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Isotopic Labeling Studies of EUV Photoresists Containing Antimony

Authors :
Michael C. Murphy
Greg Denbeaux
Jacob Sitterly
Robert L. Brainard
Steven Grzeskowiak
Source :
Journal of Photopolymer Science and Technology. 31:233-242
Publication Year :
2018
Publisher :
Technical Association of Photopolymers, Japan, 2018.

Subjects

Subjects :
010302 applied physics
Materials science
Polymers and Plastics
Extreme ultraviolet lithography
Organic Chemistry
chemistry.chemical_element
02 engineering and technology
Photoresist
021001 nanoscience & nanotechnology
Photochemistry
01 natural sciences
Isotopic labeling
Antimony
chemistry
0103 physical sciences
Materials Chemistry
0210 nano-technology

Details

ISSN :
13496336 and 09149244
Volume :
31
Database :
OpenAIRE
Journal :
Journal of Photopolymer Science and Technology
Accession number :
edsair.doi...........0364176058745cd24a23c8e087e65a81

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