1. Simulation Study of a p-GaN HEMT With an Integrated Schottky Barrier Diode
- Author
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Bo Yi, Wai Tung Ng, Wu Zheng, Junji Cheng, Wei Jia Zhang, and Haimeng Huang
- Subjects
Materials science ,business.industry ,Transistor ,Schottky diode ,High-electron-mobility transistor ,Cathode ,Electronic, Optical and Magnetic Materials ,law.invention ,Anode ,law ,Electrode ,Optoelectronics ,Electrical and Electronic Engineering ,business ,Current density ,Ohmic contact - Abstract
In this article, a novel p-GaN high-electron-mobility transistor (HEMT) with a built-in Schottky barrier diode (SBD) is proposed and investigated by TCAD simulation. The anode contact of the integrated SBD is isolated from the ohmic contact of the source electrode by a p-GaN isolation region. The cathode of the SBD is connected to the drain electrode. In the proposed Schottky barrier diode/HEMT (SB-HEMT), a channel under the p-GaN isolation region is turned on during forward conduction to further reduce the specific on-resistance ( $R_{{on},sp}$ ). With a minimum sacrifice on $R_{{on},sp}$ , the reverse on-state voltage, $V_{R-{on}}$ (at a current density of 50 mA/mm), for the SB-HEMT is reduced by 33% (from 2.43 to 1.62 V) when compared with a conventional HEMT (C-HEMT). Compared with the C-HEMT with a separate on-chip SBD (C-HEMT/SBD), the SB-HEMT shows much better trade-off between $V_{R-{on}}$ and $R_{{on},sp}$ . The total switching loss ( $E_{total}$ ) of the proposed SB-HEMT with resistive load is lower than that of the C-HEMT and is reduced by up to 21% when compared with that of the C-HEMT/SBD with different area ratio between the HEMT and SBD regions.
- Published
- 2021
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