30 results on '"Subhadeep Mukhopadhyay"'
Search Results
2. On The Problem of Relevance in Statistical Inference
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Subhadeep Mukhopadhyay and Kaijun Wang
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FOS: Computer and information sciences ,Statistics and Probability ,Economics and Econometrics ,Computer science ,business.industry ,media_common.quotation_subject ,Perspective (graphical) ,Big data ,Inference ,Mathematics - Statistics Theory ,Machine Learning (stat.ML) ,Statistics Theory (math.ST) ,Large cohort ,Methodology (stat.ME) ,Statistics - Machine Learning ,FOS: Mathematics ,Statistical inference ,Relevance (information retrieval) ,Quality (business) ,Statistics, Probability and Uncertainty ,Construct (philosophy) ,business ,Mathematical economics ,Statistics - Methodology ,media_common - Abstract
This paper is dedicated to the "50 Years of the Relevance Problem" - a long-neglected topic that begs attention from practical statisticians who are concerned with the problem of drawing inference from large-scale heterogeneous data., Comment: Revised (much-improved) version. The procedure (including all the datasets) is implemented in the R-package LPRelevance
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- 2023
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3. A nonparametric approach to high-dimensional k-sample comparison problems
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Kaijun Wang and Subhadeep Mukhopadhyay
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Statistics and Probability ,Class (set theory) ,Spectral graph theory ,Applied Mathematics ,General Mathematics ,05 social sciences ,Nonparametric statistics ,Sample (statistics) ,Statistical model ,01 natural sciences ,Agricultural and Biological Sciences (miscellaneous) ,Task (project management) ,010104 statistics & probability ,Range (mathematics) ,0502 economics and business ,0101 mathematics ,Statistics, Probability and Uncertainty ,General Agricultural and Biological Sciences ,Construct (philosophy) ,Algorithm ,050205 econometrics ,Mathematics - Abstract
Summary High-dimensional $k$-sample comparison is a common task in applications. We construct a class of easy-to-implement distribution-free tests based on new nonparametric tools and unexplored connections with spectral graph theory. The test is shown to have various desirable properties and a characteristic exploratory flavour that has practical consequences for statistical modelling. Numerical examples show that the proposed method works surprisingly well across a broad range of realistic situations.
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- 2020
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4. InfoGram and Admissible Machine Learning
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Subhadeep Mukhopadhyay
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FOS: Computer and information sciences ,FOS: Economics and business ,Computer Science - Machine Learning ,Artificial Intelligence (cs.AI) ,Artificial Intelligence ,Statistics - Machine Learning ,Computer Science - Artificial Intelligence ,Econometrics (econ.EM) ,Machine Learning (stat.ML) ,Software ,Economics - Econometrics ,Machine Learning (cs.LG) - Abstract
We have entered a new era of machine learning (ML), where the most accurate algorithm with superior predictive power may not even be deployable, unless it is admissible under the regulatory constraints. This has led to great interest in developing fair, transparent and trustworthy ML methods. The purpose of this article is to introduce a new information-theoretic learning framework (admissible machine learning) and algorithmic risk-management tools (InfoGram, L-features, ALFA-testing) that can guide an analyst to redesign off-the-shelf ML methods to be regulatory compliant, while maintaining good prediction accuracy. We have illustrated our approach using several real-data examples from financial sectors, biomedical research, marketing campaigns, and the criminal justice system., Comment: Keywords: Admissible machine learning; InfoGram; L-Features; Information-theory; ALFA-testing, Algorithmic risk management; Fairness; Interpretability; COREml; FINEml
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- 2021
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5. Understanding PBTI in Replacement Metal Gate Ge n-Channel FETs With Ultrathin Al2O3 and GeO x ILs Using Ultrafast Charge Trap–Detrap Techniques
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Sayantan Ghosh, Shraddha Kothari, Saurabh Lodha, Subhadeep Mukhopadhyay, Narendra Parihar, Souvik Mahapatra, and Chandan Joishi
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010302 applied physics ,Physics ,Silicon ,Annealing (metallurgy) ,Transistor ,chemistry.chemical_element ,Conductance ,02 engineering and technology ,Trapping ,021001 nanoscience & nanotechnology ,01 natural sciences ,Electronic, Optical and Magnetic Materials ,law.invention ,Threshold voltage ,chemistry ,law ,0103 physical sciences ,SILC ,Electrical and Electronic Engineering ,Atomic physics ,0210 nano-technology ,Metal gate - Abstract
We report positive bias temperature instability data in replacement metal gate Ge n-channel metal–oxide–semiconductor field-effect transistors with an in-situ gate stack employing an ultrathin (5 A), stable Al2O3 interlayer (IL) using ultrafast (~microseconds) characterization techniques that ensure recovery artifact-free measurements. Comparison with state-of-the-art GeO x IL is also reported besides establishing correlations between band-edge interface trap density ( ${D}_{\text {it}}$ ), mobility ( $\mu$ ), and threshold voltage ( ${V}_{T}$ ) instability. Ultrafast measure-stress-measure (UF-MSM), ultrafast measure-stress-detrap-measure (UF-MSDM), stress-induced-leakage-current (SILC), direct-current current–voltage (DCIV), split capacitance–voltage ( ${C}$ – ${V}$ ), and low-temperature full conductance techniques along with a compact model demonstrate that: 1) trap generation occurs at IL/high- ${k}$ interface during stress; 2) an increase in $\mu$ with reduction in ${D}_{\text {it}}$ does not guarantee better reliability, i.e., ${V}_{T}$ shift and $\mu$ are uncorrelated due to their dependence on separate regions of the gate stack; 3) contributions to total ${V}_{\text {T}}$ degradation from trapping and generated traps are mutually exclusive; 4) UF-MSDM is a powerful tool to estimate trap generation; and 5) ${V}_{T}$ degradation is directly proportional to high- ${k}$ thickness, varies inversely with IL thickness, and reduces with annealing.
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- 2018
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6. BTI Analysis Tool—Modeling of NBTI DC, AC Stress and Recovery Time Kinetics, Nitrogen Impact, and EOL Estimation
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Souvik Mahapatra, Nilesh Goel, Subhadeep Mukhopadhyay, and Narendra Parihar
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010302 applied physics ,Negative-bias temperature instability ,Materials science ,Kinetics ,02 engineering and technology ,Trapping ,Mechanics ,021001 nanoscience & nanotechnology ,01 natural sciences ,Electronic, Optical and Magnetic Materials ,Stress (mechanics) ,Duty cycle ,Logic gate ,0103 physical sciences ,Degradation (geology) ,Electrical and Electronic Engineering ,0210 nano-technology ,Voltage - Abstract
A comprehensive modeling framework is presented to predict the time kinetics of negative bias temperature instability stress and recovery during and after dc and ac stresses and also during mixed dc–ac stress. The model uses uncorrelated contributions from the generation of interface and bulk traps and hole trapping in preexisting bulk traps. Ultrafast measured data at different stresses and recovery biases, temperature, duty cycle and frequency, as well as arbitrary time segments with dynamically varying voltage, frequency, and activity are predicted. The role of nitrogen in the gate insulator is explained. End-of-life degradation is determined under dc and ac use conditions.
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- 2018
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7. LPiTrack: Eye movement pattern recognition algorithm and application to biometric identification
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Shinjini Nandi and Subhadeep Mukhopadhyay
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Scheme (programming language) ,Biometrics ,Stochastic process ,business.industry ,Nonparametric statistics ,Pattern recognition ,02 engineering and technology ,01 natural sciences ,010104 statistics & probability ,Identification (information) ,Artificial Intelligence ,Pattern recognition (psychology) ,0202 electrical engineering, electronic engineering, information engineering ,Trajectory ,020201 artificial intelligence & image processing ,Computer vision ,Artificial intelligence ,0101 mathematics ,Representation (mathematics) ,business ,computer ,Algorithm ,Software ,computer.programming_language ,Mathematics - Abstract
A comprehensive nonparametric statistical learning framework, called LPiTrack, is introduced for large-scale eye-movement pattern discovery. The foundation of our data-compression scheme is based on a new Karhunen–Loeve-type representation of the stochastic process in Hilbert space by specially designed orthonormal polynomial expansions. We apply this novel nonlinear transformation-based statistical data-processing algorithm to extract temporal-spatial-static characteristics from eye-movement trajectory data in an automated, robust way for biometric authentication. This is a significant step towards designing a next-generation gaze-based biometric identification system. We elucidate the essential components of our algorithm through data from the second Eye Movements Verification and Identification Competition, organized as a part of the 2014 International Joint Conference on Biometrics.
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- 2017
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8. A Comprehensive DC and AC PBTI Modeling Framework for HKMG n-MOSFETs
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Nilesh Goel, Souvik Mahapatra, Subhadeep Mukhopadhyay, and Narendra Parihar
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010302 applied physics ,Negative-bias temperature instability ,Condensed matter physics ,Chemistry ,Time evolution ,Analytical chemistry ,02 engineering and technology ,021001 nanoscience & nanotechnology ,01 natural sciences ,Uncorrelated ,Electronic, Optical and Magnetic Materials ,Threshold voltage ,Stress (mechanics) ,Positive bias temperature instability ,Planar ,0103 physical sciences ,Electrical and Electronic Engineering ,0210 nano-technology ,Metal gate - Abstract
A physics-based modeling framework is proposed to calculate the threshold voltage shift ( $\Delta \text{V}_{\mathrm {T}})$ in planar high-k metal gate (HKMG) n-MOSFETs for positive bias temperature instability (PBTI). Overall $\Delta \text{V}_{\mathrm { {T}}}$ is estimated using the uncorrelated contributions from the trap generation (TG) and the electron trapping subcomponents. The time evolution of $\Delta \text{V}_{\mathrm { {T}}}$ , measured using an ultrafast measure-stress-measure method during dc and ac stress and after dc stress, is predicted for different experimental conditions. The modeled TG component is verified by independent direct-current I–V method. The proposed model explains PBTI in differently processed HKMG gate stacks.
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- 2017
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9. A Comparative Study of NBTI and PBTI Using Different Experimental Techniques
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Souvik Mahapatra, Nilesh Goel, and Subhadeep Mukhopadhyay
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Process Dependence ,Relaxation ,Materials science ,Analytical chemistry ,Physical-Mechanism ,02 engineering and technology ,01 natural sciences ,Temperature measurement ,High-K Metal Gate (Hkmg) ,Stress (mechanics) ,0103 physical sciences ,0202 electrical engineering, electronic engineering, information engineering ,Electrical and Electronic Engineering ,Metal gate ,Bias Temperature Instability ,010302 applied physics ,I-Dlin Technique ,Negative-bias temperature instability ,Trap Generation (Tg) ,Condensed matter physics ,Interface-Trap Generation ,020208 electrical & electronic engineering ,Direct current ,Negative Bias Temperature Instability (Nbti) ,Hkmg P-Mosfets ,Reliability ,Dc ,Positive Bias Temperature Instability (Pbti) ,Electronic, Optical and Magnetic Materials ,Delta-v (physics) ,Threshold voltage ,Charge Trapping ,Duty cycle ,Direct Current Iv (Dciv) ,Ultrafast Measure Stress Measure (Uf-Msm) ,Gate Stacks - Abstract
Degradation in planar high-k metal gate p- and n-channel MOSFETs, respectively, under negative bias temperature instability (NBTI) and positive bias temperature instability (PBTI) stress is studied using different characterization methods. Ultrafast measure stress measure (UF-MSM) method with a measurement delay of a few microseconds is used to characterize the threshold voltage shift ( $\Delta V_{T}$ ). Gated-diode or direct current IV is used to directly estimate the trap generation (TG) during BTI, after correcting for the measurement inconsistencies. BTI experiments are performed under DC stress at different stress bias ( $V_{\mathrm {G-STR}}$ ) and temperature ( ${T}$ ) values also under AC stress at different pulse duty cycle (PDC) and frequency ( ${f}$ ) values. Measured $\Delta V_{T}$ as well as TG show remarkable similarities between NBTI and PBTI stress, under both DC and AC stress. It is shown that TG dominates NBTI and PBTI degradation under both DC and AC stress.
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- 2016
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10. Nonparametric Universal Copula Modeling
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Emanuel Parzen and Subhadeep Mukhopadhyay
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FOS: Computer and information sciences ,021103 operations research ,Computer science ,Copula (linguistics) ,0211 other engineering and technologies ,Nonparametric statistics ,02 engineering and technology ,Management Science and Operations Research ,Statistics - Applications ,Statistics - Computation ,01 natural sciences ,General Business, Management and Accounting ,Data science ,Methodology (stat.ME) ,010104 statistics & probability ,Modeling and Simulation ,Spectral expansion ,Applications (stat.AP) ,0101 mathematics ,Statistics - Methodology ,Computation (stat.CO) - Abstract
To handle the ubiquitous problem of "dependence learning," copulas are quickly becoming a pervasive tool across a wide range of data-driven disciplines encompassing neuroscience, finance, econometrics, genomics, social science, machine learning, healthcare and many more. Copula (or connection) functions were invented in 1959 by Abe Sklar in response to a query of Maurice Frechet. After 60 years, where do we stand now? This article provides a history of the key developments and offers a unified perspective., Comment: A perspective on "60 years of Copula"
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- 2019
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11. Generalized Empirical Bayes Modeling via Frequentist Goodness of Fit
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Subhadeep Mukhopadhyay and Douglas Fletcher
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0301 basic medicine ,Multidisciplinary ,Point (typography) ,Computer science ,business.industry ,Ecology (disciplines) ,lcsh:R ,lcsh:Medicine ,Machine learning ,computer.software_genre ,01 natural sciences ,Article ,Bayesian statistics ,010104 statistics & probability ,03 medical and health sciences ,Bayes' theorem ,030104 developmental biology ,Goodness of fit ,Frequentist inference ,lcsh:Q ,Artificial intelligence ,0101 mathematics ,lcsh:Science ,business ,computer - Abstract
The two key issues of modern Bayesian statistics are: (i) establishing principled approach for distilling statistical prior that is consistent with the given data from an initial believable scientific prior; and (ii) development of a consolidated Bayes-frequentist data analysis workflow that is more effective than either of the two separately. In this paper, we propose the idea of “Bayes via goodness-of-fit” as a framework for exploring these fundamental questions, in a way that is general enough to embrace almost all of the familiar probability models. Several examples, spanning application areas such as clinical trials, metrology, insurance, medicine, and ecology show the unique benefit of this new point of view as a practical data science tool.
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- 2018
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12. Large-scale signal detection: A unified perspective
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Subhadeep Mukhopadhyay
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0301 basic medicine ,Statistics and Probability ,Theoretical computer science ,General Immunology and Microbiology ,Computer science ,Applied Mathematics ,Model selection ,Scale (chemistry) ,Perspective (graphical) ,Inference ,General Medicine ,01 natural sciences ,General Biochemistry, Genetics and Molecular Biology ,Toolbox ,Variety (cybernetics) ,010104 statistics & probability ,03 medical and health sciences ,030104 developmental biology ,0101 mathematics ,General Agricultural and Biological Sciences ,Representation (mathematics) ,Reproducing kernel Hilbert space - Abstract
There is an overwhelmingly large literature and algorithms already available on "large-scale inference problems" based on different modeling techniques and cultures. Our primary goal in this article is not to add one more new methodology to the existing toolbox but instead (i) to clarify the mystery how these different simultaneous inference methods are connected, (ii) to provide an alternative more intuitive derivation of the formulas that leads to simpler expressions in order (iii) to develop a unified algorithm for practitioners. A detailed discussion on representation, estimation, inference, and model selection is given. Applications to a variety of real and simulated datasets show promise. We end with several future research directions.
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- 2015
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13. Decentralized Nonparametric Multiple Testing
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Subhadeep Mukhopadhyay
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0301 basic medicine ,Statistics and Probability ,FOS: Computer and information sciences ,Big data ,Machine learning ,computer.software_genre ,01 natural sciences ,Statistics - Computation ,Task (project management) ,Methodology (stat.ME) ,010104 statistics & probability ,03 medical and health sciences ,Superposition principle ,Data_FILES ,0101 mathematics ,Statistics - Methodology ,Computation (stat.CO) ,Mathematics ,business.industry ,Nonparametric statistics ,030104 developmental biology ,Multiple comparisons problem ,Artificial intelligence ,Statistics, Probability and Uncertainty ,business ,computer - Abstract
Consider a big data multiple testing task, where, due to storage and computational bottlenecks, one is given a very large collection of p-values by splitting into manageable chunks and distributing over thousands of computer nodes. This paper is concerned with the following question: How can we find the full data multiple testing solution by operating completely independently on individual machines in parallel, without any data exchange between nodes? This version of the problem tends naturally to arise in a wide range of data-intensive science and industry applications whose methodological solution has not appeared in the literature to date; therefore, we feel it is necessary to undertake such analysis. Based on the nonparametric functional statistical viewpoint of large-scale inference, started in Mukhopadhyay (2016), this paper furnishes a new computing model that brings unexpected simplicity to the design of the algorithm which might otherwise seem daunting using classical approach and notations., Comment: Revised version
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- 2018
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14. Statistics Educational Challenge in the
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Subhadeep Mukhopadhyay
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Mathematics education ,Sociology - Published
- 2017
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15. A comprehensive modeling framework for gate stack process dependence of DC and AC NBTI in SiON and HKMG p-MOSFETs
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Nilesh Goel, Souvik Mahapatra, K. Joshi, N. Nanaware, and Subhadeep Mukhopadhyay
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Silicon ,Relaxation ,Engineering ,Physical-Mechanism ,Trapping ,Stress (mechanics) ,Trap (computing) ,Mobility Degradation ,Recovery ,Electronic engineering ,Electrical and Electronic Engineering ,Safety, Risk, Reliability and Quality ,Bias Temperature Instability ,I-Dlin Technique ,business.industry ,Interface-Trap Generation ,Time evolution ,Process (computing) ,Condensed Matter Physics ,Atomic and Molecular Physics, and Optics ,Surfaces, Coatings and Films ,Electronic, Optical and Magnetic Materials ,Pulse (physics) ,Impact ,Duty cycle ,Perspective ,Optoelectronics ,business ,Degradation (telecommunications) - Abstract
A comprehensive modeling framework involving mutually uncorrelated contribution from interface trap generation and hole trapping in pre-existing, process related gate insulator traps is used to study NBTI degradation in SiON and HKMG p-MOSFETs. The model can predict time evolution of degradation during DC and AC stress, time evolution of recovery after stress, impact of stress and recovery bias and temperature, and impact of several AC stress parameters such as pulse frequency, duty cycle, duration of last pulse cycle (half or full) and pulse low bias. The model can successfully explain experimental data measured using fast and ultra-fast methods in SiON and HKMG devices having different gate insulator processes. The trap generation and trapping sub components of the composite model have been verified by independent experiments. Data published by different groups are reconciled and explained. The model can successfully predict long time DC and AC stress data and has been used to determine device degradation at end of life as EOT is scaled for different HKMG devices. (C) 2014 Elsevier Ltd. All rights reserved.
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- 2014
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16. Large-scale mode identification and data-driven sciences
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Subhadeep Mukhopadhyay
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FOS: Computer and information sciences ,multidisciplinary sciences ,Statistics and Probability ,62G30 ,large-scale mode exploration ,Mathematics - Statistics Theory ,Probability density function ,Statistics Theory (math.ST) ,computer.software_genre ,01 natural sciences ,Data-driven ,Data modeling ,Methodology (stat.ME) ,connector density ,010104 statistics & probability ,0103 physical sciences ,FOS: Mathematics ,62G07 ,bump(s) above background ,0101 mathematics ,010303 astronomy & astrophysics ,Statistics - Methodology ,62G86 ,Mathematics ,orthogonal rank polynomials ,Scale (chemistry) ,Nonparametric statistics ,Mode (statistics) ,Skew-G modeling ,nonparametric exploratory modeling ,Identification (information) ,Parametric model ,Data mining ,Statistics, Probability and Uncertainty ,computer - Abstract
Bump-hunting or mode identification is a fundamental problem that arises in almost every scientific field of data-driven discovery. Surprisingly, very few data modeling tools are available for automatic (not requiring manual case-by-base investigation), objective (not subjective), and nonparametric (not based on restrictive parametric model assumptions) mode discovery, which can scale to large data sets. This article introduces LPMode--an algorithm based on a new theory for detecting multimodality of a probability density. We apply LPMode to answer important research questions arising in various fields from environmental science, ecology, econometrics, analytical chemistry to astronomy and cancer genomics., Comment: I would like to express my sincere thanks to the Editor and the anonymous reviewers for their in-depth comments, which have greatly improved the manuscript
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- 2017
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17. On the Mahalanobis-distance based penalized empirical likelihood method in high dimensions
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Subhadeep Mukhopadhyay and Soumendra N. Lahiri
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Statistics and Probability ,Mahalanobis distance ,Empirical likelihood ,Dimension (vector space) ,Sample size determination ,Applied Mathematics ,Likelihood-ratio test ,Statistics ,Sample (statistics) ,Likelihood principle ,Statistic ,Statistics::Computation ,Mathematics - Abstract
In this paper, we consider the penalized empirical likelihood (PEL) method of Bartolucci (2007) for inference on the population mean which is a modification of the standard empirical likelihood and employs a penalty based on the Mahalanobis-distance. We derive the asymptotic distributions of the PEL ratio statistic when the dimension of the observations increases with the sample size. Finite sample properties of the method are investigated through a small simulation study.
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- 2012
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18. Bayesian multiscale smoothing in supervised and semi-supervised kernel discriminant analysis
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Subhadeep Mukhopadhyay and Anil K. Ghosh
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Statistics and Probability ,business.industry ,Applied Mathematics ,Kernel density estimation ,Bayesian probability ,Pattern recognition ,Decision rule ,Computational Mathematics ,symbols.namesake ,Computational Theory and Mathematics ,Test set ,symbols ,Artificial intelligence ,Kernel Fisher discriminant analysis ,Additive smoothing ,business ,Smoothing ,Gibbs sampling ,Mathematics - Abstract
In kernel discriminant analysis, it is common practice to select the smoothing parameter (bandwidth) based on the training data and use it for classifying all unlabeled observations. But this method of selecting a single scale of smoothing ignores the major issue of model uncertainty. Moreover, in addition to depending on the training sample, a good choice of bandwidth may also depend on the observation to be classified, and a fixed level of smoothing may not work well in all parts of the measurement space. So, instead of using a single smoothing parameter, it may be more useful in practice to study classification results for multiple scales of smoothing and judiciously aggregate them to arrive at the final decision. This paper adopts a Bayesian approach to carry out one such multiscale analysis using a probabilistic framework. This framework also helps us to extend our multiscale method for semi-supervised classification, where, in addition to the training sample, one uses unlabeled test set observations to form the decision rule. Some well-known benchmark data sets are analyzed to show the utility of these proposed methods.
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- 2011
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19. Effect of Surface Modification on Laminar Flow in Microchannels Fabricated by UV-Lithography
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Subhadeep Mukhopadhyay, Susanta Sinha Roy, Patrick O'Keeffe, Mark Tweedie, James McLaughlin, and Ashish Mathur
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Materials science ,Microfluidics ,Reynolds number ,Bioengineering ,Laminar flow ,Nanotechnology ,Surfaces and Interfaces ,Photoresist ,Condensed Matter Physics ,Surfaces, Coatings and Films ,Volumetric flow rate ,law.invention ,symbols.namesake ,Mechanics of Materials ,law ,Surface roughness ,symbols ,Surface modification ,Photolithography ,Composite material ,Biotechnology - Abstract
The laminar motion of fluid in microchannels is the necessary criteria for integrated microfluidic system as lab-on-a-chip. Experiments were conducted to investigate laminar flow characteristics of dyed water through photoresist microchannels with square pillars. We found that the pillar dimensions on the channel surfaces have significant impact on the flow rate. The evaluated Reynolds number was less than unity in each microfluidic flow. The compatibility between the pillar sizes and corresponding air-water meniscus movement in microfluidic flow has been reported. [DOI: 10.1380/ejssnt.2009.330]
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- 2009
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20. Nonparametric Distributed Learning Architecture for Big Data: Algorithm and Applications
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Subhadeep Mukhopadhyay, Hsiang-Chieh Yang, Scott A. Bruce, and Zeda Li
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FOS: Computer and information sciences ,Information Systems and Management ,business.industry ,Computer science ,Data transformation ,Big data ,Inference ,Statistical model ,02 engineering and technology ,Data type ,Statistics - Applications ,Statistics - Computation ,Data modeling ,Methodology (stat.ME) ,0202 electrical engineering, electronic engineering, information engineering ,Statistical inference ,Applications (stat.AP) ,020201 artificial intelligence & image processing ,62G05 ,business ,Algorithm ,Categorical variable ,Computation (stat.CO) ,Statistics - Methodology ,Information Systems - Abstract
Dramatic increases in the size and complexity of modern datasets have made traditional "centralized" statistical inference prohibitive. In addition to computational challenges associated with big data learning, the presence of numerous data types (e.g. discrete, continuous, categorical, etc.) makes automation and scalability difficult. A question of immediate concern is how to design a data-intensive statistical inference architecture without changing the basic statistical modeling principles developed for "small" data over the last century. To address this problem, we present MetaLP, a flexible, distributed statistical modeling framework., The purpose of this paper is to answer the question: What is the relevance of small-data-ideas in this big-data world? The bigger question is: Should we make difficult things easy or easy things look difficult? The first option will probably make some impact in the long-run, but the second one will surely earn prestigious journal publications in short-run, IEEE Transactions on Big Data (forthcoming). The first report came out in 2015
- Published
- 2015
21. Scaled Gate Stacks for Sub-20-nm CMOS Logic Applications Through Integration of Thermal IL and ALD HfOx
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P. Liu, Suman Datta, G. Saheli, Souvik Mahapatra, T. Sato, Swenberg Johanes F, K. Joshi, Brendan McDougall, Malcolm J. Bevan, Steven Hung, D. Chu, Christopher Lazik, Atif Noori, Subhadeep Mukhopadhyay, Chi-Nung Ni, L. Date, Bijesh Rajamohanan, A. Wei, and Adam Brand
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Flicker Noise ,Mobility ,Negative-Bias Temperature Instability (Nbti) ,Interlayer (Il) Scaling ,Materials science ,business.industry ,Positive-Bias Temperature Instability (Pbti) ,Bilayer ,Dciv ,Gate stack ,Equivalent oxide thickness ,Nanotechnology ,Equivalent Oxide Thickness (Eot) Scaling ,Electronic, Optical and Magnetic Materials ,Hkmg ,CMOS ,Thermal ,Monolayer ,Gate Leakage ,Optoelectronics ,Electrical and Electronic Engineering ,business ,Scaling ,Leakage (electronics) - Abstract
The impact of gate insulator processes to achieve deeply scaled interlayer (IL)/high-k (HK) bilayer stacks for sub-20-nm CMOS on negative-bias temperature instability and positive-bias temperature instability is studied. IL scaling is done by novel low-thermal-budget rapid-thermal-process-based ultrathin IL and monolayer IL. Innovative IL top surface treatment enables integration of IL and atomic-layer-deposition-based hafnium oxide HK without vacuum break. Fully integrated stacks show scaling of equivalent oxide thickness down to similar to 6 angstrom, with excellent gate leakage, mobility, and world-class BTI. The mechanism responsible for improved BTI is discussed.
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- 2013
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22. An Experimental Perspective of Trap Generation Under BTI Stress
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Subhadeep Mukhopadhyay and Souvik Mahapatra
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Physics ,Negative-Bias Temperature Instability (Nbti) ,Interlayer (Il) Scaling ,Negative-bias temperature instability ,Condensed matter physics ,Trap Generation (Tg) ,Nbti ,Positive-Bias Temperature Instability (Pbti) ,Direct current ,Dciv Method ,Analytical chemistry ,Pbti ,Temperature measurement ,Electronic, Optical and Magnetic Materials ,Stress (mechanics) ,High-K Metal Gate (Hkmg) ,Duty cycle ,Direct Current Iv (Dciv) ,Exponent ,Electrical and Electronic Engineering ,Metal gate ,Scaling ,Gate Stacks - Abstract
A gated-diode or direct current IV method is used to characterize trap generation (TG) under negative-bias temperature instability (NBTI) and positive-bias temperature instability (PBTI) stress in different planar high- $k$ metal gate p-channel and n-channel MOSFETs, respectively. After correction of the measurement delay, very similar time ( $t_{\mathrm {STR}})$ , voltage ( $V_{{G,\mathrm {STR}}})$ , temperature ( $T$ ), AC pulse duty cycle, and frequency ( $f$ ) dependence of TG is seen for NBTI and PBTI. Measured TG shows power-law time dependence with a time exponent of $n\sim $ 0.16 for NBTI and PBTI and for DC and AC stress. Uncoupled nature of voltage acceleration ( $\Gamma )$ and $T$ activation ( $E_{A})$ is seen. Interlayer scaling has a similar impact on $E_{A}$ and $\Gamma $ for NBTI and PBTI. However, the physical location of TG is shown to be different for NBTI and PBTI stress.
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- 2015
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23. A Detailed Study of Gate Insulator Process Dependence of NBTI Using a Compact Model
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K. Joshi, Subhadeep Mukhopadhyay, Souvik Mahapatra, Nirmal Nanware, and Nilesh Goel
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Flicker Noise ,Negative Bias Temperature Instability (Nbti) Modeling ,Materials science ,Silicon oxynitride ,Nitrogen ,Oxide ,Silicon Oxynitride (Sion) ,Physical-Mechanism ,Trapping ,Stress (mechanics) ,High-K Metal Gate (Hkmg) ,chemistry.chemical_compound ,Degradation ,MOSFET ,Electronic engineering ,V-T Shift ,Electrical and Electronic Engineering ,Metal gate ,Bias Temperature Instability ,I-Dlin Technique ,Negative-bias temperature instability ,business.industry ,Interface-Trap Generation ,Process (computing) ,Dciv ,Sion P-Mosfets ,Charge Pumping (Cp) ,Electronic, Optical and Magnetic Materials ,chemistry ,Trap Generation ,Optoelectronics ,business - Abstract
Process impact of negative bias temperature instability (NBTI) is studied in silicon oxynitride (SiON) and high- k metal gate (HKMG) p-MOSFETs. An analytical compact model is used to predict long time degradation. NBTI is shown to be governed by the generation of interface and bulk oxide traps and hole trapping in preexisting traps that are mutually uncorrelated. Experimental evidences are provided to independently verify underlying components. Model parameters are extracted; only a few process-dependent parameters are needed to predict the experimental data from wide range of SiON and HKMG p-MOSFETs at various stress bias and temperature. Similarity between SiON and HKMG devices is highlighted.
- Published
- 2014
24. A condition for setting up ultra-low q/sub α/ discharges in the SINP tokamak
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Subhadeep Mukhopadhyay, Rabindranath Pal, A. N. S. Iyengar, and Soumendra N. Lahiri
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Physics ,Nuclear and High Energy Physics ,Tokamak ,Safety factor ,Alpha (ethology) ,Condensed Matter Physics ,Plasma current ,law.invention ,Nuclear physics ,law ,Plasma instability ,Rise time ,Atomic physics ,Electric current - Abstract
The required rate of plasma current rise for setting up ultra-low q/sub /spl alpha// (ULQ) discharges have been quantified for the first time. It Is observed that the rate depends inversely on the value of the mode rational barrier to be crossed. The empirical relation obtained has important consequences as regards setting up of such discharges and design of ULQ devices.
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- 1997
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25. A Comparative Study of Different Physics-Based NBTI Models
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K. Joshi, B. Jose, Sujay B. Desai, Subhadeep Mukhopadhyay, Muhammad A. Alam, Shashank Gupta, Nilesh Goel, Souvik Mahapatra, Ahmad E. Islam, and Ankit Jain
- Subjects
Silicon ,Materials science ,Insulator (electricity) ,Trapping ,Stress ,Degradation ,Recovery ,MOSFET ,Electronic engineering ,Physics::Atomic Physics ,Two-Stage Model ,Electrical and Electronic Engineering ,Condensed Matter::Quantum Gases ,Bias Temperature Instability ,I-Dlin Technique ,Negative-bias temperature instability ,Interface-Trap Generation ,Negative Bias Temperature Instability (Nbti) ,Sion ,Sion P-Mosfets ,Mechanics ,Physics based ,Electronic, Optical and Magnetic Materials ,Hkmg ,Impact ,Interface Traps ,Duty cycle ,Reaction-Diffusion (Rd) Model ,Hole Trapping ,Two-Well Model ,Mechanism ,Ultrashort pulse ,AND gate - Abstract
Different physics-based negative bias temperature instability (NBTI) models as proposed in the literature are reviewed, and the predictive capability of these models is benchmarked against experimental data. Models that focus exclusively on hole trapping in gate-insulator-process-related preexisting traps are found to be inconsistent with direct experimental evidence of interface trap generation. Models that focus exclusively on interface trap generation are incapable of predicting ultrafast measurement data. Models that assume strong correlation between interface trap generation and hole trapping in switching hole traps cannot simultaneously predict long-time dc stress, recovery, and ac stress and cannot estimate gate insulator process impact. Uncorrelated contributions from generation and recovery of interface traps, together with hole trapping and detrapping in preexisting and newly generated bulk insulator traps, are invoked to comprehensively predict dc stress and recovery, ac duty cycle and frequency, and gate insulator process impact of NBTI. The reaction-diffusion model can accurately predict generation and recovery of interface traps for different devices and experimental conditions. Hole trapping/ detrapping is modeled using a two-level energy well model.
- Published
- 2013
26. Understanding Process Impact of Hole Traps and NBTI in HKMG p-MOSFETs Using Measurements and Atomistic Simulations
- Author
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Sandip De, Kota V. R. M. Murali, Souvik Mahapatra, Subhadeep Mukhopadhyay, K. Joshi, and Rajan K. Pandey
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Flicker Noise ,Negative-bias temperature instability ,Dft Simulations ,Condensed matter physics ,Chemistry ,Analytical chemistry ,Dciv ,Negative Bias Temperature Instability (Nbti) ,Sion ,Electronic, Optical and Magnetic Materials ,Thermal Interlayer (Il) ,Stress (mechanics) ,High-K Metal Gate (Hkmg) ,X-ray photoelectron spectroscopy ,Stack (abstract data type) ,Trap Generation ,Angle-Resolved X-Ray Photoelectron Spectroscopy (Arxps) ,MOSFET ,V-T Shift ,Electrical measurements ,Flicker noise ,Chem-Ox Il ,Electrical and Electronic Engineering ,Hole Traps ,High-κ dielectric - Abstract
The impact of the gate insulator process on interlayer (IL) hole traps in IL/high-K dual-layer p-MOSFET gate-stack is studied by physical and electrical measurements along with atomistic simulations. Processes that lead to higher concentrations of Hf and N in IL, measured by angle-resolved X-ray photoelectron spectroscopy, result in higher IL hole traps measured by flicker noise in prestress and verified by atomistic simulations. The influence of these process induced preexisting IL hole traps on parametric degradation of p-MOSFETs during Negative bias temperature instability (NBTI) stress is studied. The mechanism responsible for superior NBTI of thermal IL stack, having lower Hf and N content in the IL as compared with Chem-Ox IL stack, is explained.
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- 2013
- Full Text
- View/download PDF
27. A penalized empirical likelihood method in high dimensions
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Subhadeep Mukhopadhyay and Soumendra N. Lahiri
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Statistics and Probability ,62E20 ,Calibration (statistics) ,Asymptotic distribution ,simultaneous tests ,subsampling ,Mathematics - Statistics Theory ,Statistics Theory (math.ST) ,Regularization (mathematics) ,Rosenblatt process ,regularization ,Empirical likelihood ,Dimension (vector space) ,Sample size determination ,62G09 ,FOS: Mathematics ,long-range dependence ,Applied mathematics ,Limit (mathematics) ,Statistics, Probability and Uncertainty ,Wiener–Itô integral ,Statistic ,62G20 ,Mathematics - Abstract
This paper formulates a penalized empirical likelihood (PEL) method for inference on the population mean when the dimension of the observations may grow faster than the sample size. Asymptotic distributions of the PEL ratio statistic is derived under different component-wise dependence structures of the observations, namely, (i) non-Ergodic, (ii) long-range dependence and (iii) short-range dependence. It follows that the limit distribution of the proposed PEL ratio statistic can vary widely depending on the correlation structure, and it is typically different from the usual chi-squared limit of the empirical likelihood ratio statistic in the fixed and finite dimensional case. A unified subsampling based calibration is proposed, and its validity is established in all three cases, (i)-(iii). Finite sample properties of the method are investigated through a simulation study., Published in at http://dx.doi.org/10.1214/12-AOS1040 the Annals of Statistics (http://www.imstat.org/aos/) by the Institute of Mathematical Statistics (http://www.imstat.org)
- Published
- 2012
28. Nanoscale surface modifications to control capillary flow characteristics in PMMA microfluidic devices
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James McLaughlin, Raechelle A. D’Sa, Subhadeep Mukhopadhyay, Susanta Sinha Roy, Ashish Mathur, and R Holmes
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Materials science ,business.industry ,Capillary action ,Nano Idea ,Microfluidics ,Nanotechnology ,engineering.material ,Condensed Matter Physics ,Surface energy ,Contact angle ,Materials Science(all) ,Coating ,Surface roughness ,engineering ,Optoelectronics ,Surface modification ,General Materials Science ,Fluidics ,business - Abstract
Polymethylmethacrylate (PMMA) microfluidic devices have been fabricated using a hot embossing technique to incorporate micro-pillar features on the bottom wall of the device which when combined with either a plasma treatment or the coating of a diamond-like carbon (DLC) film presents a range of surface modification profiles. Experimental results presented in detail the surface modifications in the form of distinct changes in the static water contact angle across a range from 44.3 to 81.2 when compared to pristine PMMA surfaces. Additionally, capillary flow of water (dyed to aid visualization) through the microfluidic devices was recorded and analyzed to provide comparison data between filling time of a microfluidic chamber and surface modification characteristics, including the effects of surface energy and surface roughness on the microfluidic flow. We have experimentally demonstrated that fluid flow and thus filling time for the microfluidic device was significantly faster for the device with surface modifications that resulted in a lower static contact angle, and also that the incorporation of micro-pillars into a fluidic device increases the filling time when compared to comparative devices.
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- 2011
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29. EXPERIMENTAL STUDIES OF SURFACE-DRIVEN CAPILLARY FLOW IN PMMA MICROFLUIDIC DEVICES PREPARED BY DIRECT BONDING TECHNIQUE AND PASSIVE SEPARATION OF MICROPARTICLES IN MICROFLUIDIC LABORATORY-ON-A-CHIP SYSTEMS
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Jyoti Prasad Banerjee, Ashish Mathur, Subhadeep Mukhopadhyay, James McLaughlin, Mark Tweedie, and Susanta Sinha Roy
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Microchannel ,Materials science ,Capillary action ,Microfluidics ,Nanotechnology ,Surfaces and Interfaces ,Direct bonding ,Dielectric barrier discharge ,Condensed Matter Physics ,Hot embossing, direct bonding, laboratory-on-a-chip, capillary flow ,Surfaces, Coatings and Films ,Materials Chemistry ,Wetting ,Lithography ,Maskless lithography - Abstract
Proper bonding technique is investigated to achieve leakage-free surface-driven capillary flow in polymethylmethacrylate (PMMA) microfluidic devices. SU-8-based silicon stamp is fabricated by maskless lithography. This stamp is used to produce PMMA microchannel structure by hot embossing lithography. A direct bonding technique is mainly employed for leakage-free sealing inside PMMA microfluidic devices. The effect of surface wettability on surface-driven capillary flow is also investigated in PMMA microfluidic devices. The separation of polystyrene microparticles in PMMA laboratory-on-a-chip systems is investigated with the reduction of separation time by air dielectric barrier discharge (DBD) plasma processing of channel surfaces. This study is useful to fabricate the microfluidic laboratory-on-a-chip systems and to understand the surface-driven capillary flow.
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- 2015
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30. Experimental study on capillary flow through polymer microchannel bends for microfluidic applications
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Susanta Sinha Roy, Ashish Mathur, James McLaughlin, Subhadeep Mukhopadhyay, and Mark Tweedie
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chemistry.chemical_classification ,Microchannel ,Materials science ,Capillary action ,Mechanical Engineering ,Microfluidics ,Analytical chemistry ,Reynolds number ,Polymer ,Aspect ratio (image) ,Electronic, Optical and Magnetic Materials ,symbols.namesake ,chemistry.chemical_compound ,chemistry ,Mechanics of Materials ,symbols ,Fluid dynamics ,Polystyrene ,Electrical and Electronic Engineering ,Composite material - Abstract
Microchannel bends of rectangular cross-section were fabricated on polymethylmethacrylate (PMMA) by hot embossing, with a range of channel widths from 55 µm to 400 µm. The capillary movement of the interface between air and dyed water through the microchannels was recorded and analysed. The microfluidic flow behaviour as a function of the channel aspect ratio was studied. The evaluated Reynolds number was always less than 1.0 in each channel of every device. The air–water interface velocity in the devices was proportional to the channel aspect ratio. The air–water interface velocity shows a prominent increase at 90° separation angle. We observed an increasing trend of the air–water interface velocity with increasing channel aspect ratio. We have studied the separation of 10 µm polystyrene microparticles using a simple microchannel bend structure. We have obtained approximately 100% efficiency for the combined separation and clog-free blocking of 10 µm polystyrene microparticles using the above capillary flow behaviour in a modified microchannel bend structure.
- Published
- 2010
- Full Text
- View/download PDF
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