13 results on '"Reichmanis, E."'
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2. Arylmethyl sulfones: A new class of photoacid generators.
3. A sub-0.5 μm bilevel lithographic process using the deep-UV electron-beam resist p(si-cms).
4. Poly(t-BOC-styrene sulfone)-based chemically amplified resists for deep-UV lithography.
5. Chemically amplified resists: Chemistry and processes.
6. Deep UV photolithographic systems and processes.
7. Materials for multilevel resist schemes.
8. The synthesis and characterization of novel 2-nitrobenzyl sulfonate photo-generators of acid.
9. Unsubstituted 9-Azabarbaralane; A π-Destabilized Heterocycle.
10. 3 H-3-Benzazonine and the 3-Benzazoninyl Anion.
11. ChemInform Abstract: Chemical Amplification Mechanisms for Microlithography.
12. ChemInform Abstract: Design, Synthesis, Characterization, and Use of All-Organic Nonionic Photogenerators of Acid.
13. trans-Benzocyclononatetraenyl Anion.
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