1. Effect of Sc2O3 Passivation Layer on the Electrical Characteristics and Stability of InSnZnO Thin-Film Transistors
- Author
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Sunbin Deng, Ruo-He Yao, Lei Lu, Wei Zhong, Kang Liangyun, Linfeng Lan, Rongsheng Chen, and Hoi Sing Kwok
- Subjects
Materials science ,Passivation ,business.industry ,Field effect ,chemistry.chemical_element ,Scandium oxide ,Electronic, Optical and Magnetic Materials ,Threshold voltage ,Pulsed laser deposition ,chemistry.chemical_compound ,chemistry ,Thin-film transistor ,Optoelectronics ,Electrical and Electronic Engineering ,Thin film ,business ,Indium - Abstract
We measure the electrical performance and stability of indium tin zinc oxide (ITZO) thin-film transistors (TFTs), respectively, covered with a passivation layer (PVL) of aluminum oxide (Al2O3) or scandium oxide (Sc2O3) prepared by pulsed laser deposition (PLD). The devices with the Sc2O3 PVL exhibit both satisfactory electrical performance and stability with a field effect mobility of 16.4 cm2/Vs, threshold voltage of 1.0 V, subthreshold swing of 0.09 V/decade, and especially, a minimum threshold voltage shift of 0.7 and −1.6 V under negative bias temperature stress (NBTS) and positive bias temperature stress (PBTS), respectively. This may be attributable to the suppression of oxygen vacancy formation and excellent capacity to protect the channel from environmental effects. Although the devices with the Al2O3 PVL show similar electrical performance, their stability is worse than that of the devices with Sc2O3. This shows the excellent potential of Sc2O3 thin films as a PVL.
- Published
- 2021