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1. New Single Wafer Double Sided Spin Cleaning Method

Author

Hans-Jürgen Dipl.-Ing. Kruwinus, Reinhard Sellmer, Alfred Lechner, Jörg Leberzammer, Walter Starflinger, and Stefan Detterbeck

Subjects
Materials science, business.industry, Optoelectronics, General Materials Science, Nanotechnology, Wafer, Condensed Matter Physics, business, Atomic and Molecular Physics, and Optics, Spin-½
Published
2001
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