New Single Wafer Double Sided Spin Cleaning Method

Authors :: Hans-Jürgen Dipl.-Ing. Kruwinus
Reinhard Sellmer
Alfred Lechner
Jörg Leberzammer
Walter Starflinger
Stefan Detterbeck
Source :: Solid State Phenomena. :203-206
Publication Year :: 2001
Publisher :: Trans Tech Publications, Ltd., 2001.

Subjects :: Materials science
business.industry
Optoelectronics
General Materials Science
Nanotechnology
Wafer
Condensed Matter Physics
business
Atomic and Molecular Physics, and Optics
Spin-½

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