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38 results on '"Franck, Delmotte"'

1. Lifetime Stability and Microstructure Properties of Cr/B4C X-ray Reflective Multilayer Coatings

Author

Julien E. Rault, Evgueni Meltchakov, Franck Delmotte, Regina Soufli, Christopher C. Walton, Catherine Burcklen, Eric M. Gullikson, Jennifer Rebellato, Laboratoire Charles Fabry / Optique XUV, Laboratoire Charles Fabry (LCF), Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS), Lawrence Livermore National Laboratory (LLNL), Synchrotron SOLEIL (SSOLEIL), Centre National de la Recherche Scientifique (CNRS), and Lawrence Berkeley National Laboratory [Berkeley] (LBNL)

Subjects
Diffraction, Materials science, 010308 nuclear & particles physics, Chrominum, Biomedical Engineering, Analytical chemistry, Soft X-rays, Bioengineering, General Chemistry, Photon energy, Condensed Matter Physics, Microstructure, 01 natural sciences, 010309 optics, Diffusion layer, Boron Carbide, Multilayers, Electron diffraction, Transmission electron microscopy, 0103 physical sciences, [PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci], General Materials Science, Spectroscopy, Layer (electronics)
Abstract

International audience; This paper demonstrates that highly reflective Cr/B 4 C multilayer interference coatings with nano-metric layer thicknesses, designed to operate in the soft X-ray photon energy range, have stable reflective performance for a period of 3 years after deposition. The microstructure and chemical composition of layers and interfaces within Cr/B 4 C multilayers is also examined, with emphasis on the B 4 Con -Cr interface where a significant diffusion layer is formed and on the oxide in the top B 4 C layer. Multiple characterization techniques (X-ray reflectivity at different photon energies, X-ray pho-toelectron spectroscopy, transmission electron microscopy, electron diffraction and X-ray diffraction) are employed and the results reveal a consistent picture of the Cr/B 4 C layer structure.

Published
2019
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2. High efficiency Al/Sc-based multilayer coatings in the EUV wavelength range above 40 nanometers

Author

Jennifer Rebellato, Regina Soufli, Franck Delmotte, Evgueni Meltchakov, Eric M. Gullikson, Sébastien de Rossi, Laboratoire Charles Fabry / Optique XUV, Laboratoire Charles Fabry (LCF), Institut d'Optique Graduate School (IOGS)-Université Paris-Saclay-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Saclay-Centre National de la Recherche Scientifique (CNRS), Centre National d'Études Spatiales [Toulouse] (CNES), Lawrence Livermore National Laboratory (LLNL), and Lawrence Berkeley National Laboratory [Berkeley] (LBNL)

Subjects
[PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], Materials science, business.industry, Attosecond, Extreme ultraviolet lithography, 02 engineering and technology, 021001 nanoscience & nanotechnology, Laser, 01 natural sciences, Atomic and Molecular Physics, and Optics, law.invention, 010309 optics, Wavelength, Optics, Transmission electron microscopy, law, Extreme ultraviolet, 0103 physical sciences, Nanometre, Thin film, 0210 nano-technology, business, ComputingMilieux_MISCELLANEOUS
Abstract

In this Letter, we have developed new and highly efficient periodic multilayer mirrors Al/Sc, Al/Sc/SiC, and Mo/Al/Sc with optimized reflectance at wavelengths between 40 and 65 nm. We have reached record values in measured peak reflectance: 57.5% at 44.7 nm and 46.5% at 51 nm, with Al/Sc/SiC at near-normal incidence. Furthermore, to the best of our knowledge, we have achieved the largest reported bandwidth with Mo/Al/Sc at 57 nm and the narrowest bandwidth with Al/Sc at a 60 nm wavelength. These new and promising results demonstrate that Al/Sc-based multilayer coatings are excellent candidates for future generations of extreme ultraviolet (EUV) instruments for solar physics, EUV lasers, and attosecond science, in a wavelength range that has not been fully explored.

Published
2020
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3. Analyses of tabulated optical constants for thin films in the EUV range and application to solar physics multilayer coatings

Author

Regina Soufli, Franck Delmotte, Jennifer Rebellato, F. Auchère, Sébastien de Rossi, Xueyan Zhang, Evgueni Meltchakov, Laboratoire Charles Fabry / Optique XUV, Laboratoire Charles Fabry (LCF), Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS), Centre National d'Études Spatiales [Toulouse] (CNES), Lawrence Livermore National Laboratory (LLNL), Institut d'astrophysique spatiale (IAS), and Université Paris-Sud - Paris 11 (UP11)-Institut national des sciences de l'Univers (INSU - CNRS)-Centre National de la Recherche Scientifique (CNRS)

Subjects
Zirconium, [PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], Materials science, business.industry, Extreme ultraviolet lithography, chemistry.chemical_element, 02 engineering and technology, Boron carbide, 021001 nanoscience & nanotechnology, 01 natural sciences, Spectral line, 010309 optics, chemistry.chemical_compound, chemistry, Extreme ultraviolet, 0103 physical sciences, Silicon carbide, Transmittance, Optoelectronics, Thin film, [PHYS.COND]Physics [physics]/Condensed Matter [cond-mat], 0210 nano-technology, business, ComputingMilieux_MISCELLANEOUS
Abstract

The thin film optical constants are key parameters to carry out optical simulation or optimization of multilayer mirrors with high efficiency. However, for most materials, different sets of optical constants can be found in the literature especially in the EUV range, as these parameters are not as well-known in the EUV as in the visible or wavelength range. In this work, we have used several reflectance and transmittance measurements in the wavelength range from 10 nm to 60 nm. Different optical constant files have been tested and compared with the IMD simulation software. We will present some experimental spectra and theoretical simulations to highlight the existing problem on the reliability of optical constants sets and to discuss potential solutions. We focus our research on a few materials of particular interest in the EUV range such as aluminum, aluminum oxide, molybdenum, zirconium, magnesium, silicon carbide, and boron carbide. These analyses lead us to select the most reliable and accurate optical constants set, or to create the best one from the concatenation of existing data for each material of interest.

Published
2018
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4. Cr/B4C multilayer mirrors: Study of interfaces and X-ray reflectance

Author

Evgueni Meltchakov, Franck Delmotte, Regina Soufli, Muriel Thomasset, A. Jérome, François Polack, Catherine Burcklen, D. Dennetiere, Eric M. Gullikson, B. Capitanio, S. de Rossi, Laboratoire Charles Fabry / Optique XUV, Laboratoire Charles Fabry (LCF), Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS), Lawrence Livermore National Laboratory (LLNL), Synchrotron SOLEIL (SSOLEIL), Centre National de la Recherche Scientifique (CNRS), Center for X-Ray Optics [LBNL Berkeley] (CXRO), and Lawrence Berkeley National Laboratory [Berkeley] (LBNL)

Subjects
[PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], Materials science, business.industry, X-ray, General Physics and Astronomy, 02 engineering and technology, Sputter deposition, 021001 nanoscience & nanotechnology, 01 natural sciences, Mathematical Sciences, 010309 optics, Optics, Engineering, Absorption edge, Interference (communication), Transmission electron microscopy, 0103 physical sciences, Physical Sciences, [SPI.OPTI]Engineering Sciences [physics]/Optics / Photonic, 0210 nano-technology, business, Reflectometry, Layer (electronics), Refractive index, Applied Physics
Abstract

International audience; We present an experimental study of the effect of layer interfaces on the x-ray reflectance in Cr/B4C multilayer interference coatings with layer thicknesses ranging from 0.7 nm to 5.4 nm. The multilayers were deposited by magnetron sputtering and by ion beam sputtering. Grazing incidence x-ray reflectometry, soft x-ray reflectometry, and transmission electron microscopy reveal asymmetric multilayer structures with a larger B4C-on-Cr interface, which we modeled with a 1–1.5 nm thick interfacial layer. Reflectance measurements in the vicinity of the Cr L2,3 absorption edge demonstrate fine structure that is not predicted by simulations using the currently tabulated refractive index (optical constants) values for Cr.

Published
2016
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5. Soft x-ray optical constants of sputtered chromium thin films with improved accuracy in the L and M absorption edge regions

Author

A. Jérome, Farhad Salmassi, Catherine Burcklen, Julia Meyer-Ilse, Ian Vickridge, Jennifer Rebellato, Franck Delmotte, Regina Soufli, Emrick Briand, and Eric M. Gullikson

Subjects
Materials science, Analytical chemistry, General Physics and Astronomy, 02 engineering and technology, Sputter deposition, 021001 nanoscience & nanotechnology, Rutherford backscattering spectrometry, 01 natural sciences, XANES, 010309 optics, Absorption edge, 0103 physical sciences, Transmittance, Thin film, 0210 nano-technology, Absorption (electromagnetic radiation), Refractive index
Abstract

In this study, we determine with improved accuracy the complex index of refraction n = 1 − δ + iβ of sputtered chromium thin films for photon energies ranging from 25 eV to 813 eV. These data include the first absolute measurements of the absorption fine structure near the Cr-L edge. First, we verified by combining Rutherford Backscattering Spectrometry and grazing-incidence x-ray reflectometry that the sputtered thin films were pure Cr with a density consistent with tabulated values. Then, we demonstrated that the Cr surface oxide layer remains stable when the samples are exposed to air for up to 4 years. The Cr absorption coefficient β was determined from the transmittance of freestanding Cr thin films with various thicknesses, measured at the ALS synchrotron radiation source. A model is proposed to correct the transmittance data from the spectral contamination of the source. Finally, we used the new β values, combined with theoretical and tabulated data from the literature, in order to calculate the δ values by the Kramers-Kronig relation. The improvement in the accuracy of β values is demonstrated by the f-sum rule. An additional validation of the new Cr optical constants (δ, β) is performed by comparing the simulated and experimental reflectance of a Cr/B4C multilayer mirror near the Cr-L2,3 edge.

Published
2018
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6. Development of Al-based multilayer optics for EUV

Author

Marie-Françoise Ravet-Krill, Marc Roulliay, Evgueni Meltchakov, Françoise Varniere, Françoise Bridou, Y. Menesguen, S. de Rossi, Franck Delmotte, A. Jérome, Christophe Hecquet, Laboratoire Charles Fabry de l'Institut d'Optique / Scop, Laboratoire Charles Fabry de l'Institut d'Optique (LCFIO), Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS)-Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS), Laboratoire d'interaction du rayonnement X avec la matière (LIXAM), Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS), and ANR: ATTOMIX,ATTOMIX

Subjects
42.70.-a - 61.05.Cm - 68.35.Ct - 78.67.Pt - 81.07.-b, [PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], Materials science, business.industry, Superlattice, Extreme ultraviolet lithography, Synchrotron radiation, 02 engineering and technology, General Chemistry, Surface finish, 021001 nanoscience & nanotechnology, 01 natural sciences, 7. Clean energy, 010309 optics, chemistry.chemical_compound, Wavelength, Optics, chemistry, Stack (abstract data type), 0103 physical sciences, Silicon carbide, High harmonic generation, General Materials Science, 0210 nano-technology, business
Abstract

International audience; We report on the development of multilayer optics for the extreme ultra-violet (EUV) range. The optical performance of Al-based multilayer mirrors is discussed with regard to promising reflectivity and selectivity characteristics and the problems of the interfacial roughness for this type of multilayers. We demonstrate a possibility to reduce the average roughness by introducing additional metal layer (W or Mo) rather than depositing a buffer layer at each interface. We have prepared and tested Al/SiC, Al/W/SiC and Al/Mo/SiC multilayers of various periods for the spectral range from 15 to 40 nm, which is the range of increasing interest for high-order harmonic generation, synchrotron radiation and astrophysics. The structure of the three-component systems has been optimized in order to obtain the best reflectivity for each wavelength within the spectral range. We have shown that introduction of refractory metal in Al-based periodic stack can improve the optical performance of multilayer reflecting coatings designed for the EUV applications.

Published
2009
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7. Phase measurement of soft x-ray multilayer mirrors

Author

Angelo Giglia, Stefano Nannarone, Evgueni Meltchakov, Charles Bourassin-Bouchet, Franck Delmotte, Sébastien de Rossi, Laboratoire Charles Fabry / Optique XUV, Laboratoire Charles Fabry (LCF), Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS), Synchrotron SOLEIL (SSOLEIL), Centre National de la Recherche Scientifique (CNRS), CNR Istituto Officina dei Materiali (IOM), Consiglio Nazionale delle Ricerche [Roma] (CNR), and Equipex ATTOLAB, Agence Nationale de la Recherche (ANR3113EQPX30005).

Subjects
Photocurrent, Range (particle radiation), [PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], Materials science, business.industry, Mean free path, Phase (waves), chemistry.chemical_element, X-ray optics, 02 engineering and technology, Electron, 021001 nanoscience & nanotechnology, 01 natural sciences, Atomic and Molecular Physics, and Optics, 010309 optics, Optics, chemistry, Stack (abstract data type), soft x-ray, 0103 physical sciences, [PHYS.PHYS.PHYS-POP-PH]Physics [physics]/Physics [physics]/Popular Physics [physics.pop-ph], [SPI.OPTI]Engineering Sciences [physics]/Optics / Photonic, Scandium, 0210 nano-technology, business
Abstract

International audience; We propose a new model enabling the extraction of the phase of a multilayer mirror from photocurrent measure- ments in the soft x rays. In this range, the effects of the mean free path of the electrons inside the stack can no longer be neglected, which prevents the phase reconstruction by conventional photocurrent measurements. The new model takes into account this phenomenon and thus extends up to the x rays the applicability range of the technique. This ap- proach has been validated through a numerical and exper- imental study of chromium/scandium multilayers used near 360 eV. To our knowledge, this work constitutes the first measurement of the phase of a multilayer mirror in the soft x-ray range.

Published
2015
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8. La/B4C small period multilayer interferential mirror for the analysis of boron

Author

Françoise Bridou, Arnaud Jérôme, Philippe Jonnard, Jean-Michel André, C. Michaelsen, Franck Delmotte, Marie-Françoise Ravet, Elena O. Filatova, J. Wiesmann, Laboratoire de Chimie Physique - Matière et Rayonnement (LCPMR), Université Pierre et Marie Curie - Paris 6 (UPMC)-Centre National de la Recherche Scientifique (CNRS), Incoatec GmbH (INCOATEC), Incoatec, Laboratoire Charles Fabry de l'Institut d'Optique / Scop, Laboratoire Charles Fabry de l'Institut d'Optique (LCFIO), Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS)-Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS), Institute of Physics, St Petersburg State University (SPbU), Université Pierre et Marie Curie - Paris 6 (UPMC)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11), Laboratoire de Chimie Physique - Matière et Rayonnement ( LCPMR ), Université Pierre et Marie Curie - Paris 6 ( UPMC ) -Centre National de la Recherche Scientifique ( CNRS ), Incoatec GmbH ( INCOATEC ), Laboratoire Charles Fabry de l'Institut d'Optique ( LCFIO ), Université Paris-Sud - Paris 11 ( UP11 ) -Institut d'Optique Graduate School ( IOGS ) -Centre National de la Recherche Scientifique ( CNRS ) -Université Paris-Sud - Paris 11 ( UP11 ) -Institut d'Optique Graduate School ( IOGS ) -Centre National de la Recherche Scientifique ( CNRS ), and St Petersburg State University ( SPbU )

Subjects
[PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], [ PHYS.PHYS.PHYS-OPTICS ] Physics [physics]/Physics [physics]/Optics [physics.optics], Chemistry, business.industry, Analytical chemistry, Synchrotron radiation, Bragg's law, chemistry.chemical_element, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, BORO, 010309 optics, Crystal, Optics, Sputtering, [PHYS.COND.CM-GEN]Physics [physics]/Condensed Matter [cond-mat]/Other [cond-mat.other], 0103 physical sciences, 0210 nano-technology, Reflectometry, business, Boron, Spectroscopy, Diode
Abstract

This work was partly carried out at BESSY II in the framework of the project BESSY Number HPP33/150902 and supported by the European Commission under the ‘Human Potential Programme, Transnational Access to Major Research Infrastructures’, Contract No HPRI-1999-00028.; International audience; A La/B4C multilayer interferential mirror with small period d (4.8 nm) was produced by diode sputtering for the detection of the boron K emission by wavelength-dispersive x-ray spectrometry at a large Bragg angle (close to 45°). The structure of the mirror has been characterized by grazing incidence x-ray reflectometry, and its performance at the energy of the boron K emission (183 eV) was evaluated by means of polarized synchrotron radiation. A spectrometric measurement shows that the La/B4C mirror has improved the detection limit of boron using by a factor of 2 with respect to similar Mo/B4C mirrors, and by a factor of 4 with respect to a lead stearate crystal.

Published
2005
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9. Multilayer Mirrors for Coherent Extreme-Ultraviolet and Soft X-ray Sources

Author

Charles Bourassin-Bouchet, Franck Delmotte, Sébastien de Rossi, Laboratoire Charles Fabry / Optique XUV, Laboratoire Charles Fabry (LCF), Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS), and F. Canova, L. Poletto

Subjects
[PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], Soft x ray, Materials science, business.industry, Attosecond, Free-electron laser, Physics::Optics, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Characterization (materials science), 010309 optics, Optics, Extreme ultraviolet, 0103 physical sciences, Group delay dispersion, Femtosecond, [PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci], Physics::Atomic and Molecular Clusters, 0210 nano-technology, Focus (optics), business, ComputingMilieux_MISCELLANEOUS
Abstract

After a brief description of the theoretical principles of multilayer mirrors, we present the state of the art of experimental results obtained in the XUV range. We then focus on the specificities of multilayer mirrors for pico- and femtosecond sources, in terms of reflectivity, selectivity and stability. Finally, we report the recent advances in the development of multilayer mirrors for attosecond sources, from the design of the mirror to the characterization of such a component.

Published
2015
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10. Study of Cr/Sc-based multilayer reflecting mirrors using soft x-ray reflectivity and standing wave-enhanced x-ray fluorescence

Author

Françoise Bridou, Meiyi Wu, Catherine Burcklen, Philippe Jonnard, Franck Delmotte, Stefano Nannarone, Jean-Michel André, Karine Le Guen, Sébastien de Rossi, Angelo Giglia, Konstantin Koshmak, Evgueni Meltchakov, Laboratoire de Chimie Physique - Matière et Rayonnement (LCPMR), Université Pierre et Marie Curie - Paris 6 (UPMC)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Laboratoire Charles Fabry / Optique XUV, Laboratoire Charles Fabry (LCF), Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS), CNR Istituto Officina dei Materiali (IOM), Consiglio Nazionale delle Ricerche [Roma] (CNR), Laboratoire de Chimie Physique - Matière et Rayonnement ( LCPMR ), Université Pierre et Marie Curie - Paris 6 ( UPMC ) -Centre National de la Recherche Scientifique ( CNRS ), Laboratoire Charles Fabry / XUV, Laboratoire Charles Fabry ( LCF ), Institut d'Optique Graduate School ( IOGS ) -Centre National de la Recherche Scientifique ( CNRS ) -Université Paris-Sud - Paris 11 ( UP11 ) -Institut d'Optique Graduate School ( IOGS ) -Centre National de la Recherche Scientifique ( CNRS ) -Université Paris-Sud - Paris 11 ( UP11 ), CNR - Istituto Officina dei Materiali ( IOM ), Consiglio Nazionale delle Ricerche [Roma] ( CNR ), Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS)-Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS), and National Research Council of Italy | Consiglio Nazionale delle Ricerche (CNR)

Subjects
Materials science, multilayers, [ PHYS.COND.CM-MS ] Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci], X-ray fluorescence, 02 engineering and technology, 01 natural sciences, 010309 optics, Standing wave, Optics, Stack (abstract data type), x-ray standing waves, Cr/Sc, 0103 physical sciences, Deposition (law), [PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], Water window, [ PHYS.PHYS.PHYS-OPTICS ] Physics [physics]/Physics [physics]/Optics [physics.optics], x-ray fluorescence, business.industry, General Engineering, Bragg diffraction, Sputter deposition, soft x-ray reflectivity, 021001 nanoscience & nanotechnology, Atomic and Molecular Physics, and Optics, Characterization (materials science), [PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci], 0210 nano-technology, business, Luminescence
Abstract

International audience; We study Cr/Sc-based multilayer mirrors designed to work in the water window range using hard and soft x-ray reflectivity as well as x-ray fluorescence enhanced by standing waves. Samples differ by the elemental composition of the stack, the thickness of each layer, and the order of deposition. This paper mainly consists of two parts. In the first part, the optical performances of different Cr/Sc-based multilayers are reported, and in the second part, we extend further the characterization of the structural parameters of the multilayers, which can be extracted by comparing the experimental data with simulations. The methodology is detailed in the case of Cr/B4C/Sc sample for which a three-layer model is used. Structural parameters determined by fitting reflectivity curve are then introduced as fixed parameters to plot the x-ray standing wave curve, to compare with the experiment, and confirm the determined structure of the stack.

Published
2017
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11. High-efficiency B_4C/Mo_2C alternate multilayer grating for monochromators in the photon energy range from 07 to 34 keV

Author

Bruno Lagarde, Michael Krumrey, Fadi Choueikani, Muriel Thomasset, Françoise Bridou, Evgueni Meltchakov, Franck Delmotte, François Polack, Laboratoire Charles Fabry / Optique XUV, Laboratoire Charles Fabry (LCF), Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS), Synchrotron SOLEIL (SSOLEIL), Centre National de la Recherche Scientifique (CNRS), and Physikalisch-Technische Bundesanstalt [Berlin] (PTB)

Subjects
[PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], Materials science, business.industry, Bragg's law, Synchrotron radiation, 02 engineering and technology, Grating, Photon energy, 021001 nanoscience & nanotechnology, Diffraction efficiency, 01 natural sciences, Atomic and Molecular Physics, and Optics, law.invention, 010309 optics, Optics, Beamline, law, 0103 physical sciences, [PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci], [PHYS.PHYS.PHYS-INS-DET]Physics [physics]/Physics [physics]/Instrumentation and Detectors [physics.ins-det], 0210 nano-technology, business, Diffraction grating, ComputingMilieux_MISCELLANEOUS, Monochromator
Abstract

An alternate multilayer (AML) grating has been prepared by coating an ion etched lamellar grating with a B4C/Mo2C multilayer (ML) having a layer thickness close to the groove depth. Such a structure behaves as a 2D synthetic crystal and can reach very high efficiencies when the Bragg condition is satisfied. This AML coated grating has been characterized at the SOLEIL Metrology and Tests Beamline between 0.7 and 1.7 keV and at the four-crystal monochromator beamline of Physikalisch-Technische Bundesanstalt (PTB) at BESSY II between 1.75 and 3.4 keV. A peak diffraction efficiency of nearly 27% was measured at 2.2 keV. The measured efficiencies are well reproduced by numerical simulations made with the electromagnetic propagation code CARPEM. Such AML gratings, paired with a matched ML mirror, constitute efficient monochromators for intermediate energy photons. They will extend the accessible energy for many applications as x-ray absorption spectroscopy or x-ray magnetic circular dichroism experiments.

Published
2014
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12. Theoretical and experimental studies of broadband phase-controlled attosecond mirrors

Author

Elisabeth English, Thierry Ruchon, Franck Delmotte, Charles Bourassin-Bouchet, Diego Guenot, O. Gobert, Pascal Salières, Z. Diveki, Evgueni Meltchakov, Bertrand Carré, S. de Rossi, Service des Photons, Atomes et Molécules (SPAM), Commissariat à l'énergie atomique et aux énergies alternatives (CEA), Laboratoire Charles Fabry / Optique XUV, Laboratoire Charles Fabry (LCF), Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS), and Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS)-Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS)

Subjects
Physics, [PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], business.industry, Attosecond, Phase (waves), Physics::Optics, 01 natural sciences, Atomic and Molecular Physics, and Optics, 010309 optics, Optics, Pulse compression, 0103 physical sciences, Dispersion (optics), Phase response, Simulated annealing, Physics::Atomic and Molecular Clusters, High harmonic generation, Optoelectronics, Physics::Atomic Physics, 010306 general physics, business, Beam (structure)
Abstract

International audience; We present procedures to develop and characterise chirped multilayer mirrors for attosecond pulses. The design procedure involves a simulated annealing optimisation algorithm to obtain a multilayer structure with the desired performances. The characterisation step requires the use of well-calibrated attosecond and synchrotron beam lines, allowing one to measure the amplitude and phase response of the mirror. We illustrate these approaches with a set of mirrors designed to have zero or negative dispersion. The remarkable agreement between theoretical and experimental performances validates this overall process, and demonstrates the capability of such mirrors to control the temporal profile of attosecond pulses. These tools and techniques for developing attosecond chirped mirrors will facilitate the generalisation of such components on attosecond experiments.

Published
2014

13. Development of multilayer coatings for solar orbiter EUV imaging telescopes (Orale)

Author

Udo Strauch, Raymond Mercier, C. Dumesnil, Marc Roulliay, Arnaud Jérôme, Bruno Borgo, François Varnière, Françoise Bridou, Sébastien de Rossi, Evgueni Meltchakov, Frédéric Auchère, Xueyan Zhang, Franck Delmotte, Serge François, Laboratoire Charles Fabry / Optique XUV, Laboratoire Charles Fabry (LCF), Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS), Institut d'astrophysique spatiale (IAS), Centre National de la Recherche Scientifique (CNRS)-Institut national des sciences de l'Univers (INSU - CNRS)-Université Paris-Sud - Paris 11 (UP11), Institut des Sciences Moléculaires d'Orsay (ISMO), Centre National de la Recherche Scientifique (CNRS)-Université Paris-Sud - Paris 11 (UP11), Helmholtz-Zentrum Dresden-Rossendorf (HZDR), Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS)-Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS), Université Paris-Sud - Paris 11 (UP11)-Institut national des sciences de l'Univers (INSU - CNRS)-Centre National de la Recherche Scientifique (CNRS), and Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)

Subjects
Materials science, [PHYS.ASTR.IM]Physics [physics]/Astrophysics [astro-ph]/Instrumentation and Methods for Astrophysic [astro-ph.IM], Extreme ultraviolet lithography, 02 engineering and technology, engineering.material, 7. Clean energy, 01 natural sciences, law.invention, 010309 optics, Orbiter, chemistry.chemical_compound, Optics, Coating, law, 0103 physical sciences, Silicon carbide, [PHYS]Physics [physics], [PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], business.industry, Sputter deposition, 021001 nanoscience & nanotechnology, [PHYS.ASTR.SR]Physics [physics]/Astrophysics [astro-ph]/Solar and Stellar Astrophysics [astro-ph.SR], Wavelength, Optical coating, chemistry, Extreme ultraviolet, engineering, [PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci], 0210 nano-technology, business, [PHYS.ASTR]Physics [physics]/Astrophysics [astro-ph]
Abstract

International audience; Since more than 20 years, Laboratoire Charles Fabry and Institut d’Astrophysique Spatiale are involved in development of the EUV multilayer coating for solar imaging. Previous instruments, such as the SOHO EIT and STEREO EUVI telescopes, employed the Mo/Si multilayer coatings, which offered at that time the best efficiency and stability. We present here recent results of the development of highly efficient EUV multilayers coatings at 17.4 nm and 30.4 nm for the Solar Orbiter mission. New multilayer structures, based on a combination of three materials including aluminum, have been optimized both theoretically and experimentally. We have succeeded to reduce interfacial roughness of Albased multilayers down to 0.5 nm via optimization of the multilayer design and the deposition process. The EUV peak reflectance of Al/Mo/SiC and Al/Mo/B4C multilayer coatings reaches 56% at 17.4 nm, the highest value reported up to now for this wavelength. We have also optimized specific bi-periodic structures that possess two reflection bands in the EUV range with high spectral selectivity. The EUV reflectivity of these Al-based dual-band coatings are compared with the Si/Mo/B4C baseline coating for Solar Orbiter. Since the stability of reflecting multilayer coating is an important issue for space missions, we have also studied the temporal stability as well as the resistivity of the coatings to thermal cycling and to proton irradiation. Experimental results confirm that Al/Mo/SiC and Al/Mo/B4C multilayer coatings are good candidates for the Solar Orbiter EUV imaging telescopes.

Published
2013
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14. Preparation for B4C/Mo2C multilayer deposition of alternate multilayer gratings with high efficiency in the 0.5-2.5 keV energy range

Author

Fadi Choueikani, Françoise Bridou, Franck Delmotte, Pascal Mercère, Philippe Ohresser, Edwige Otero, Bruno Lagarde, François Polack, Laboratoire Charles Fabry / Optique XUV, Laboratoire Charles Fabry (LCF), Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS), Synchrotron SOLEIL (SSOLEIL), Centre National de la Recherche Scientifique (CNRS), and Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS)-Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS)

Subjects
Diffraction, History, Range (particle radiation), [PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], Materials science, Silicon, business.industry, chemistry.chemical_element, Substrate (electronics), Grating, 01 natural sciences, 010305 fluids & plasmas, Computer Science Applications, Education, 010309 optics, Optics, chemistry, Beamline, 0103 physical sciences, [PHYS.COND]Physics [physics]/Condensed Matter [cond-mat], Reflectometry, business, Deposition (law)
Abstract

International audience; This paper presents a study of B4C/Mo2C multilayers mirrors with the aim of using it in the achievement of Alternate MultiLayer (AML) grating. Such component allows a high efficiency in the 500-2500 eV energy range for the DEIMOS beamline. Multilayers were deposited on silicon substrate. They are characterized by reflectometry under grazing incidence. Numerical adjustments were performed with a model of two layers in the period without any interfacial. A prototype of AML grating was fabricated and characterized. The efficiency of the first order of diffraction was worth 15% at 1700 eV.

Published
2013
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15. How to focus an attosecond pulse

Author

M. M. Mang, Franck Delmotte, S. de Rossi, Pierre Chavel, Charles Bourassin-Bouchet, Clarendon Laboratory [Oxford], University of Oxford [Oxford], Laboratoire Charles Fabry / Optique XUV, Laboratoire Charles Fabry (LCF), and Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)

Subjects
Light, Attosecond, Physics::Optics, Radiation, 01 natural sciences, 010309 optics, Optics, Physics::Plasma Physics, 0103 physical sciences, Physics::Atomic and Molecular Clusters, High harmonic generation, Scattering, Radiation, Computer Simulation, Physics::Atomic Physics, 010306 general physics, Attosecond pulse, Lenses, Physics, [PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], Geometrical optics, business.industry, Pulse duration, Equipment Design, Attophysics, Models, Theoretical, Atomic and Molecular Physics, and Optics, Equipment Failure Analysis, business, Focus (optics)
Abstract

International audience; Attosecond experiments involving focusing of attosecond light pulses can suffer from a spread of the attosecond radiation both in space and time due to optical aberrations. We present a detailed numerical study of the distortions induced in the most common focusing geometries that make use of parabolic, spherical, toroidal and ellipsoidal mirrors. We deduce the consequences on the pulse duration and possible issues that could arise in applications of attosecond pulses. This should serve as a guideline for setting up attosecond focusing optics.

Published
2013
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16. X-ray properties and interface study of B4C/Mo and B4C/Mo2C periodic multilayers

Author

P. Mercere, Fadi Choueikani, B. Lagarde, Françoise Bridou, François Polack, Franck Delmotte, Evgueni Meltchakov, Laboratoire Charles Fabry / Optique XUV, Laboratoire Charles Fabry (LCF), Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS), Synchrotron SOLEIL (SSOLEIL), and Centre National de la Recherche Scientifique (CNRS)

Subjects
[PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], Materials science, Symmetric structure, Condensed matter physics, Period (periodic table), X-ray, 02 engineering and technology, General Chemistry, Sputter deposition, 021001 nanoscience & nanotechnology, 01 natural sciences, Characterization (materials science), 010309 optics, Crystallography, 0103 physical sciences, General Materials Science, 0210 nano-technology, Reflectometry, High-resolution transmission electron microscopy, Layer (electronics)
Abstract

International audience; We present a comparative study of B4C/Mo and B4C/Mo2C periodic multilayer structures deposited by magnetron sputtering. The characterization was performed by grazing incidence X-ray reflectometry at two different energies and high resolution transmission electron microscopy. The experimental results indicate the existence of an interdiffusion layer at the B4C-on-Mo interface in the B4C/Mo system. Thus, the B4C/Mo multilayers were modeled by an asymmetric structure with three layers in each period. The thickness of B4C-on-Mo interfacial layer was estimated about 1.1 nm. The B4C/Mo2C multilayers present less interdiffusion and are well modeled by a symmetric structure without interfacial layers. This study shows that B4C/Mo2C structure is an interesting alternative to B4C/Mo multilayer for X-ray optic applications.

Published
2013
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17. Design and fabrication of X-ray non-periodic multilayer mirrors: Apodization and shaping of their spectral response

Author

Franck Delmotte, B. Villette, Ph. Troussel, F. Bridou, Laboratoire Charles Fabry / Scop, Laboratoire Charles Fabry (LCF), Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS)-Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS), DAM Île-de-France (DAM/DIF), Direction des Applications Militaires (DAM), and Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)

Subjects
010302 applied physics, Physics, Nuclear and High Energy Physics, Total internal reflection, [PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], Fabrication, Photon, business.industry, Synchrotron radiation, Sputter deposition, 01 natural sciences, 010309 optics, Optics, Band-pass filter, Apodization, 0103 physical sciences, Plasma diagnostics, business, Instrumentation
Abstract

International audience; We have developed non-periodic Cr/Sc multilayer mirrors specifically designed to reflect energy photons between 2 and 4 keV with a pre-defined reflectivity profile. Furthermore, these mirrors have to work as filters in the 1-2 keV and 4-12 keV energy bandpass with a reflectivity as low as possible in these bandwidths. The mirrors were designed and optimized with the help of a commercial calculation code. Numerous combinations of layers have been investigated with two or three different materials in the multilayer. The interfacial effect, leading to thickness modifications, has been investigated. Layer thicknesses were accurately controlled, taking into account compaction effect at interfaces. The best results lead to non-periodic mirrors dedicated to work at 1.5° grazing incidence with a reflectivity above 15% in almost the entire energy range 2-4 keV and lower than 1% outside, except in the total reflection zone. The final choice of material was made from the experimental knowledge of corresponding layer deposited behavior. The multilayers have been deposited by magnetron sputtering. Grazing-incidence X-ray reflectance at 8.05 keV (0.154 nm) and at the Physikalisch-Technische Bundesanstalt laboratory (PTB) at the synchrotron radiation facility BESSY II in Berlin for X-ray reflectance over the whole range were used both in order to characterize the multilayers (thicknesses, complex indices, and roughnesses). The final results show good agreement with the requested reflectivity profile.

Published
2012
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18. Shaping of single-cycle sub-50-attosecond pulses with multilayer mirrors

Author

Charles Bourassin-Bouchet, Evgueni Meltchakov, Angelo Giglia, J Wang, Nicola Mahne, Stefano Nannarone, Franck Delmotte, S. de Rossi, Laboratoire Charles Fabry / Scop, Laboratoire Charles Fabry (LCF), Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS), Laboratorio Nazionale TASC (TASC), and Consiglio Nazionale delle Ricerche (CNR)

Subjects
Femtosecond pulse shaping, Physics, [PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], business.industry, Attosecond, General Physics and Astronomy, 01 natural sciences, Synchrotron, law.invention, 010309 optics, Amplitude, Optics, Pulse compression, law, 0103 physical sciences, Optoelectronics, Time domain, 010306 general physics, business, Bandwidth-limited pulse, Electronic circuit
Abstract

International audience; We report on the study of multilayer mirrors designed to compress extreme-ultraviolet pulses below 50 as. The mirrors were optimized in the time- domain to get the wanted pulse shape and duration when combined with a broadband hybrid filter. Moreover they appeared to be very robust to environmental parameters, ensuring a pulse compression in various conditions. We manufactured the mirrors and characterized them on a synchrotron facility both in amplitude and phase. The measurement of the latter was performed using the photocurrent technique, which is the only method allowing one to access to the mirrors absolute spectral phase. This led to a measurement of the offset induced by one of the mirrors on the carrier-envelope phase of attosecond pulses.

Published
2012
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19. Control of the attosecond synchronization of XUV radiation with phase-optimized mirrors

Author

Bertrand Carré, Pascal Salières, Diego Guenot, Thierry Ruchon, S. de Rossi, O. Gobert, Evgueni Meltchakov, Franck Delmotte, Elisabeth English, Charles Bourassin-Bouchet, Z. Diveki, Laboratoire Charles Fabry de l'Institut d'Optique / Scop, Laboratoire Charles Fabry de l'Institut d'Optique (LCFIO), Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS)-Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS), Service des Photons, Atomes et Molécules (SPAM), and Commissariat à l'énergie atomique et aux énergies alternatives (CEA)

Subjects
Physics, [PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], business.industry, Attosecond, Bandwidth (signal processing), Synchrotron radiation, Radiation, 01 natural sciences, Pulse shaping, Atomic and Molecular Physics, and Optics, 010309 optics, Optics, Amplitude, Extreme ultraviolet, 0103 physical sciences, Chirp, Optoelectronics, 010306 general physics, business
Abstract

International audience; We report on the advanced amplitude and phase control of attosecond radiation allowed by specifically-designed multilayer XUV mirrors. We first demonstrate that such mirrors can compensate for the intrinsic chirp of the attosecond emission over a large bandwidth of more than 20 eV. We then show that their combination with metallic foils introduces a third-order dispersion that is adjustable through the mirror's incidence angle. This results in a controllable beating allowing the radiation to be shaped from a single to a series of sub-100 as pulses.

Published
2011

20. Polarization control of high order harmonics in the EUV photon energy range

Author

Anna Barszczak Sardinha, Jan Lüning, Franck Delmotte, Guillaume Lambert, Magali Lozano, Boris Vodungbo, Julien Gautier, Philippe Zeitoun, Constance Valentin, Grégory Iaquaniello, Stéphane Sebban, Laboratoire d'optique appliquée (LOA), École Nationale Supérieure de Techniques Avancées (ENSTA Paris)-École polytechnique (X)-Centre National de la Recherche Scientifique (CNRS), Grupo de Lasers e Plasmas, Instituto Superior Tcnico, Laboratoire Charles Fabry de l'Institut d'Optique / Scop, Laboratoire Charles Fabry de l'Institut d'Optique (LCFIO), Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11), Laboratoire de Chimie Physique - Matière et Rayonnement (LCPMR), Université Pierre et Marie Curie - Paris 6 (UPMC)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), and Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS)-Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS)

Subjects
Ultraviolet Rays, Elliptical polarization, 01 natural sciences, 7. Clean energy, law.invention, 010309 optics, Optics, law, 0103 physical sciences, 010306 general physics, Circular polarization, Lenses, Physics, Photons, [PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], business.industry, Linear polarization, Magnetic circular dichroism, Lasers, Equipment Design, Laser, Polarization (waves), Atomic and Molecular Physics, and Optics, Equipment Failure Analysis, Refractometry, Harmonics, Optoelectronics, business, Ultrashort pulse
Abstract

International audience; We report the generation of circularly polarized high order harmonics in the extreme ultraviolet range (18-27 nm) from a linearly polarized infrared laser (40 fs, 0.25 TW) focused into a neon filled gas cell. To circularly polarize the initially linearly polarized harmonics we have implemented a four-reflector phase-shifter. Fully circularly polarized radiation has been obtained with an efficiency of a few percents, thus being significantly more efficient than currently demonstrated direct generation of elliptically polarized harmonics. This demonstration opens up new experimental capabilities based on high order harmonics, for example, in biology and materials science. The inherent femtosecond time resolution of high order harmonic generating table top laser sources renders these an ideal tool for the investigation of ultrafast magnetization dynamics now that the magnetic circular dichroism at the absorption M-edges of transition metals can be exploited

Published
2011
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21. Structural properties of Al/Mo/SiC multilayers with high reflectivity for extreme ultraviolet light

Author

Franck Delmotte, Evgueni Meltchakov, Philippe Jonnard, M.-H. Hu, Jean-Michel André, Karine Le Guen, Anouk Galtayries, Laboratoire de Chimie Physique - Matière et Rayonnement (LCPMR), Université Pierre et Marie Curie - Paris 6 (UPMC)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Laboratoire Charles Fabry de l'Institut d'Optique / Scop, Laboratoire Charles Fabry de l'Institut d'Optique (LCFIO), Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS)-Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS), Laboratoire de Physico-Chimie des Surfaces (LPCS), Ecole Nationale Supérieure de Chimie de Paris - Chimie ParisTech-PSL (ENSCP), Université Paris sciences et lettres (PSL)-Université Paris sciences et lettres (PSL)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), ANR-07-BLAN-0150,ATTOMIX,Design and characterization of XUV multilayer mirrors for attosecond pulses(2007), Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11), Delmotte, Franck, and Blanc - Design and characterization of XUV multilayer mirrors for attosecond pulses - - ATTOMIX2007 - ANR-07-BLAN-0150 - BLANC - VALID

Subjects
[PHYS.PHYS.PHYS-OPTICS] Physics [physics]/Physics [physics]/Optics [physics.optics], Materials science, Ultraviolet Rays, Carbon Compounds, Inorganic, Extreme ultraviolet lithography, chemistry.chemical_element, Synchrotron radiation, 02 engineering and technology, 01 natural sciences, Photometry, 010309 optics, Optics, X-ray photoelectron spectroscopy, Aluminium, Materials Testing, 0103 physical sciences, Thin film, Lenses, Molybdenum, [PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], business.industry, Silicon Compounds, Membranes, Artificial, Equipment Design, 021001 nanoscience & nanotechnology, Atomic and Molecular Physics, and Optics, Equipment Failure Analysis, Secondary ion mass spectrometry, Refractometry, chemistry, Extreme ultraviolet, 0210 nano-technology, business, Aluminum
Abstract

International audience; We present the results of an optical and chemical, depth and surface study of Al/Mo/SiC periodic multilayers, designed as high reflectivity coatings for the extreme ultra-violet (EUV) range. In comparison to the previously studied Al/SiC system, the introduction of Mo as a third material in the multilayer structure allows us to decrease In comparison to the previously studied Al/SiC system with a reflectance of 37% at near normal incidence around 17 nm, the introduction of Mo as a third material in the multilayer structure allows us to decrease the interfacial roughness and achieve an EUV reflectivity of 53.4%, measured with synchrotron radiation. This is the first report of a reflectivity higher than 50% around 17 nm. Time-of-flight secondary ion mass spectrometry (ToFSIMS) and x-ray photoelectron spectroscopy (XPS) measurements are performed on the Al/Mo/SiC system in order to analyze the individual layers within the stack. ToF-SIMS and XPS results give evidence that the first SiC layer is partially oxidized, but the O atoms do not reach the first Mo and Al layers. We use these results to properly describe the multilayer stack and discuss the possible reasons for the difference between the measured and simulated EUV reflectivity values.

Published
2010

22. Spatiotemporal distortions of attosecond pulses

Author

Charles Bourassin-Bouchet, Pierre Chavel, Sébastien de Rossi, Franck Delmotte, Laboratoire Charles Fabry de l'Institut d'Optique / Scop, Laboratoire Charles Fabry de l'Institut d'Optique (LCFIO), and Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS)-Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS)

Subjects
Attosecond, 01 natural sciences, Ultrafast optics, 010309 optics, Optics, OCIS: 320.0320, 340.7480, 080.1010, 0103 physical sciences, X-rays, Soft x-rays, 010306 general physics, Computer Science::Databases, Physics, [PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], Geometrical optics, business.industry, Pulse duration, Pulse shaping, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, Numerical aperture, Extreme ultraviolet, Aberrations, Computer Vision and Pattern Recognition, Focus (optics), business, Ultrashort pulse, Bandwidth-limited pulse
Abstract

9 pages; International audience; In this article, we report that usual multilayer mirror configurations to focus attosecond pulses generate geometric aberrations and can significantly stretch pulses. The numerical simulations show that the effects can be strong enough to delay some parts of the pulses of an attosecond pulse train and make them interfere with the next pulses of the train. The influence of the numerical aperture on the pulse duration is also studied, showing that such effects can occur even with very low numerical apertures.

Published
2010
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23. Aperiodic multilayer mirrors for efficient broadband reflection in the extreme ultraviolet

Author

Evgueni Meltchakov, Franck Delmotte, Y. Menesguen, S. de Rossi, Laboratoire Charles Fabry de l'Institut d'Optique / Scop, Laboratoire Charles Fabry de l'Institut d'Optique (LCFIO), Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS)-Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS), ANR: ATTOMIX,ATTOMIX, ANR-07-BLAN-0150,ATTOMIX,Design and characterization of XUV multilayer mirrors for attosecond pulses(2007), Laboratoire National Henri Becquerel (LNHB), Département Métrologie Instrumentation & Information (DM2I), Laboratoire d'Intégration des Systèmes et des Technologies (LIST), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université Paris-Saclay-Laboratoire d'Intégration des Systèmes et des Technologies (LIST), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université Paris-Saclay, Management, entrepreneuriat, innovation, Centre d'études et de recherches appliquées à la gestion (CERAG), Centre National de la Recherche Scientifique (CNRS)-Université Pierre Mendès France - Grenoble 2 (UPMF)-Centre National de la Recherche Scientifique (CNRS)-Université Pierre Mendès France - Grenoble 2 (UPMF), Laboratoire Charles Fabry / Optique XUV, and Laboratoire Charles Fabry (LCF)

Subjects
Materials science, Synchrotron radiation, 02 engineering and technology, 42.15.Eq · 42.79.Bh · 78.67.Pt, 7. Clean energy, 01 natural sciences, PACS 42.15.Eq · 42.79.Bh · 78.67.Pt, 010309 optics, Optics, 0103 physical sciences, High harmonic generation, General Materials Science, Thin film, Reflectometry, [PHYS]Physics [physics], [PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], business.industry, Synchrotron Radiation Source, General Chemistry, 021001 nanoscience & nanotechnology, Full width at half maximum, Extreme ultraviolet, Reflection (physics), Optoelectronics, 0210 nano-technology, business
Abstract

Recent extreme ultraviolet sources using high-harmonic generation in a rare gas make new optics developments necessary. We report on the study and development of multilayer structures with efficient reflectivity in the 35–75 eV energy range. We have optimized, deposited and characterized two aperiodic broadband mirrors consisting of a Mo, Si and B4C thin-film stack. We used the needle procedure in order to optimize mirror reflectivity. The magnetron sputter deposited multilayers have been calibrated and characterized using Cu K α grazing incidence X-ray reflectometry. Reflectivity measured at near-normal incidence on a synchrotron radiation source reaches 12% with a full width at half maximum of nearly 40 eV. Experimental results are compared with theoretical simulation using available optical constants for Mo, Si and B4C in this spectral range.

Published
2010
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24. Design and fabrication of supermirrors for (2-10 keV) high resolution X-ray plasmas diagnostic imaging

Author

Hélène Maury, Françoise Bridou, P. Troussel, Franck Delmotte, Evgueni Meltchakov, DAM Île-de-France (DAM/DIF), Direction des Applications Militaires (DAM), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), Laboratoire Charles Fabry de l'Institut d'Optique / Scop, Laboratoire Charles Fabry de l'Institut d'Optique (LCFIO), Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS)-Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS), and Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11)

Subjects
010302 applied physics, Physics, Nuclear and High Energy Physics, [PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], Photon, Fabrication, business.industry, X-ray, Synchrotron radiation, Surface finish, Plasma, Sputter deposition, 01 natural sciences, 010309 optics, Optics, 0103 physical sciences, business, Instrumentation, Refractive index, ComputingMilieux_MISCELLANEOUS
Abstract

We have developed non-periodic W/SiC multilayer mirrors (“supermirrors”) specifically designed to reflect photons between 2 and 10 keV. The mirrors were designed and optimized with a homemade calculation code. The supermirrors are designed to work at a nominal 0.7° grazing incidence with reflectivity above 35% in almost the entire energy range. The multilayers have been deposited by magnetron sputtering. Grazing incidence X-ray reflectance at 8 keV (0.154 nm) was made using a laboratory source. Reflectance measurement over the whole range was made at Physikalisch-Technische Bundesanstalt laboratory (PTB), the synchrotron radiation facility BESSY II, in Berlin. In addition to X-ray reflectance, multilayer thickness, refractive indices and roughness were characterized. The experimental results show good agreement with theoretical computations.

Published
2010

25. Internal frequency conversion extreme ultraviolet interferometer using mutual coherence properties of two high-order-harmonic sources

Author

Bertrand Carré, Denis Joyeux, M. Bougeard, Raymond Mercier, Franck Delmotte, Ph. Martin, P. Monot, H. Stabile, Julien Gautier, S. Dobosz, A. Tortora, F. Réau, Hamed Merdji, D. Phalippou, Service des Photons, Atomes et Molécules (SPAM), Commissariat à l'énergie atomique et aux énergies alternatives (CEA), Laboratoire Charles Fabry de l'Institut d'Optique / Scop, Laboratoire Charles Fabry de l'Institut d'Optique (LCFIO), and Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS)-Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS)

Subjects
PACS 52.70.Kz, 52.50.Jm, 42.65.Ky, 07.60.Ly, 51.70.+f, 7. Clean energy, 01 natural sciences, law.invention, 010309 optics, Optics, law, 0103 physical sciences, Astronomical interferometer, 010306 general physics, plasma production by laser, Instrumentation, Physics, [PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], Mutual coherence, plasma diagnostics, business.industry, aluminium, optical frequency conversion, ultraviolet sources, Laser, Interferometry, Temporal resolution, Harmonics, Extreme ultraviolet, light interferometry, Plasma diagnostics, business
Abstract

International audience; We report on an innovative two-dimensional imaging extreme ultraviolet (XUV) interferometer operating at 32 nm based on the mutual coherence of two laser high order harmonics (HOH) sources, separately generated in gas. We give the first evidence that the two mutually coherent HOH sources can be produced in two independent spatially separated gas jets, allowing for probing centimeter-sized objects. A magnification factor of 10 leads to a micron resolution associated with a subpicosecond temporal resolution. Single shot interferograms with a fringe visibility better than 30% are routinely produced. As a test of the XUV interferometer, we measure a maximum electronic density of 3×10^20 cm^−3 1.1 ns after the creation of a plasma on aluminum target.

Published
2009
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26. Optical, chemical, and depth characterization of Al/SiC periodic multilayers

Author

M.-H. Hu, Anouk Galtayries, Evgueni Meltchakov, Jean-Michel André, Philippe Jonnard, K. Le Guen, Christophe Hecquet, Franck Delmotte, Laboratoire de Chimie Physique - Matière et Rayonnement (LCPMR), Université Pierre et Marie Curie - Paris 6 (UPMC)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Laboratoire Charles Fabry de l'Institut d'Optique / Scop, Laboratoire Charles Fabry de l'Institut d'Optique (LCFIO), Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11), Laboratoire de Physico-Chimie des Surfaces (LPCS), Ecole Nationale Supérieure de Chimie de Paris - Chimie ParisTech-PSL (ENSCP), Université Paris sciences et lettres (PSL)-Université Paris sciences et lettres (PSL)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Laboratoire de Chimie Physique - Matière et Rayonnement ( LCPMR ), Université Pierre et Marie Curie - Paris 6 ( UPMC ) -Centre National de la Recherche Scientifique ( CNRS ), Laboratoire Charles Fabry de l'Institut d'Optique ( LCFIO ), Université Paris-Sud - Paris 11 ( UP11 ) -Institut d'Optique Graduate School ( IOGS ) -Centre National de la Recherche Scientifique ( CNRS ) -Université Paris-Sud - Paris 11 ( UP11 ) -Institut d'Optique Graduate School ( IOGS ) -Centre National de la Recherche Scientifique ( CNRS ), Laboratoire de Physico-Chimie des Surfaces ( LPCS ), Ecole Nationale Supérieure de Chimie de Paris- Chimie ParisTech-PSL ( ENSCP ) -Centre National de la Recherche Scientifique ( CNRS ), and Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS)-Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS)

Subjects
[PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], [ PHYS.PHYS.PHYS-OPTICS ] Physics [physics]/Physics [physics]/Optics [physics.optics], Chemistry, Refractory metals, Analytical chemistry, 02 engineering and technology, Surface finish, 021001 nanoscience & nanotechnology, 01 natural sciences, 010309 optics, X-ray reflectivity, Secondary ion mass spectrometry, Chemical species, Chemical state, Time of flight, 0103 physical sciences, Emission spectrum, 0210 nano-technology, ComputingMilieux_MISCELLANEOUS
Abstract

We present the characterization of Al/SiC periodic multilayers designed for op tical applications. In some samples, a thin layer of W or Mo is added at the SiC-on-Al interfaces. We use x-ray reflectivity (XRR) in order to determine the parameters of the stacks, i.e. thickness and roughness of all the layers. We have performed x-ray emission spectroscopy (XES) to identify the chemical state of th e Al and Si atoms present within the stru cture from an analysis of the shape of the Al KE and Si KE emission bands. Finally, time of flight secondary ion mass spectrometry (ToF-SIMS) is used to obtain the depth profile of the different elements present within the studied stacks. A fit of the XRR curves shows that the Al/SiC multilayer present large interfacial roughness (up to 2.8 nm), which is decreased considerably (down to 1 nm or less) when the refractory metal layers are introduced in the periodic structure. The combination of XES and ToF-SIMS allows us to conclude that in these systems the roughness is a purely geometrical parameter and not related to chemical interfacial reactions. Keywords: periodic multilayer, x-ray emission, x-ray reflectivity, time of flight secondary ion mass spectrometry * philippe.jonnard@upmc.fr , phone 33 1 44 27 63 03, fax 33 1 44 27 62 26, www.lcpmr.upmc.fr/

Published
2009
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27. Design and performance of two-channel EUV multilayer mirrors with enhanced spectral selectivity

Author

Evgueni Meltchakov, Franck Delmotte, Angelo Giglia, Françoise Bridou, Stephano Nanaronne, Christophe Hecquet, Frédéric Auchère, Marie-Françoise Ravet-Krill, Sébastien de Rossi, Arnaud Jérôme, Nicola Mahne, Françoise Varniere, Laboratoire Charles Fabry de l'Institut d'Optique / Scop, Laboratoire Charles Fabry de l'Institut d'Optique (LCFIO), Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11), Institut d'astrophysique spatiale (IAS), Centre National de la Recherche Scientifique (CNRS)-Institut national des sciences de l'Univers (INSU - CNRS)-Université Paris-Sud - Paris 11 (UP11), Laboratorio Nazionale TASC (TASC), Consiglio Nazionale delle Ricerche (CNR), and Université Paris-Sud - Paris 11 (UP11)-Institut national des sciences de l'Univers (INSU - CNRS)-Centre National de la Recherche Scientifique (CNRS)

Subjects
Physics, [PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], business.industry, Attenuation, Extreme ultraviolet lithography, Synchrotron Radiation Source, Synchrotron radiation, Bragg peak, 02 engineering and technology, General Chemistry, 021001 nanoscience & nanotechnology, 01 natural sciences, law.invention, 010309 optics, Telescope, Wavelength, Optics, law, Extreme ultraviolet, 0103 physical sciences, Optoelectronics, Astrophysics::Solar and Stellar Astrophysics, General Materials Science, 0210 nano-technology, business
Abstract

International audience; In this paper, we present a study on two-channel multilayer mirrors which can operate at two wavelengths in Extreme Ultraviolet (EUV) spectral range. We propose a new method to design two-channel EUV multilayer mirrors with enhanced spectral selectivity. The mirror structure is a stack of two periodic multilayers separated by a buffer layer. We have defined the main parameters which allow adjustment of the distance between different order Bragg's peak and of wavelength positions of reflectivity minima. Two mirrors have been designed and deposited for solar EUV telescope applications by using this method. The first mirror reflects Fe IX–X line (17.1 nm) and Fe XVI (33.5 nm) lines with attenuation of the He II line (30.4 nm). The second mirror reflects Fe IX–X and He II lines with attenuation of Fe XV (28.4 nm) and Fe XVI lines. Measurements with synchrotron radiation source confirm that, in both cases, for these mirrors, we are able to adjust reflectivity maxima (Bragg peak position) and minima. Such multilayers offer new possibilities for compact design of multi-wavelength EUV telescopes and/or for high spectral selectivity.

Published
2009
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28. Stellar And Galactic Environment survey (SAGE)

Author

D. de Martino, M. P. Kowalski, Andrew Collier Cameron, G. Del Zanna, J. H. M. M. Schmitt, Carole Jordan, A. Cassatella, Matthew R. Burleigh, Isabella Pagano, Sarah A. Matthews, R. G. Cruddace, Franck Delmotte, N. J. Bannister, K. S. Wood, Norbert Kappelmann, C.S. Jeffery, Frédéric Auchère, K. J. H. Phillips, M.F. Bode, Klaus Werner, J. G. Doyle, Rosine Lallement, Boris T. Gaensicke, B. Y. Welsh, Marie-Françoise Ravet-Krill, Brad K. Gibson, G. E. Bromage, Martin A. Barstow, Jonathan S. Lapington, Marina Orio, Emanuele Pace, Department of Physics and Astronomy [Leicester], University of Leicester, Naval Research Laboratory (NRL), Institut d'Astrophysique de Paris (IAP), Université Pierre et Marie Curie - Paris 6 (UPMC)-Institut national des sciences de l'Univers (INSU - CNRS)-Centre National de la Recherche Scientifique (CNRS), Astrophysics Research Institute [Liverpool] (ARI), Liverpool John Moores University (LJMU), Centre for Astrophysics, University of Central Lancashire, University of Central Lancashire [Preston] (UCLAN), Laboratoire Charles Fabry de l'Institut d'Optique / Scop, Laboratoire Charles Fabry de l'Institut d'Optique (LCFIO), Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS)-Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS), Institut für Astronomie und Astrophysik [Tübingen] (IAAT), Eberhard Karls Universität Tübingen = Eberhard Karls University of Tuebingen, HELIOS - LATMOS, Laboratoire Atmosphères, Milieux, Observations Spatiales (LATMOS), Université de Versailles Saint-Quentin-en-Yvelines (UVSQ)-Université Pierre et Marie Curie - Paris 6 (UPMC)-Institut national des sciences de l'Univers (INSU - CNRS)-Centre National de la Recherche Scientifique (CNRS)-Université de Versailles Saint-Quentin-en-Yvelines (UVSQ)-Université Pierre et Marie Curie - Paris 6 (UPMC)-Institut national des sciences de l'Univers (INSU - CNRS)-Centre National de la Recherche Scientifique (CNRS), Space Sciences Laboratory [Berkeley] (SSL), University of California [Berkeley] (UC Berkeley), University of California (UC)-University of California (UC), Centre National de la Recherche Scientifique (CNRS)-Institut national des sciences de l'Univers (INSU - CNRS)-Université Pierre et Marie Curie - Paris 6 (UPMC), Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11), University of California [Berkeley], University of California-University of California, Institut d'astrophysique spatiale (IAS), Université Paris-Sud - Paris 11 (UP11)-Institut national des sciences de l'Univers (INSU - CNRS)-Centre National de la Recherche Scientifique (CNRS)-Centre National d’Études Spatiales [Paris] (CNES), and Université Paris-Sud - Paris 11 (UP11)-Institut national des sciences de l'Univers (INSU - CNRS)-Centre National de la Recherche Scientifique (CNRS)

Subjects
Computer science, Extreme ultraviolet lithography, High resolution, Astrophysics, Astrophysics::Cosmology and Extragalactic Astrophysics, 7. Clean energy, 01 natural sciences, 010309 optics, Planet, 0103 physical sciences, Astrophysics::Solar and Stellar Astrophysics, AGN, 010303 astronomy & astrophysics, Instrumentation, Gratings, ComputingMilieux_MISCELLANEOUS, Astrophysics::Galaxy Astrophysics, Spectroscopy, Ultraviolet, Physics, Cataclysmic variables, Payload, [SDU.ASTR.SR]Sciences of the Universe [physics]/Astrophysics [astro-ph]/Solar and Stellar Astrophysics [astro-ph.SR], Astrophysics::Instrumentation and Methods for Astrophysics, White dwarf, Astronomy, White dwarfs, Astronomy and Astrophysics, [PHYS.ASTR.SR]Physics [physics]/Astrophysics [astro-ph]/Solar and Stellar Astrophysics [astro-ph.SR], MCP detectors, Stars, Interstellar medium, Extreme ultraviolet, 13. Climate action, Space and Planetary Science, Physics::Space Physics, Satellite, Astrophysics::Earth and Planetary Astrophysics
Abstract

This paper describes a proposed high resolution soft X-ray and Extreme Ultraviolet (EUV) spectroscopy mission to carry out a survey of Stellar and Galactic Environments (SAGE). The payload is based on novel diffraction grating technology which has already been proven in a sub-orbital space mission and which is ready to fly on a satellite platform with minimal development. Much of the technical detail of the instrumentation has been reported elsewhere and we concentrate our discussion here on the scientific goals of a SAGE base-line mission, demonstrating the scientific importance of high resolution spectroscopy in the Extreme Ultraviolet for the study of stars and the local interstellar medium.

Published
2009
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29. EUV near normal incidence collector development at SAGEM

Author

R. Mercier Ythier, Andre Rinchet, Benoit Sassolas, Jean-Marie Mackowski, Marie-Françoise Ravet-Krill, Christophe Michel, Roland Geyl, Laurent Pinard, Elodie Roméo, Xavier Bozec, R. Flaminio, Christophe Hecquet, N. Morgado, Franck Delmotte, J.-L. Montorio, SAGEM Défense Sécurité [Massy], Laboratoire Charles Fabry de l'Institut d'Optique / Scop, Laboratoire Charles Fabry de l'Institut d'Optique (LCFIO), Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11), Laboratoire des matériaux avancés (LMA), Université Claude Bernard Lyon 1 (UCBL), and Université de Lyon-Université de Lyon-Institut National de Physique Nucléaire et de Physique des Particules du CNRS (IN2P3)-Centre National de la Recherche Scientifique (CNRS)

Subjects
[PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], Materials science, Computer cooling, business.industry, Extreme ultraviolet lithography, Polishing, 02 engineering and technology, Surface finish, 021001 nanoscience & nanotechnology, 7. Clean energy, 01 natural sciences, Design for manufacturability, 010309 optics, chemistry.chemical_compound, Optics, chemistry, Extreme ultraviolet, 0103 physical sciences, Water cooling, Silicon carbide, 0210 nano-technology, business, ComputingMilieux_MISCELLANEOUS
Abstract

Through its participation to European programs, SAGEM has worked on the design and manufacturing of normal incidence collectors for EUV sources. By opposition to grazing incidence, normal incidence collectors are expected to collect more light with a simpler and cheaper design. Designs are presented for the two current types of existing sources: Discharge Produced Plasma (DPP) and Laser Produced Plasma (LPP). Collection efficiency is calculated in both cases. It is shown that these collectors can achieve about 10 % efficiency for DPP sources and 40 % for LPP sources. SAGEM works on the collectors manufacturability are also presented, including polishing, coating and cooling. The feasibility of polishing has been demonstrated with a roughness better than 2 angstroms obtained on several materials (glass, silicon, Silicon Carbide, metals...). SAGEM is currently working with the Institut d'Optique and the Laboratoire des Materiaux Avances on the design and the process of EUV coatings for large mirrors. Lastly, SAGEM has studied the design and feasibility of an efficient thermal control, based on a liquid cooling through slim channels machined close to the optical surface.

Published
2008
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30. Characterization and optimization of magnetron sputtered Sc/Si multilayers for extreme ultraviolet optics

Author

Marc Roulliay, Françoise Bridou, Françoise Varniere, Franck Delmotte, Arnaud Jérôme, Ian Vickridge, Julien Gautier, Marie-Françoise Ravet, Laboratoire Charles Fabry de l'Institut d'Optique / Scop, Laboratoire Charles Fabry de l'Institut d'Optique (LCFIO), Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS)-Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS), Institut des Nanosciences de Paris (INSP), and Université Pierre et Marie Curie - Paris 6 (UPMC)-Centre National de la Recherche Scientifique (CNRS)

Subjects
[PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], Materials science, Silicon, business.industry, chemistry.chemical_element, 02 engineering and technology, General Chemistry, Boron carbide, Sputter deposition, 021001 nanoscience & nanotechnology, 01 natural sciences, 010309 optics, Wavelength, chemistry.chemical_compound, Optics, chemistry, Extreme ultraviolet, 0103 physical sciences, Cavity magnetron, General Materials Science, Scandium, Thin film, [PHYS.COND]Physics [physics]/Condensed Matter [cond-mat], 0210 nano-technology, business
Abstract

International audience; Scandium/silicon multilayers have been deposited by magnetron sputtering and characterized by several techniques. Experimental peak reflectances of 0.22 and 0.37 have been measured respectively at wavelengths of 40 nm and 46 nm, for 10 degrees incidence angle. The corresponding theoretical values for a perfect Sc/Si structure are respectively 0.38 and 0.57. In order to explain these differences between calculated and measured reflectivity, thin film and multilayer characterizations have been done. Effects of multilayer imperfections on the reflectivity have been estimated independently by means of simulation. Based on these results, a new design of Sc/Si multilayer is proposed with top layer thickness optimization. With this design, the experimental peak reflectance reaches 0.46 at a wavelength of 46 nm.

Published
2007
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31. Design and characterization of extreme-ultraviolet broadband mirrors for attosecond science

Author

O. Boyko, Thomas Remetter, Franck Delmotte, Philippe Zeitoun, Rodrigo Lopez-Martens, Julien Gautier, Philippe Balcou, Marie Françoise Ravet, Katalin Varjú, Anne L'Huillier, Sophie Kazamias, Anne Sophie Morlens, E. Gustafsson, Laboratoire d'optique appliquée (LOA), École Nationale Supérieure de Techniques Avancées (ENSTA Paris)-École polytechnique (X)-Centre National de la Recherche Scientifique (CNRS), Department of Physics, Lund Institute of Technology, Lund University [Lund]-Lund University [Lund], Laboratoire d'interaction du rayonnement X avec la matière (LIXAM), Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS), Laboratoire Charles Fabry de l'Institut d'Optique / Scop, Laboratoire Charles Fabry de l'Institut d'Optique (LCFIO), and Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11)

Subjects
Physics, [PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], Photon, business.industry, Attosecond, Atom and Molecular Physics and Optics, Physics::Optics, Laser, 01 natural sciences, Atomic and Molecular Physics, and Optics, Photon counting, law.invention, 010309 optics, Optics, law, Harmonics, Extreme ultraviolet, 0103 physical sciences, Broadband, Optoelectronics, Reflection coefficient, 010306 general physics, business
Abstract

International audience; A novel multilayer mirror was designed and fabricated based on a recently developed three-material technology aimed both at reaching reflectivities of about 20% and at controlling dispersion over a bandwidth covering photon energies between 35 and 50 eV. The spectral phase upon reflection was retrieved by measuring interferences in a two-color ionization process using high-order harmonics produced from a titanium: sapphire laser. We demonstrate the feasibility of designing and characterizing phase-controlled broadband optics in the extreme-ultraviolet domain, which should facilitate the manipulation of attosecond pulses for applications.

Published
2006
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32. Study of XUV beam splitter flatness for use on a Michelson interferometer

Author

Marc Rouillay, R. Marmoret, Grégory Faivre, Philippe Zeitoun, Sébastien Hubert, L. Vanbostal, Marie-Françoise Ravet, Anne-Sophie Morlens, Christian Remond, P. Troussel, Franck Delmotte, Pascal Mercère, Laboratoire d'interaction du rayonnement X avec la matière (LIXAM), Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS), Laboratoire d'optique appliquée (LOA), École Nationale Supérieure de Techniques Avancées (ENSTA Paris)-École polytechnique (X)-Centre National de la Recherche Scientifique (CNRS), DAM Île-de-France (DAM/DIF), Direction des Applications Militaires (DAM), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), Laboratoire Charles Fabry de l'Institut d'Optique / Scop, Laboratoire Charles Fabry de l'Institut d'Optique (LCFIO), Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11), and Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS)-Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS)

Subjects
Flatness (systems theory), Interference (wave propagation), 01 natural sciences, law.invention, 010309 optics, Optics, law, 0103 physical sciences, Fourier-transform spectroscopy, Electrical and Electronic Engineering, Fourier transform infrared spectroscopy, 010306 general physics, XUV beam splitter, Physics, [PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], Spectrometer, business.industry, Astrophysics::Instrumentation and Methods for Astrophysics, Michelson interferometer, Sputter deposition, Condensed Matter Physics, XUV Michelson interferometry, Atomic and Molecular Physics, and Optics, Interferometry, Physics::Accelerator Physics, business, Beam splitter
Abstract

A XUV Michelson interferometer has been developed by LIXAM/CEA/LCFIO and has been tested as a Fourier-transform spectrometer for measurement of X-ray laser line shape. The observed strong deformation of the interference fringes limited the interest of such an interferometer for plasma probing. Because the fringe deformation was coming from a distortion of the beam splitter (5 × 5 mm2open aperture, about 150 nm thick), several parameters of the multilayer deposition used for the beam splitter fabrication have been recently optimized. The flatness has been improved from 80 nm rms obtained by using the ion beam sputtering technique, to 20 nm rms by using the magnetron sputtering technique. Over 3 × 3 mm2, the beam splitter has a flatness better than 4 nm rms.

Published
2004
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33. Recent developments in X-UV optics and X-UV diagnostics

Author

Philippe Zeitoun, R. F. Smith, P. Troussel, Patrick P. Naulleau, L. Vanbostal, S. Hubert, Marta Fajardo, Sophie Kazamias, Mourad Idir, Constance Valentin, Philippe Balcou, Xavier Levecq, S. Le Pape, Franck Delmotte, Sylvie Jacquemot, Marie-Françoise Ravet, James Dunn, James R. Hunter, Jorge J. Rocca, Anne-Sophie Morlens, Guillaume Dovillaire, Kenneth A. Goldberg, Christian Remond, Ciaran Lewis, Pascal Mercère, Samuel Bucourt, Gabriel Faivre, R. Marmoret, Denis Douillet, Laboratoire d'interaction du rayonnement X avec la matière (LIXAM), Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS), Laboratoire d'optique appliquée (LOA), École Nationale Supérieure de Techniques Avancées (ENSTA Paris)-École polytechnique (X)-Centre National de la Recherche Scientifique (CNRS), Imagine Optic, AFOP, Laboratoire Charles Fabry de l'Institut d'Optique / Scop, Laboratoire Charles Fabry de l'Institut d'Optique (LCFIO), Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS)-Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS), Lawrence Livermore National Laboratory (LLNL), Center for X-ray Optics, Lawrence Berkely National Laboratory, DAM Île-de-France (DAM/DIF), Direction des Applications Militaires (DAM), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), School of Mathematics and Physics, Queen's University [Belfast] (QUB), NSF ERC For Extreme Ultraviolet Science and Technology and Department of Electrical and Computer Engineering, Colorado State University [Fort Collins] (CSU), and Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11)

Subjects
Wavefront, Physics, [PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], Physics and Astronomy (miscellaneous), Spectrometer, business.industry, General Engineering, General Physics and Astronomy, Nonlinear optics, Michelson interferometer, Wavefront sensor, Laser pumping, Laser, 01 natural sciences, law.invention, 010309 optics, Optics, law, 0103 physical sciences, PACS 07.85.Nc, 32.70.Jz, 41.50.+h, 42.15.Dp, 42.55.Vc, 52.70.La, Laser beam quality, 010306 general physics, business
Abstract

International audience; Metrology of XUV beams (X-ray lasers, high-harmonic generation and VUV free-electron lasers) is of crucial importance for the development of applications. We have thus developed several new optical systems enabling us to measure the optical properties of XUV beams. By use of a Michelson interferometer working as a Fourier-transform spectrometer, the line shapes of different X-ray lasers have been measured with a very high accuracy (Δλ/λ~10^-6). Achievement of the first XUV wavefront sensor has enabled us to measure the beam quality of laser-pumped as well as discharge-pumped X-ray lasers. A capillary discharge X-ray laser has demonstrated a very good wavefront allowing us to achieve an intensity as high as 3×10^14 W cm^-2 by focusing with a f=5 cm mirror. The sensor accuracy has been measured using a calibrated spherical wave generated by diffraction. The accuracy has been estimated to be as good as λ/120 at 13 nm. Commercial developments are underway. At Laboratoire drsquoOptique Appliquée, we are setting up a new beamline based on high-harmonic generation in order to start the femtosecond, coherent XUV optic .

Published
2004
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34. Longitudinal coherence measurements of a transient collisional x-ray laser

Author

Christian Remond, R. Marmoret, Sébastien Hubert, Joseph Nilsen, Franck Delmotte, Marta Fajardo, L. Vanbostal, James Dunn, Sylvie Jacquemot, Marie Françoise Ravet, Philippe Zeitoun, James R. Hunter, Raymond F. Smith, Ciaran Lewis, Lawrence Livermore National Laboratory (LLNL), DAM Île-de-France (DAM/DIF), Direction des Applications Militaires (DAM), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), Laboratoire d'interaction du rayonnement X avec la matière (LIXAM), Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS), School of Mathematics and Physics [Belfast], Queen's University [Belfast] (QUB), Laboratoire Charles Fabry de l'Institut d'Optique / Scop, Laboratoire Charles Fabry de l'Institut d'Optique (LCFIO), and Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS)-Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS)

Subjects
Physics, [PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], business.industry, Physics::Optics, Michelson interferometer, Laser, 01 natural sciences, Atomic and Molecular Physics, and Optics, law.invention, Coherence length, 010309 optics, X-ray laser, Interferometry, Laser linewidth, Optics, law, 0103 physical sciences, 010306 general physics, business, Lasing threshold, Coherence (physics)
Abstract

We present what is to our knowledge the first longitudinal coherence measurement of a transient inversion collisional x-ray laser. We investigated the picosecond output of a Ni-like Pd x-ray laser at 14.68 nm generated by the COMET laser facility at the Lawrence Livermore National Laboratory. Interference fringes were generated with a Michelson interferometer setup in which a thin multilayer membrane was used as a beam splitter. We determined the longitudinal coherence for the 4d1S0 --4p1P1 lasing transition to be approximately 400 microm (1/e half-width) by changing the length of one interferometer arm and measuring the resultant variation in fringe visibility. The inferred gain-narrowed linewidth of approximately 0.29 pm is a factor of 4 less than previously measured in quasi-steady-state x-ray laser schemes.

Published
2003
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35. X-ray-ultraviolet beam splitters for the Michelson interferometer

Author

L. Vanbostal, Françoise Bridou, Franck Delmotte, Marie-Françoise Ravet, Gérard Soullie, Sébastien Hubert, Philippe Zeitoun, Françoise Varniere, Laboratoire Charles Fabry de l'Institut d'Optique / Scop, Laboratoire Charles Fabry de l'Institut d'Optique (LCFIO), Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS)-Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS), Laboratoire de Spectroscopie Atomique et Ionique, Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS), DAM Île-de-France (DAM/DIF), Direction des Applications Militaires (DAM), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), and Centre National de la Recherche Scientifique (CNRS)-Université Paris-Sud - Paris 11 (UP11)

Subjects
[PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], Materials science, business.industry, Materials Science (miscellaneous), X-ray optics, Synchrotron radiation, Michelson interferometer, Laser, 01 natural sciences, Industrial and Manufacturing Engineering, law.invention, 010309 optics, Interferometry, Optics, law, 0103 physical sciences, Astronomical interferometer, Light beam, Optoelectronics, Business and International Management, 010306 general physics, business, Beam splitter
Abstract

International audience; With the aim of realizing a Michelson interferometer working at 13.9 nm, we have developed a symmetrical beam splitter with multilayers deposited on the front and back sides of a silicon nitride membrane. On the basis of the experimental optical properties of the membrane, simulations have been performed to define the multilayer structure that provides the highest reflectivity-transmission product. Optimized Mo-Si multilayers have been successfully deposited on both sides of the membrane by use of the ion-beam sputtering technique, with a thickness-period reproducibility of 0.1 nm. Measurements by means of synchrotron radiation at 13.9 nm and at an angle of 45° provide a reflectivity of 14.2% and a transmission of 15.2% for a 60% s-polarized light, close to the simulated values. Such a beam splitter has been used for x-ray laser Michelson interferometry at 13.9 nm. The first interferogram is discussed.

Published
2002
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36. Two channel multilayer mirrors for astrophysics

Author

Françoise Varniere, Frédéric Auchère, Arnaud Jérôme, Françoise Bridou, Franck Delmotte, Julien Gautier, M.F. Ravet, Laboratoire Charles Fabry de l'Institut d'Optique / Scop, Laboratoire Charles Fabry de l'Institut d'Optique (LCFIO), Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11), Institut d'astrophysique spatiale (IAS), Université Paris-Sud - Paris 11 (UP11)-Institut national des sciences de l'Univers (INSU - CNRS)-Centre National de la Recherche Scientifique (CNRS), and Centre National de la Recherche Scientifique (CNRS)-Institut national des sciences de l'Univers (INSU - CNRS)-Université Paris-Sud - Paris 11 (UP11)

Subjects
010302 applied physics, Physics, [PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], Period (periodic table), business.industry, Synchrotron Radiation Source, Resonance, Spectral response, Astrophysics, Space (mathematics), 01 natural sciences, 7. Clean energy, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, 010309 optics, Superposition principle, Optics, 0103 physical sciences, Line (geometry), Optoelectronics, Electrical and Electronic Engineering, Physical and Theoretical Chemistry, business, Communication channel
Abstract

International audience; A two-channel mirror reflecting both Fe-IX/X (λ = 17.1 nm) and He-II (30.4 nm) resonance lines at near normal incidence has been designed, fabricated and characterized. These two passbands are often chosen in space instruments designed for the observation of the solar corona. The mirror structure used for optimization is a superposition of two periodic multilayers with three components per period. It has been designed by using optimization software with an appropriate merit function. The theoretical reflectivity for both resonance lines can reach 0.25. It is shown that, by using a set of filters, one can select either the Fe-IX/X or the He-II channel. The spectral response of the two-channel mirror has been measured on synchrotron radiation source on a large wavelength range, from 12 nm to 35 nm. Experimental reflectivity reaches 0.32 for the Fe-IX/X line and 0.19 for the He-II line.

37. Duration of ultrashort pulses in the presence of spatio-temporal coupling

Author

Michelle Stephens, Charles Bourassin-Bouchet, S. de Rossi, Pierre Chavel, Franck Delmotte, Laboratoire Charles Fabry de l'Institut d'Optique / Scop, Laboratoire Charles Fabry de l'Institut d'Optique (LCFIO), Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS)-Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS), Department of Physics [Ann Arbor], University of Michigan [Ann Arbor], and University of Michigan System-University of Michigan System

Subjects
Physics, Femtosecond pulse shaping, [PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], Frequency-resolved optical gating, business.industry, Attosecond, Pulse duration, 02 engineering and technology, 01 natural sciences, Atomic and Molecular Physics, and Optics, 010309 optics, 020210 optoelectronics & photonics, Optics, Multiphoton intrapulse interference phase scan, Pulse compression, 0103 physical sciences, 0202 electrical engineering, electronic engineering, information engineering, business, Ultrashort pulse, Bandwidth-limited pulse
Abstract

International audience; We report on a simple method allowing one to decompose the duration of arbitrary ultrashort light pulses, potentially distorted by space-time coupling, into four elementary durations. Such a decomposition shows that, in linear optics, a spatio-temporal pulse can be stretched with respect to its Fourier limit by only three independent phenomena: nonlinear frequency dependence of the spectral phase over the whole spatial extent of the pulse, spectral amplitude inhomogeneities in space, and spectral phase inhomogeneities in space. We illustrate such a decomposition using numerical simulations of complex spatio-temporal femtosecond and attosecond pulses. Finally we show that the contribution of two of these three effects to the pulse duration is measurable without any spectral phase characterization.

38. Compression of attosecond pulses with multilayer mirrors

Author

Stefano Nannarone, Evgueni Meltchakov, Bertrand Carré, Charles Bourassin-Bouchet, Franck Delmotte, Angelo Giglia, Nicola Mahne, Elizabeth English, Z. Diveki, Sébastien de Rossi, Thierry Ruchon, Pascal Salières, Laboratoire Charles Fabry de l'Institut d'Optique / Scop, Laboratoire Charles Fabry de l'Institut d'Optique (LCFIO), Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS)-Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS), Service des Photons, Atomes et Molécules (SPAM), Commissariat à l'énergie atomique et aux énergies alternatives (CEA), Laboratorio Nazionale TASC (TASC), National Research Council of Italy | Consiglio Nazionale delle Ricerche (CNR), and Consiglio Nazionale delle Ricerche (CNR)

Subjects
[PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], Fabrication, Materials science, business.industry, Attosecond, Synchrotron radiation, 02 engineering and technology, 01 natural sciences, 010309 optics, 020210 optoelectronics & photonics, Optics, Pulse compression, Compression (functional analysis), Extreme ultraviolet, 0103 physical sciences, 0202 electrical engineering, electronic engineering, information engineering, Time domain, business, Phase retrieval
Abstract

We present the design, fabrication and characterization of non-periodic multilayer mirrors for the compression of attosecond pulses in the XUV domain. We demonstrate that time domain optimization allows pulse compression down to sub-50 as duration.

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