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Angle-resolved photoemission spectroscopy using a micro-focused beam spot (micro-ARPES) is becoming a powerful tool to elucidate key electronic states of exotic quantum materials. We have developed a versatile micro-ARPES system based on synchrotron radiation beam focused with a Kirkpatrick-Baez mirror optics. The mirrors are monolithically installed on a stage, which is driven with five-axes motion, and are vibrationally separated from the ARPES measurement system. Spatial mapping of the Auphotolithography pattern on Si signifies the beam spot size of 10 $\mu$m (horizontal) x 12 $\mu$m (vertical) at the sample position, which is well suited to resolve the fine structure in local electronic states. Utilization of the micro beam and the high precision sample motion system enables the accurate spatially resolved band-structure mapping, as demonstrated by the observation of a small band anomaly associated with tiny sample bending near the edge of a cleaved topological insulator single crystal., Comment: 21 pages, 8 figures

Beamline 13 of the Photon Factory has been in operation since 2010 as a vacuum ultraviolet and soft X-ray undulator beamline for X-ray photoelectron spectroscopy (XPS), X-ray absorption spectroscopy (XAS), and angle-resolved photoelectron spectroscopy (ARPES) experiments. The beamline and the end-station at branch B have been recently upgraded, enabling microscopic XPS, XAS, and ARPES measurements to be performed. In 2015, a planar undulator insertion device was replaced with an APPLE-II (advanced planar polarized light emitter II) undulator. This replacement allows use of linear, circular, and elliptical polarized light between 48 and 2000 eV with photon intensities of 109–1013 photons s−1. For microscopic measurements, a toroidal post-mirror was renewed to have more focused beam with profile sizes of 78 µm (horizontal) × 15 µm (vertical) and 84 µm × 11 µm at photon energies of 100 and 400 eV, respectively. A high-precision sample manipulator composed of an XYZ translator, a rotary feedthrough, and a newly developed goniometer, which is essential for microscopic measurements, has been used to control a sample specimen in six degrees of freedom, i.e. translation in the X, Y, and Z directions and rotation in the polar, azimuthal, and tilt directions. To demonstrate the performance of the focused beams, one- and two-dimensional XPS and XAS scan measurements of a copper grid have been performed. It was indicated from analysis of XPS and XAS intensity maps that the actual spatial resolution can be determined by the beam size.

At a soft X-ray beamline with an undulator source, significant heat generation at the first-mirror chamber and light emission at the viewport were found, which can be explained by photoelectrons from the mirror. The chamber temperature increases up to approximately 50°C over a period of several hours. A photoelectron shield consisting of thin copper plates not only prevents the heat generation and light emission but also improves the pressure of the vacuum chamber, if a voltage of a few tens of V is applied to the shield. The total electron yield of the shield reached as much as 58 mA under high heat-load conditions, indicating the emission of numerous photoelectrons from the first mirror. Heat-balance analyses suggest that approximately 30% or more of the heat load on the first mirror is transferred to the surroundings.

The present status of a new vacuum ultraviolet/soft X-ray (VUV/SX) beamline (BL-13A) used for the study of organic thin films adsorbed on surfaces is described. The base pressure of BL-13A is maintained below 1×10−8 Pa in order to prevent contamination of the optics by residual gases. The measured performance is as follows: photon-energy region, 30-1,200 eV; photon flux, 109-1011 photons s−1; photon-energy resolution (E/ΔE), 10,000 at a photon energy of 401 eV; spot size (horizontal\ imes;vertical) at the second focus, ≈630×120 μm; photon-energy drift, ≤±0.02 eV at a photon energy of 244.39 eV; reduction of photon flux in the C K-edge region, ∼50%.

One-body type water- and air-cooling fixed masks made of forged 0.2% beryllium copper alloy have been developed, and successfully applied for the front end of a new undulator beamline, BL-13A, at the Photon Factory in Tsukuba, Japan. Advantages of the masks are a simple structure, no welding, low cost, high duration, and an extremely low out-gassing rate. Forged 0.2% beryllium copper alloy is demonstrated to be a valuable material for synchrotron radiation instruments.

Carbon contamination of a chromium-coated mirror was removed by exposure to oxygen activated with non-monochromated synchrotron radiation. Higher-order harmonics of the chromium-coated mirror are much smaller than those of a gold-coated mirror in the carbon K-edge region., Carbon-free chromium-coated optics are ideal in the carbon K-edge region (280–330 eV) because the reflectivity of first-order light is larger than that of gold-coated optics while the second-order harmonics (560–660 eV) are significantly suppressed by chromium L-edge and oxygen K-edge absorption. Here, chromium-, gold- and nickel-coated mirrors have been adopted in the vacuum ultraviolet and soft X-ray branch beamline BL-13B at the Photon Factory in Tsukuba, Japan. Carbon contamination on the chromium-coated mirror was almost completely removed by exposure to oxygen at a pressure of 8 × 10−2 Pa for 1 h under irradiation of non-monochromated synchrotron radiation. The pressure in the chamber recovered to the order of 10−7 Pa within a few hours. The reflectivity of the chromium-coated mirror of the second-order harmonics in the carbon K-edge region (560–660 eV) was found to be a factor of 0.1–0.48 smaller than that of the gold-coated mirror.

Carbon contamination of optics is a serious issue in all soft X-ray beamlines because it decreases the quality of experimental data, such as near-edge X-ray absorption fine structure, resonant photoemission and resonant soft X-ray emission spectra in the carbon K-edge region. Here an in situ method involving the use of oxygen activated by zeroth-order synchrotron radiation was used to clean the optics in a vacuum ultraviolet and soft X-ray undulator beamline, BL-13A at the Photon Factory in Tsukuba, Japan. The carbon contamination of the optics was removed by exposing them to oxygen at a pressure of 10(-1)-10(-4) Pa for 17-20 h and simultaneously irradiating them with zeroth-order synchrotron radiation. After the cleaning, the decrease in the photon intensity in the carbon K-edge region reduced to 2-5%. The base pressure of the beamline recovered to 10(-7)-10(-8) Pa in one day without baking. The beamline can be used without additional commissioning.

The design and performance of a 24 m high-resolution spherical grating monochromator (H-SGM) for the undulator beamline (BL-16B) at the Photon Factory are described. With three interchangeable gratings of 400, 900 and 2000 lines mm−1, the H-SGM is designed to cover the photon energy range 40–600 eV. With a resolving power of approximately 2000 in the photon energy range 40–530 eV, more than 1011 photons s−1 have been measured. The best resolutions obtained so far, at a substantially lower photon flux, are greater than 10 000 at 250 eV and 8000 at 400 eV

Two types of simple non-evaporable getter (NEG) assemblies have been constructed using commercial St707 strips. The first one can be activated by direct current heating at 15 A. The second can be activated by indirect heating using a tantalum heater at 12 A. The base pressure of the chambers pumped solely by the first and the second NEG assemblies reached 2.4×10−8 and

The design and performance of a new soft X-ray beamline BL-11A at the Photon Factory (PF) are presented. A Hettrick-type grazing-incidence monochromator equipped with three varied-line-spacing plane gratings was designed and constructed at a bending-magnet source of the PF 2.5 GeV storage ring. An 800 lines mm−1 laminar grating produced by aspheric-wavefront holographic recording optics, as well as a mechanically ruled blazed one, were tested. A resolving power of more than 4500 was achieved at 400 eV with either grating, and ∼1010 photons s−1 are available at a resolving power of 2000. High photon flux enables low-concentration samples, such as surface adsorbates, to be studied. A simple scanning mechanism for a wide energy range is quite useful for EXAFS measurements on light elements such as C, N and O.

We report on the present status of a vacuum ultraviolet and soft X-ray undulator beamline, BL-13A, located at the Photon Factory. BL-13A is mainly dedicated to the study of organic thin films adsorbed on well-defined surfaces, using angle-resolved photoelectron spectroscopy (ARPES), X-ray photoelectron spectroscopy (XPS), and X-ray absorption spectroscopy (XAS). The photon-energy resolution (E/ΔE) is estimated to be about 10000 at a photon energy of 64 eV with an exit-slit width of 30 μm. The photon intensity is estimated to be 2.9 × 1012 to 5.6 × 108 photons/s for photon energies of 30-1600 eV with an exit-slit width of 100 μm at the ring current of 450 mA. An ultrahigh vacuum (UHV) chamber equipped with an electron-energy analyzer (Gamma Data/Scienta, SES 200) is used as the main end station for ARPES, XPS, and XAS measurements. A sample can be transferred from a UHV chamber for sample preparation or from a UHV chamber for the evaporation of organic materials. The sample-holder acceptors are equipped with a heating and cooling system. The overall electron-energy resolution is estimated to be about 12 meV at a photon energy of 30 eV.