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Chemical vapour deposition of crystalline thin films of tantalum phosphide
- Source :
-
Materials Letters . May2003, Vol. 57 Issue 18, p2634. 3p. - Publication Year :
- 2003
-
Abstract
- Tantalum phosphide coatings were prepared by chemical vapour deposition reaction of TaCl5 and PH2Cy at 350–500 °C. The films are hard, stable to corrosive environments and show reflection properties in the infrared. [Copyright &y& Elsevier]
- Subjects :
- *CHEMICAL vapor deposition
*THIN films
Subjects
Details
- Language :
- English
- ISSN :
- 0167577X
- Volume :
- 57
- Issue :
- 18
- Database :
- Academic Search Index
- Journal :
- Materials Letters
- Publication Type :
- Academic Journal
- Accession number :
- 9615502
- Full Text :
- https://doi.org/10.1016/S0167-577X(02)01341-1