Advanced Formulation for DSA Resists

Authors :: Christophe Navarro
Julien Beausoleil
Darron Jurajda
Nick Brakensiek
Celia Nicolet
Xavier Chevalier
John Berron
Kaumba Sakavuyi
Ian Cayrefourcq
Source :: Journal of Photopolymer Science and Technology. 29:671-674
Publication Year :: 2016
Publisher :: Technical Association of Photopolymers, Japan, 2016.

Subjects :: Directed self assembly
Materials science
Polymers and Plastics
Organic Chemistry
Nanotechnology
02 engineering and technology
010402 general chemistry
021001 nanoscience & nanotechnology
01 natural sciences
0104 chemical sciences
Resist
Materials Chemistry
Copolymer
Composite material
0210 nano-technology

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