10 results on '"Celia Nicolet"'
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2. Advanced Formulation for DSA Resists
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Christophe Navarro, Julien Beausoleil, Darron Jurajda, Nick Brakensiek, Celia Nicolet, Xavier Chevalier, John Berron, Kaumba Sakavuyi, and Ian Cayrefourcq
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Directed self assembly ,Materials science ,Polymers and Plastics ,Organic Chemistry ,Nanotechnology ,02 engineering and technology ,010402 general chemistry ,021001 nanoscience & nanotechnology ,01 natural sciences ,0104 chemical sciences ,Resist ,Materials Chemistry ,Copolymer ,Composite material ,0210 nano-technology - Published
- 2016
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3. Recent Achievements in sub-10 nm DSA lithography for Line/Space patterning
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Mary Ann Hockey, Guillaume Fleury, Laura Evangelio, Raluca Tiron, Ahmed Gharbi, Muhammad Waseem Mumtaz, Kui Xu, Christophe Navarro, Ian Cayrefourcq, Georges Hadziioannou, Fumi Ariura, Marc Zelsmann, Xavier Chevalier, Antoine Legrain, Marta Fernández-Regúlez, Francesc Pérez-Murano, Celia Nicolet, Laurent Pain, Groupement de recherches de Lacq (GRL), Arkema (Arkema), Arkema (ARKEMA), BREWER Sci Inc, Rolla, MO 65401 USA, BREWER Sci Inc, Laboratoire de Chimie des Polymères Organiques (LCPO), Centre National de la Recherche Scientifique (CNRS)-Institut Polytechnique de Bordeaux-Ecole Nationale Supérieure de Chimie, de Biologie et de Physique (ENSCBP)-Université de Bordeaux (UB)-Institut de Chimie du CNRS (INC), Laboratoire des technologies de la microélectronique (LTM ), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019]), Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), Instituto de Microelectrònica de Barcelona (IMB-CNM), Centro Nacional de Microelectronica [Spain] (CNM)-Consejo Superior de Investigaciones Científicas [Madrid] (CSIC), Arkema, Colombes, European Project: 621277,EC:FP7:SP1-JTI,ENIAC-2013-2,PLACYD(2014), Université de Bordeaux (UB)-Ecole Nationale Supérieure de Chimie, de Biologie et de Physique (ENSCBP)-Institut Polytechnique de Bordeaux-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Clot, Marielle, ARKEMA FRANCE, Laboratoire de Chimie des polymères organiques (LCPO), Centre National de la Recherche Scientifique (CNRS)-École Nationale Supérieure de Chimie et de Physique de Bordeaux (ENSCPB)-Université Sciences et Technologies - Bordeaux 1-Institut de Chimie du CNRS (INC), SOITEC, and Université Sciences et Technologies - Bordeaux 1 (UB)-École Nationale Supérieure de Chimie et de Physique de Bordeaux (ENSCPB)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)
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Directed self assembly ,[PHYS]Physics [physics] ,Materials science ,Polymers and Plastics ,Organic Chemistry ,Nanotechnology ,02 engineering and technology ,010402 general chemistry ,021001 nanoscience & nanotechnology ,Space (mathematics) ,01 natural sciences ,[PHYS] Physics [physics] ,0104 chemical sciences ,Materials Chemistry ,Multiple patterning ,Line (text file) ,0210 nano-technology ,Lithography ,ComputingMilieux_MISCELLANEOUS ,Next-generation lithography - Abstract
International audience; Silicon-containing and modified PS-b-PMMA high-χ block copolymers materials were produced to achieve lamellar mesostructure as low as 14 nm intrinsic period (L$_0$) and ordered by graphoepitaxy or chemoepitaxy processes. Line Edge Roughness (LER) measurements of 2.5 nm (3 σ) can be extracted from CD-SEM pictures of poly [(1,1-dimethylsilacyclobutane)-b-styrene] after etching step. Materials integrations on a 300 mm track process are highlighted. In fingerprint, new BCPs LWR L/S values are 1.5/1.1 nm in comparison to a graphoepitaxy flow where the LWR L/S values are 2.0/1.1 nm. Alternative methods to create high-resolution guiding patterns for directed self-assembly of block co-polymers and the scale-up to obtain industrial BCPs meeting electronic requirement are also reported.
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- 2017
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4. Design of new block-copolymer systems to achieve thick-films with defect-free structures for applications of DSA into lithographic large nodes
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Guillaume Fleury, Ian Cayrefourcq, John Berron, Ahmed Gharbi, Celia Nicolet, Xavier Chevalier, Paul Coupillaud, Geoffrey Lombard, Julien Beausoleil, Raluca Tiron, Gilles Cunge, Philippe Bézard, Marc Zelsmann, Kaumba Sakavuyi, Christophe Navarro, Georges Hadziioannou, Groupement de recherches de Lacq (GRL), Arkema (Arkema), Laboratoire de Chimie des Polymères Organiques (LCPO), Centre National de la Recherche Scientifique (CNRS)-Institut Polytechnique de Bordeaux-Ecole Nationale Supérieure de Chimie, de Biologie et de Physique (ENSCBP)-Université de Bordeaux (UB)-Institut de Chimie du CNRS (INC), Team 4 LCPO : Polymer Materials for Electronic, Energy, Information and Communication Technologies, Centre National de la Recherche Scientifique (CNRS)-Institut Polytechnique de Bordeaux-Ecole Nationale Supérieure de Chimie, de Biologie et de Physique (ENSCBP)-Université de Bordeaux (UB)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)-Institut Polytechnique de Bordeaux-Ecole Nationale Supérieure de Chimie, de Biologie et de Physique (ENSCBP)-Université de Bordeaux (UB)-Institut de Chimie du CNRS (INC), MINATEC, CNRS, LTM, Minatec Grenoble (CEA/ INP Grenoble), BREWER Sci Inc, Rolla, MO 65401 USA, BREWER Sci Inc, Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), ARKEMA FRANCE, Rue Estienne Orves, Colombes, Université de Bordeaux (UB)-Ecole Nationale Supérieure de Chimie, de Biologie et de Physique (ENSCBP)-Institut Polytechnique de Bordeaux-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Université de Bordeaux (UB)-Ecole Nationale Supérieure de Chimie, de Biologie et de Physique (ENSCBP)-Institut Polytechnique de Bordeaux-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)-Université de Bordeaux (UB)-Ecole Nationale Supérieure de Chimie, de Biologie et de Physique (ENSCBP)-Institut Polytechnique de Bordeaux-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Laboratoire des technologies de la microélectronique (LTM ), and Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019])
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Directed self assembly ,Early introduction ,Materials science ,Defect free ,Nanotechnology ,02 engineering and technology ,Orientation (graph theory) ,010402 general chemistry ,021001 nanoscience & nanotechnology ,01 natural sciences ,0104 chemical sciences ,[CHIM.POLY]Chemical Sciences/Polymers ,Perpendicular ,Copolymer ,Tomography ,ORIENTATION ,0210 nano-technology ,Lithography - Abstract
Conference, San Jose CA, Feb 22-25, 2016. Sponsor(s) : SPIE; Tokyo Ohka Kogyo Co; International audience; Properties of new block copolymers systems, specifically designed to reach large periods for the features, are compared to the ones exhibited by classical PS-b-PMMA materials of same dimensions. Conducted studies, like free-surface defects analysis, mild-plasma tomography experiments, graphoepitaxy-guided structures, etch-transfer. indicate much better performances, in terms of achievable film-thicknesses with perpendicular features, defects levels, and dimensional uniformities, for the new system than for the classical PS-b-PMMA. These results clearly highlight unique and original solutions toward an early introduction of DSA technology into large lithographic nodes.
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- 2016
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5. Nanomechanical properties of solvent cast polystyrene and poly(methyl methacrylate) polymer blends and self-assembled block copolymers
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Christophe Navarro, Álvaro San Paulo, Matteo Lorenzoni, Francesc Pérez-Murano, Celia Nicolet, Gemma Rius, Laura Evangelio, Ministerio de Ciencia e Innovación (España), and European Commission
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chemistry.chemical_classification ,Materials science ,Mechanical Engineering ,Polymer ,Condensed Matter Physics ,Methacrylate ,Poly(methyl methacrylate) ,Atomic and Molecular Physics, and Optics ,Electronic, Optical and Magnetic Materials ,chemistry.chemical_compound ,chemistry ,Chemical engineering ,visual_art ,Polymer chemistry ,visual_art.visual_art_medium ,Copolymer ,Polystyrene ,Dewetting ,Polymer blend ,Electrical and Electronic Engineering ,Methyl methacrylate - Abstract
© 2015 Society of Photo-Optical Instrumentation Engineers (SPIE). The nanomechanical properties of solvent-cast polymer thin films have been investigated using PeakForce™ Quantitative Nanomechanical Mapping. The samples consisted of films of polystyrene (PS) and poly(methyl methacrylate) (PMMA) obtained after the dewetting of toluene solution on a polymeric brush layer. Additionally, we have probed the mechanical properties of poly(styrene-b-methyl methacrylate) block copolymers (BCP) as randomly oriented thin films. The probed films have a critical thickness, This work was partially funded by the projects SNM (FP7-ICT-2011-8) and FORCE-for-FUTURE (CSD2010-00024).
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- 2015
6. Crystallization-Driven Enhancement in Photovoltaic Performance through Block Copolymer Incorporation into P3HT:PCBM Blends
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Cyril Brochon, Fabrice Cousin, Dargie Hailu Deribew, Georges Hadziioannou, Sébastien Jun Mougnier, Celia Nicolet, Eleni Pavlopoulou, Guillaume Fleury, C. Renaud, Eric Cloutet, Laurence Vignau, Mark Geoghegan, Giuseppe Portale, Laboratoire de Chimie des Polymères Organiques (LCPO), Université de Bordeaux (UB)-Ecole Nationale Supérieure de Chimie, de Biologie et de Physique (ENSCBP)-Institut Polytechnique de Bordeaux-Centre National de la Recherche Scientifique (CNRS), TEAM 4 LCPO, Université de Bordeaux (UB)-Institut Polytechnique de Bordeaux-Centre National de la Recherche Scientifique (CNRS), Laboratoire de l'intégration, du matériau au système (IMS), Université Sciences et Technologies - Bordeaux 1-Institut Polytechnique de Bordeaux-Centre National de la Recherche Scientifique (CNRS), Laboratoire Léon Brillouin (LLB - UMR 12), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)-Université Paris-Saclay, NWO DUBBLE CRG (ESRF, Netherlands Org Sci Res), European Synchrotron Radiation Facility (ESRF), Department of Physics and Astronomy [Sheffield], University of Sheffield [Sheffield], Université de Bordeaux (UB)-Ecole Nationale Supérieure de Chimie, de Biologie et de Physique (ENSCBP)-Institut Polytechnique de Bordeaux-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Team 4 LCPO : Polymer Materials for Electronic, Energy, Information and Communication Technologies, Université de Bordeaux (UB)-Ecole Nationale Supérieure de Chimie, de Biologie et de Physique (ENSCBP)-Institut Polytechnique de Bordeaux-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)-Université de Bordeaux (UB)-Ecole Nationale Supérieure de Chimie, de Biologie et de Physique (ENSCBP)-Institut Polytechnique de Bordeaux-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Université Sciences et Technologies - Bordeaux 1 (UB)-Institut Polytechnique de Bordeaux-Centre National de la Recherche Scientifique (CNRS), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université Paris-Saclay-Centre National de la Recherche Scientifique (CNRS), Centre National de la Recherche Scientifique (CNRS)-Institut Polytechnique de Bordeaux-Ecole Nationale Supérieure de Chimie, de Biologie et de Physique (ENSCBP)-Université de Bordeaux (UB)-Institut de Chimie du CNRS (INC), and Centre National de la Recherche Scientifique (CNRS)-Institut Polytechnique de Bordeaux-Ecole Nationale Supérieure de Chimie, de Biologie et de Physique (ENSCBP)-Université de Bordeaux (UB)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)-Institut Polytechnique de Bordeaux-Ecole Nationale Supérieure de Chimie, de Biologie et de Physique (ENSCBP)-Université de Bordeaux (UB)-Institut de Chimie du CNRS (INC)
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Materials science ,Polymers and Plastics ,Absorption spectroscopy ,BULK-HETEROJUNCTION ,02 engineering and technology ,010402 general chemistry ,01 natural sciences ,Polymer solar cell ,law.invention ,Inorganic Chemistry ,Crystallinity ,HIGH-EFFICIENCY ,FIELD-EFFECT MOBILITY ,law ,Microscopy ,Polymer chemistry ,HETEROJUNCTION SOLAR-CELLS ,Materials Chemistry ,Copolymer ,CHARGE-TRANSPORT ,Crystallization ,Thin film ,NANOSCALE MORPHOLOGY ,GRIGNARD METATHESIS ,Organic Chemistry ,021001 nanoscience & nanotechnology ,0104 chemical sciences ,MOLECULAR-WEIGHT ,[CHIM.POLY]Chemical Sciences/Polymers ,Chemical engineering ,Neutron reflectometry ,0210 nano-technology ,PHASE-SEPARATION ,ROD-COIL - Abstract
International audience; We report the increased crystallization of poly(3-hexylthiophene) (P3HT) in the donor-acceptor mixture of [6,6]-phenyl-C61-butyric acid methyl ester (PCBM) with P3HT by the addition of a block copolymer, P3HT-b-PI, where PI refers to polyisoprene. The photovoltaic performance of devices created using this blend is markedly improved by the addition of the diblock copolymer. We have characterized the structure of thin films of the P3HT-b-PI containing mixtures using optical microscopy, scanning force microscopy, UV-vis absorption spectroscopy, neutron reflectometry, and grazing incidence X-ray diffraction (GIXD). The GIXD data provide the information on the crystallinity of the films, the absorption data were used to confirm that the addition of the diblock was responsible for the increase in crystallization, neutron reflectometry data reveal a PCBM-rich region near the hole injection layer, and the two microscopy techniques revealed the structural effect of the crystallization at the surface of the films.
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- 2013
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7. Scaling-down lithographic dimensions with block-copolymer materials: 10-nm-sized features with poly(styrene)-block-poly(methylmethacrylate)
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Christophe Navarro, Guillaume Fleury, Ahmed Gharbi, Celia Nicolet, Raluca Tiron, Michaël Delalande, Jonathan Pradelles, Xavier Chevalier, Georges Hadziioannou, Gilles Cunge, Maxime Argoud, Groupement de recherches de Lacq (GRL), Arkema (Arkema), Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), Laboratoire de Chimie des Polymères Organiques (LCPO), Centre National de la Recherche Scientifique (CNRS)-Institut Polytechnique de Bordeaux-Ecole Nationale Supérieure de Chimie, de Biologie et de Physique (ENSCBP)-Université de Bordeaux (UB)-Institut de Chimie du CNRS (INC), Laboratoire des technologies de la microélectronique (LTM), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université Joseph Fourier - Grenoble 1 (UJF)-Centre National de la Recherche Scientifique (CNRS), Team 4 LCPO : Polymer Materials for Electronic, Energy, Information and Communication Technologies, Centre National de la Recherche Scientifique (CNRS)-Institut Polytechnique de Bordeaux-Ecole Nationale Supérieure de Chimie, de Biologie et de Physique (ENSCBP)-Université de Bordeaux (UB)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)-Institut Polytechnique de Bordeaux-Ecole Nationale Supérieure de Chimie, de Biologie et de Physique (ENSCBP)-Université de Bordeaux (UB)-Institut de Chimie du CNRS (INC), Université de Bordeaux (UB)-Ecole Nationale Supérieure de Chimie, de Biologie et de Physique (ENSCBP)-Institut Polytechnique de Bordeaux-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Université Joseph Fourier - Grenoble 1 (UJF)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS), and Université de Bordeaux (UB)-Ecole Nationale Supérieure de Chimie, de Biologie et de Physique (ENSCBP)-Institut Polytechnique de Bordeaux-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)-Université de Bordeaux (UB)-Ecole Nationale Supérieure de Chimie, de Biologie et de Physique (ENSCBP)-Institut Polytechnique de Bordeaux-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)
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Materials science ,Nanotechnology ,02 engineering and technology ,01 natural sciences ,Styrene ,chemistry.chemical_compound ,block-copolymer ,0103 physical sciences ,Copolymer ,PS-b-PMMA ,Microelectronics ,Electrical and Electronic Engineering ,Thin film ,Lithography ,graphoepitaxy ,010302 applied physics ,chemistry.chemical_classification ,business.industry ,Mechanical Engineering ,Polymer ,self-assembly ,021001 nanoscience & nanotechnology ,Condensed Matter Physics ,Atomic and Molecular Physics, and Optics ,Electronic, Optical and Magnetic Materials ,[CHIM.POLY]Chemical Sciences/Polymers ,CMOS ,chemistry ,lithography ,Self-assembly ,0210 nano-technology ,business - Abstract
International audience; Poly(styrene)-block-poly(methylmethacrylate) (PS-b-PMMA) block-copolymers (BCP) systems synthesized on an industrial scale and satisfying microelectronic's requirements for metallic contents specifications are studied in terms of integration capabilities for lithographic applications. We demonstrate in particular that this kind of polymer can efficiently achieve periodic features close to 10 nm. These thin films can be transferred in various substrates through dry-etching techniques. The self-assembly optimization for each polymer is first performed on free-surface, leading to interesting properties, and the changes in self-assembly rules for low molecular-weight polymers are investigated and highlighted through different graphoepitaxy approaches. The improvements in self-assembly capabilities toward low periodic polymers, as well as the broad range of achievable feature sizes, make the PS-b-PMMA system very attractive for lithographic CMOS applications. We conclude by showing that high-chi polymer materials developed in Arkema's laboratories can be efficiently used to reduce the pattern's size beyond the ones of PS-b-PMMA based BCP's capabilities. (C) 2013 Society of Photo-Optical Instrumentation Engineers (SPIE)
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- 2013
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8. Optimization of the Bulk Heterojunction Composition for Enhanced Photovoltaic Properties: Correlation between the Molecular Weight of the Semiconducting Polymer and Device Performance
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Henri Cramail, Cyril Brochon, Laurence Vignau, Eric Cloutet, Celia Nicolet, Dargie Hailu Deribew, Mark Geoghegan, Cedric Renaud, Guillaume Wantz, Guillaume Fleury, Georges Hadziioannou, Laboratoire de Chimie des Polymères Organiques (LCPO), Université de Bordeaux (UB)-Ecole Nationale Supérieure de Chimie, de Biologie et de Physique (ENSCBP)-Institut Polytechnique de Bordeaux-Centre National de la Recherche Scientifique (CNRS), TEAM 4 LCPO, Université de Bordeaux (UB)-Institut Polytechnique de Bordeaux-Centre National de la Recherche Scientifique (CNRS), Laboratoire de l'intégration, du matériau au système (IMS), Université Sciences et Technologies - Bordeaux 1-Institut Polytechnique de Bordeaux-Centre National de la Recherche Scientifique (CNRS), TEAM 2 LCPO, Department of Physics and Astronomy [Sheffield], University of Sheffield [Sheffield], Centre National de la Recherche Scientifique (CNRS)-Institut Polytechnique de Bordeaux-Ecole Nationale Supérieure de Chimie, de Biologie et de Physique (ENSCBP)-Université de Bordeaux (UB)-Institut de Chimie du CNRS (INC), Team 4 LCPO : Polymer Materials for Electronic, Energy, Information and Communication Technologies, Centre National de la Recherche Scientifique (CNRS)-Institut Polytechnique de Bordeaux-Ecole Nationale Supérieure de Chimie, de Biologie et de Physique (ENSCBP)-Université de Bordeaux (UB)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)-Institut Polytechnique de Bordeaux-Ecole Nationale Supérieure de Chimie, de Biologie et de Physique (ENSCBP)-Université de Bordeaux (UB)-Institut de Chimie du CNRS (INC), Centre National de la Recherche Scientifique (CNRS)-Institut Polytechnique de Bordeaux-Université Sciences et Technologies - Bordeaux 1, and Team 2 LCPO : Biopolymers & Bio-sourced Polymers
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Materials science ,FULLERENE SOLAR-CELLS ,02 engineering and technology ,010402 general chemistry ,7. Clean energy ,01 natural sciences ,BLENDS ,Polymer solar cell ,law.invention ,THIN-FILMS ,law ,Polymer chemistry ,Materials Chemistry ,CHARGE-TRANSPORT ,Physical and Theoretical Chemistry ,Thin film ,Crystallization ,Eutectic system ,Phase diagram ,GRIGNARD METATHESIS ,Open-circuit voltage ,REGIOREGULAR POLY(3-HEXYLTHIOPHENE) ,Heterojunction ,021001 nanoscience & nanotechnology ,0104 chemical sciences ,Surfaces, Coatings and Films ,Active layer ,BLOCK-COPOLYMERS ,OPEN-CIRCUIT VOLTAGE ,[CHIM.POLY]Chemical Sciences/Polymers ,Chemical engineering ,MORPHOLOGY ,GROWTH ,0210 nano-technology - Abstract
International audience; Herein we propose an approach toward the optimization of the photovoltaic performance of bulk heterojunctions by tuning the composition of the active layer with respect to the molecular weight of the semiconducting polymer. We used a poly(3-hexylthiophene):[6,6]-phenyl-C61-butyric acid methyl ester (P3HT:PCBM) blend as a typical system and varied the molecular weight of the P3HT semiconducting polymer in order to determine its influence on the bulk heterojunction morphology as well as on the optoelectronic characteristics of the device. We have systematically mapped out the phase diagram for different molecular weight P3HTs blended with PCBM and observed the presence of a eutectic composition, which shifts to higher content of P3HT for lower molecular weight P3HTs. This shift inherent to the P3HT molecular weight is also apparent in the photovoltaic performance as the eutectic composition corresponds to the best of the photovoltaic properties. The P3HT molecular weight dependence of the eutectic composition is due to the molecular weight dependence of the P3HT crystallization behavior, which leads to dramatic morphological changes of the bulk heterojunction.
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- 2011
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9. Mastering a Double Emulsion in a Simple Co-Flow Microfluidic to Generate Complex Polymersomes
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Jean-François Le Meins, Celia Nicolet, Sébastien Lecommandoux, Adeline Perro, Julie Angly, Annie Colin, Laboratoire du Futur (LOF), Centre National de la Recherche Scientifique (CNRS)-RHODIA-Université Sciences et Technologies - Bordeaux 1-Institut de Chimie du CNRS (INC), Laboratoire de Chimie des Polymères Organiques (LCPO), Centre National de la Recherche Scientifique (CNRS)-Institut Polytechnique de Bordeaux-Ecole Nationale Supérieure de Chimie, de Biologie et de Physique (ENSCBP)-Université de Bordeaux (UB)-Institut de Chimie du CNRS (INC), Team 3 LCPO : Polymer Self-Assembly & Life Sciences, and Centre National de la Recherche Scientifique (CNRS)-Institut Polytechnique de Bordeaux-Ecole Nationale Supérieure de Chimie, de Biologie et de Physique (ENSCBP)-Université de Bordeaux (UB)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)-Institut Polytechnique de Bordeaux-Ecole Nationale Supérieure de Chimie, de Biologie et de Physique (ENSCBP)-Université de Bordeaux (UB)-Institut de Chimie du CNRS (INC)
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DYNAMICS ,Vinyl alcohol ,Polymers ,Microfluidics ,FABRICATION ,02 engineering and technology ,010402 general chemistry ,01 natural sciences ,VESICLES ,chemistry.chemical_compound ,Polymer chemistry ,Electrochemistry ,Copolymer ,General Materials Science ,Spectroscopy ,Coalescence (physics) ,Ethylene oxide ,Chemistry ,technology, industry, and agriculture ,Surfaces and Interfaces ,Microfluidic Analytical Techniques ,Models, Theoretical ,021001 nanoscience & nanotechnology ,Condensed Matter Physics ,Silicon Dioxide ,0104 chemical sciences ,Volumetric flow rate ,[CHIM.POLY]Chemical Sciences/Polymers ,Chemical engineering ,Polymersome ,Emulsion ,Hydrodynamics ,Emulsions ,Glass ,0210 nano-technology - Abstract
International audience; We show that the production and the geometrical shape of complex polymersomes can be predicted by varying the flow rates of a simple microdevice using an empirical law which predicts the droplet size. This device is constituted of fused silica capillaries associated with adjusted tubing sleeves and T-junctions. Studying the effect of several experimental parameters, double emulsions containing a controlled number of droplets were fabricated. First, this study examines the stability of a jet in a simple confined microfluidic system, probing the conditions required for droplets production. Then, multicompartmental polymersomes were formed, controlling flow velocities. In this work, poly(dimethylsiloxane)-graft-poly(ethylene oxide) (PDMS-g-PEO) and poly(butadiene)-block-poly(ethyleneoxide) (PBut-b-PEO) amphiphilic copolymers were used and dissolved in chloroform/cyclohexane mixture. The ratio of these two solvents was adjusted in order to stabilize the double emulsion formation. The aqueous suspension contained poly(vinyl alcohol) (PVA), limiting the coalescence of the droplets. This work constitutes major progress in, the control of double emulsion formation in microfluidic devices and shows that complex structures can be obtained using such a process.
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- 2011
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10. PMMA removal options by wet development in PS-b-PMMA block copolymer for nanolithographic mask fabrication
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Celia Nicolet, Xavier Chevalier, Christophe Navarro, Raluca Tiron, Maxime Argoud, Isabelle Servin, Ahmed Gharbi, and Patricia Pimenta Barros
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chemistry.chemical_classification ,Materials science ,Silicon ,Scanning electron microscope ,Process Chemistry and Technology ,Analytical chemistry ,chemistry.chemical_element ,Substrate (electronics) ,Polymer ,Surfaces, Coatings and Films ,Electronic, Optical and Magnetic Materials ,Ion implantation ,Nanolithography ,chemistry ,Chemical engineering ,Ellipsometry ,Etching (microfabrication) ,Materials Chemistry ,Electrical and Electronic Engineering ,Instrumentation - Abstract
In the integration flow of directed self-assembly with block copolymers (BCP), the selective removal of one phase of the polymer with respect to the other one is an important step. Different strategies can be implemented such as wet only, exposure, and wet or dry only, each one presenting its highlights and limitations. In this paper, the authors report a wet etching technique allowing an efficient removal of polymethylmethacrylate (PMMA) in PMMA cylinder-forming polystyrene-b-polymethylmethacrylate (PS-b-PMMA) BCP in order to generate contact holes. They confirm that exposure with ultraviolet (UV) light or electron beam is required for PMMA degradation before its complete removal by wet development in acetic acid. A dose-to-clear of 300 mJ/cm2 and 200 μC/cm2 using UV exposure and e-beam exposure, respectively, is demonstrated for a thin BCP film coated on a silicon substrate. Complementary characterizations are employed: by ellipsometry to monitor the BCP thickness, by scanning electron and atomic force microscopies to monitor the surface topography and precisely determine the dose-to-clear. It is also shown that this UV exposure dose is dependent on the materials stack used underneath the BCP film due to the radiation absorption. Furthermore, the authors have investigated the ion implantation in the BCP film with oxygen and hydrogen ions and it seems to be another alternative for PMMA degradation in the wet development approach.
- Published
- 2015
- Full Text
- View/download PDF
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