB treatment at 100 to 130°C. Appropriately formulated PTPNS resist rendered positive-tone patterns down to sub-half micron with high sensitivity when the resist was exposed to KrF excimer laser or electron beam and developed with 2.38wt% tetramethylamonium hydroxide solution.

Four kinds of new t-BOC protected maleimide copolymers P(t-BOCMI/St), P(t-BOCMI/SiSt), P(t-BOCMI/t-BOCSt) and P(t-BOCOPMI/SiSt) were investigated as thermally stable, deep UV resists in high sensitivity. The resist polymers are composed of N-(t-butyloxycarbonyl)maleimide (t-BOCMI) or N-[p-(t-butyloxycarbonyloxy)phenyl]maleimide (t-BOCOPMI) and styrene derivatives (X-St) such as styrene (St), p-(t-butoxycarbonyloxy)styrene (t-BOCSt) and p-trimethylsilylstyrene (SiSt). The t-BOC protected copolymers have alternating structures and are readily deprotected by thermolysis and acidolysis to the corresponding polar maleimide (MI) and phenolic OH functions from t-BOCMI and t-BOC-oxyphenyl, respectively. The deprotected polymers P(MI/St), P(MI/SiSt), P(MI/HOSt) and P(HOPMI/SiSt) exhibit quite high Tg's above 245°C and high oxygen RIE resistance. In particular, the both silicon containing polymers P(MI/SiSt) and P(HOPMI/SiSt) are superior to a novolac photoresist in oxygen RIE resistance. The RIE resistance of the resist polymers in Cl2/He and CHF3/C2F6 gases are found to be comparable to the novolac resist. The three t-BOCMI copolymers have very low absorbance no more than 0.2 per μm at 248nm wavelength. The polymers P(t-BOCMI/St), P(t-BOCMI/SiSt), P(t-BOCMI/t-BOCSt) and P(t-BOCOPMI/SiSt) were compounded with 10wt% of triphenylsulfonium hexafluoroantimonate as a photoacid generator and the resists are named as MIST, MISIX, BMIST and PMISIX, respectively. The resists films were exposed to deep UV or KrF excimer laser and post-exposure baked at 100°C followed by development with aqueous alkaline solutions for positive image-making to get sub-micron patterns.In the case of MISIX and PMISIX resists only negative tone images were possible by organic developing. Thus the t-BOC protected maleimide copolymers combine capability of high resolution with high sensitivity in deep UV region and thermal stability above 200°C along with high oxygen RIE resistance.

We have investigated new photoresist materials based on modified cycloolefin-maleic anhydride resin for 193nm lithography. Compared to COMA resin, the new resin offers several good properties such as UV transmittance, taper in pattern profile, PED stability and storage stability. The resist using the new resin showed good lithographic performances on ArF exposure tool. So, we obtained good hole patterns below 90nm with condition of exposure: PAS 5500/900 full field scanner, resist thickness: 320nm, development: 2.38% TMAH, for 40sec., Illumination: 0.61NA, conventional SOB: 110 degree(s)C/90sec, PEB:130 degree(s)C/90sec, on BARC. In this paper we will report on the properties of new polymer and will show the contact hole pattern that demonstrate progress in these areas.

Polyacrylate derivative was first developed as raw material for ArF resist and it was selected the first candidate in spite of some defects. Cycloolefin-maleic anhydride polymer[COMA] and other polymers were therefore given opportunity. The resist based on COMA shows a good dry-etch resistance compared with that based on acrylate polymer. However, the pattern profile of the resist formulated by using COMA has some defects such as taper and low resolution because of transmittance issue of the polymer. In order to solve the issue, we have developed a new polymer [It was named ROMA Resin]. The new polymer has good physical properties such as UV transmittance, stability during storage and moderate glass transition temperature. We also found that the pattern profile of the resist formulated by using the polymer shows good results in terms of pattern profile, CD SEM slimming and PED stability.

Photoresist using maleic anhydride/cycloolefin copolymer is a leading candidate for the 193 nm photolithography. Until recently, the efforts to improve 193 nm photoresist have been focused on resolution and dry-etch resistance. Therefore, we have synthesized some kinds of matrix resins and additives containing alicyclic group and acid labile group. The matrix resin is alternating copolymer obtained by free radical polymerization of maleic anhydride and cycloolefinic derivatives. And, the additives have a low molecular weight containing alicyclic group and acid labile group. The additives not only serve as dissolution inhibitors but also improve the pattern profile and dry-etch resistance. In this paper, we will describe the approaches to the resist materials, which are involved in our photoacid generator concept.

In order to develop a new series of chemically amplified photoresists for 193-nm lithography, norbornene substituted with a steroid derivative was copolymerized with maleic anhydride by free radical polymerization. The resulting polymers have excellent transmittance at 193 nm and possess good thermal stability up to 260 degrees C. The resist formulated with the polymers showed better dry-etching resistance than the conventional poly(hydroxystyrene) resist for Cl2/O2 plasma. With the standard developer, the resists from 0.15-0.20 micrometers patterns at doses of 5-18 mJ/cm2 using an ArF excimer laser stepper.

New matrix resins containing maleic anhydride and cycloolefin units for ArF excimer laser resist have been developed. Several series of these matrix resins having good dry-etching durability were prepared by free radical polymerization using AlBN as free radical initiator. All of the resists using the matrix resins revealed good coating uniformity and adhesion to silicon wafer, and were readily soluble in a variety of resist solvents such as MMP, EEP, PGMEA and EL. In preliminary 193 nm testing a resist formulated with the matrix resins sulfonium triflate as photoacid generator afforded positive images with 0.14 micrometers L/S resolution. In this paper, we will discuss the polymerization results and lithographic properties for 193 nm exposure tool.

Fully and partially pendant acetal group substituted polyvinylphenols were synthesized by the methods of free radical polymerization and chemical modification on polyvinylphenol, respectively. The glass transition temperature (Tg) of the partially acetal-substituted polyvinylphenols is in the range of 135 degrees to approximately 148 degrees Celsius, which is enough to overcome the thermal treatments for resist processing. The partially acetal- substituted polyvinylphenols are promising materials for chemically amplified negative tone deep UV photoresist.© (1996) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.

One:one alternating poly(p-trimethylgermylstyrene sulfone)s were obtained by tert- butylhydroperoxide initiated copolymerization of p-trimethylgermylstyrene with sulfur dioxide (SO2) at T < -60 degree(s)C. The molecular weight and polydispersity of the polysulfones were in the range of Mn equals 0.5 approximately 20 X 106 and Mw/Mn equals 1.8 approximately 5, respectively. The temperature of initial decomposition in nitrogen was 196 degree(s)C. Maximum UV absorption ((lambda) max) of the polysulfone was at 228 nm ((epsilon) max equals 16740 1/molcm of monomer unit). The polysulfone was found to be positive acting resists sensitive to x-ray ((lambda) c equals 18.5 angstrom) and electron beam.

Free radical copolymerization of sulfur dioxide with phenylacetylene (PA) in o-dichlorobenzene was studied in a range of temperatures from 30 to 80oC as a function of total monomer concentration ([SO2] + [PA]). PA content in the copolymers increases with decreasing total monomer concentration and increasing temperature. Mw/Mn becomes sharper with decreasing the total monomer concentration, but does not depend upon feed compositions which are changed keeping total monomer concentration constant at 2, 4, and 6 mol/L, respectively. These results strongly indicate the existence of depropagation. Thermal decomposition of the copolymers happens more easily than PA homopolymer and the carbon-centered free radicals are detected during the decomposition. Reactivity of ∼ CHĊ(Ph) free radical (∼ PA · ) is also discussed.

Free radical copolymerization of SO2 with 1-alkynes (AY) was studied by evaluation of the copolymerization rate under controlled conditions of copolymerization temperature and monomer concentration product ([AY][SO2]). The poly(alkyne sulfone)s always contained equimolar units of SO2 and alkyne, regardless of the copolymerization conditions. Using 1-hexyne (HY) and 1-octyne (OY) as comonomers of SO2, the values of ceiling temperature (Tc) were determined: when [HY][SO2] = [OY][SO2] = 0.25 mol2/L2, the values of Tc were 90.5 and 84.5°C, respectively. Tc increases with increasing monomer concentration product. The activation energies for propagation (Ep) and depropagation (Ed) of the SO2-alkynes copolymerization system were investigated, using the SO2OY copolymerization system, and estimated to be 12.2 and 26.7 kcal/mol, respectively. The value of Ed is high compared with that of the copolymerization of SO2 and 1-butene (20.3 kcal/mol), demonstrating that the free radical endings (∼ OYSO2 and ∼ SO2OY) are difficult to depropagate, compared with those formed from the copolymerizaton of SO2 and 1-butene. ΔS and ΔHp, calculated from experiments, were found to be −37.7 cal/mol K and −14.3 kcal/mol, respectively

Free radical terpolymerization of 1-hexyne (HY), 1-hexene (HE) (or 1-butene) and sulphur dioxide was studied with respect to the microstructure of the terpolymers by means of nuclear magnetic resonance and infrared and ultraviolet spectroscopies. The configuration of the double bond in the main chain was not affected by the presence of the ES (HESO 2 ) unit, but was always trans linkage. A linear correlation between v as(SO) and YS (HYSO 2 ) content in the terpolymers was observed. The mechanism of terpolymer formation is discussed.