1. Rapid and Large-Scale Quality Assessment of Two-Dimensional MoS2 Using Sulfur Particles with Optical Visualization
- Author
-
Haotian Du, Jingying Zheng, Hongbing Zhan, Liying Jiao, Ziming Zhang, Fan Jiang, Baisheng Sa, and Wenhui He
- Subjects
Fabrication ,Materials science ,business.industry ,Mechanical Engineering ,chemistry.chemical_element ,Bioengineering ,Nanotechnology ,02 engineering and technology ,General Chemistry ,Chemical vapor deposition ,021001 nanoscience & nanotechnology ,Condensed Matter Physics ,Sulfur ,chemistry.chemical_compound ,Semiconductor ,Adsorption ,chemistry ,Monolayer ,General Materials Science ,Field-effect transistor ,0210 nano-technology ,business ,Molybdenum disulfide - Abstract
The efficient nondestructive assessment of quality and homogeneity for two-dimensional (2D) MoS2 is critically important to advance their practical applications. Here, we presented a rapid and large-area assessment method for visually evaluating the quality and uniformity of chemical vapor deposition (CVD)-grown MoS2 monolayers simply with conventional optical microscopes. This was achieved through one-pot adsorbing abundant sulfur particles selectively onto as-grown poorer-quality MoS2 monolayers in a CVD system without any additional treatment. We further revealed that this favorable adsorption of sulfur particles on MoS2 originated from their intrinsic higher-density sulfur vacancies. Based on unadsorbed MoS2 monolayers, superior performance field effect transistors with a mobility of ∼49 cm2 V-1 s-1 were constructed. Importantly, the assessment approach was noninvasive due to the all-vapor-phase and moderate adsorption-desorption process. Our work offers a new route for the performance and yield optimization of devices by quality assessment of 2D semiconductors prior to device fabrication.
- Published
- 2021