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Start Over Author "Carmalt, C.J." Topic chemical vapour deposition
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1. Chemical vapour deposition of crystalline thin films of tantalum phosphide

Author

Blackman, C.S., Carmalt, C.J., Parkin, I.P., O'Neill, S.A., Molloy, K.C., and Apostolico, L.

Subjects
*CHEMICAL vapor deposition, *THIN films
Abstract

Tantalum phosphide coatings were prepared by chemical vapour deposition reaction of TaCl5 and PH2Cy at 350–500 °C. The films are hard, stable to corrosive environments and show reflection properties in the infrared. [Copyright &y& Elsevier]

Published
2003
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