1. Superior polarization retention through engineered domain wall pinning
- Author
-
Pankaj Sharma, Xuan Cheng, Matthew Weyland, Fan Ji, Valanoor Nagarajan, Daniel Sando, Vivasha Govinden, Dawei Zhang, and Jan Seidel
- Subjects
Ferroelectrics and multiferroics ,Information storage ,Materials science ,Science ,General Physics and Astronomy ,02 engineering and technology ,Epitaxy ,01 natural sciences ,Article ,General Biochemistry, Genetics and Molecular Biology ,Scanning probe microscopy ,Electric field ,0103 physical sciences ,Scanning transmission electron microscopy ,Electronic devices ,lcsh:Science ,Nanoscopic scale ,010302 applied physics ,Multidisciplinary ,business.industry ,General Chemistry ,021001 nanoscience & nanotechnology ,Polarization (waves) ,Ferroelectricity ,Spontaneous polarization ,Optoelectronics ,lcsh:Q ,0210 nano-technology ,business - Abstract
Ferroelectric materials possess a spontaneous polarization that is switchable by an electric field. Robust retention of switched polarization is critical for non-volatile nanoelectronic devices based on ferroelectrics, however, these materials often suffer from polarization relaxation, typically within days to a few weeks. Here we exploit designer-defect-engineered epitaxial BiFeO3 films to demonstrate polarization retention with virtually no degradation in switched nanoscale domains for periods longer than 1 year. This represents a more than 2000% improvement over the best values hitherto reported. Scanning probe microscopy-based dynamic switching measurements reveal a significantly increased activation field for domain wall movement. Atomic resolution scanning transmission electron microscopy indicates that nanoscale defect pockets pervade the entire film thickness. These defects act as highly efficient domain wall pinning centres, resulting in anomalous retention. Our findings demonstrate that defects can be exploited in a positive manner to solve reliability issues in ferroelectric films used in functional devices., The use of ferroelectric materials in memory device applications is held back by low retention times. Here, the authors demonstrate that by intentionally introducing defective nanoregions which increase the activation field for domain wall motion, retention times larger than a year can be achieved.
- Published
- 2020