Effect of post-exposure delay in positive acting chemically amplified resists: An analytical study.

Details

Language :

English

ISSN :

00323888

Volume :

32

Issue :

21

Database :

Complementary Index

Journal :

Polymer Engineering & Science

Publication Type :

Academic Journal

Accession number :

62423972

Full Text :

https://doi.org/10.1002/pen.760322104