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1. Isotopic Labeling Studies of EUV Photoresists Containing Antimony

Author

Michael C. Murphy, Greg Denbeaux, Jacob Sitterly, Robert L. Brainard, and Steven Grzeskowiak

Subjects
010302 applied physics, Materials science, Polymers and Plastics, Extreme ultraviolet lithography, Organic Chemistry, chemistry.chemical_element, 02 engineering and technology, Photoresist, 021001 nanoscience & nanotechnology, Photochemistry, 01 natural sciences, Isotopic labeling, Antimony, chemistry, 0103 physical sciences, Materials Chemistry, 0210 nano-technology
Published
2018

2. EUV Mechanistic Studies of Antimony Resists

Author

Robert L. Brainard, Greg Denbeaux, Philip Schuler, Jacob Sitterly, Michael C. Murphy, Jeff Richards, Amrit Narasimhan, and Steven Grzeskowiak

Subjects
Materials science, Polymers and Plastics, Extreme ultraviolet lithography, Organic Chemistry, Inorganic chemistry, chemistry.chemical_element, Nanotechnology, 02 engineering and technology, Photoresist, 010402 general chemistry, 021001 nanoscience & nanotechnology, 01 natural sciences, 0104 chemical sciences, Outgassing, Antimony, chemistry, Resist, Mechanism (philosophy), Materials Chemistry, 0210 nano-technology
Published
2017

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