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We have doped the core of Ytterbium (Yb) laser fibers additionally with Neodymium (Nd) to exploit wavelength-multiplexed high-power pump systems, which are commercially available. By pumping such a Nd:Yb-codoped fiber with the 808/940/978 nm-diode system, we could demonstrate CW output powers of more than 1 kW with high laser slope efficiency. In order to get a better understanding of this laser medium, we studied the fluorescence and the laser behavior of Nd:Yb fibers with different rare earth concentrations in comparison to a fiber doped solely with Nd. A theoretical model for the calculation of the fluorescence decay curve and spectrum as well as the laser characteristic and wavelength was developed, that takes the energy transfer process from Nd to Yb ions into account. Comparing the experimental and theoretical results, the behavior of the Nd:Yb high power fiber laser is understood as a collective emission of both ion types within the same wavelength region. These investigations contribute to the optimization of high power fiber lasers under the viewpoint of thermal load.

A new type of multi-clad rare-earth doped silica fiber was designed, prepared and tested for the power scaling of high power fiber lasers in the 1 .1 tm wavelength region. By means of a dedicated laboratory setup a maximum output power of more than 1 .300 watts with excellent spectral and beam behavior was achieved. The fundamental investigation of the energy transfer processes and of the fluorescence lifetimes of different Nd:Yb co-doped has been studied. Such fiber-lasers were tested in the laboratory at several materials (plastics, metals, glass) in the fields of material processing and micro-marking, respectively.

The inscription of fiber Bragg gratings during the drawing process is shown to be a very useful method to realize sensor arrays with high numbers of gratings and excellent mechanical strength and also type two gratings with high temperature stability. Results of single pulse grating arrays with numbers between ten and >100 and definite wavelengths and positions for sensor applications were achieved at 1550nm and 830nm using new photosensitive fibers developed in IPHT. Single pulse type-1 gratings at 1550 nm with more than 30% Reflectivity were shown first time to our knowledge. The mechanical strength of this fiber with an Ormocer coating with those single pulse gratings is the same like standard telecomm fibers. Weibull plots of fiber tests will be shown. At 830 nm we reach more than 10% reflectivity with single pulse writing during the fiber drawing in photosensitive fibers with less than 16 dB transmission loss. These gratings are useful for stress and vibration sensing applications. Type two gratings with reflectivity near 100% and smooth spectral shape and spectral width of about 1 nm reach temperature stability above 1200 K. They are also realized in the fiber drawing process. These Gratings are useful for temperature sensor applications.

The availability of extreme ultraviolet (EUV) light sources, measurement tools and integrated test systems is of major importance for the development of EUV lithography for use in high volume chip manufacturing which is expected to start in 2009. The estimates of cost of an EUV exposure tool in combination with sophisticated throughput models leads to a throughput of 120 wafers per hour necessary for economic use of EUV lithography. Concluding from that light sources are necessary which deliver an EUV output power of 115 W at 13.5 nm at the entrance of the illuminator system. The power requirement in combination with the required lifetimes of source components and collector optics make the source technology the most critical issue to be solved when developing EUV lithography. The present paper gives an update of the development status of EUV light sources at XTREME technologies, a joint venture of Lambda Physik AG, Goettingen, and Jenoptik LOS GmbH, Jena, Germany. Results on both laser produced plasma (LPP) and gas discharge produced plasma (GDPP), the two major technologies in EUV sources, are given. The LPP EUV sources use xenon-jet target systems and pulsed lasers with 500 W average power at up to 10 kHz developed at XTREME technologies. The maximum conversion efficiency from laser power into EUV in-band power is 1.0% into 2π solid angle. 2.0 W EUV radiation is generated at 13.5 nm in 2π sr solid angle. The small source volume of < 0.3 mm diameter will allow large collection angles of 5 sr. The intermediate focus power is estimated to 1 W. Collector mirror lifetime tests showed 5 million pulses lifetime without debris mitigation. With debris mitigation in place lifetimes of more than 1 billion pulses are estimated. For the next generation of higher power EUV LPP sources a laser driver has been tested at 1.3 kW average laser power. This will lead to 5 W EUV power in intermediate focus. The GDPP EUV sources use the Z-pinch principle with efficient sliding discharge pre-ionization. Prototype commercial gas discharge sources with an EUV power of 35W in 2π sr were already delivered for integration into EUV microsteppers. These sources are equipped with a debris-filter which results in an optics lifetime exceeding 100 million discharges at 1 kHz repetition frequency. The same lifetime was achieved for the components of the discharge system itself. The progress in the development of high-power discharge sources resulted in an EUV power of 150 W in continuous operation at 4.5 kHz repetition rate by implementation of porous metal cooling technology. The EUV plasma has a FWHM-diameter of 0.5 mm and a FWHM-length of 1.5 mm. The intermediate focus power is calculated to be in the range of 15 W - 20 W, depending somewhat on the transmission of the optical path to the intermediate focus and on the etendue specification. The typical fluctuations of the EUV energy are standard deviation σ

Semiconductor chip manufacturers are expecting to use extreme ultraviolet (EUV) lithography for high volume manufacturing of DRAMs and ICs starting by the end of this decade. Among all the technologies and modules which have to be developed EUV sources at 13.5 nm are considered to be the most critical issue. Specifically the required output power of 115 W at the entrance of the illuminator system in combination with the required lifetimes of source components and collector optics make the source technology critical for EUV lithography. The present paper gives an update of the development status of EUV light sources at XTREME technologies, a joint venture of Lambda Physik AG, Goettingen, and Jenoptik LOS GmbH, Jena, Germany. Results on both laser produced plasma (LPP) and gas discharge produced plasma (GDPP), the two major technologies in EUV sources, are given. The LPP EUV sources use xenon-jet target systems and pulsed lasers with 500 W average power at up to 10 kHz developed at XTREME technologies. The maximum conversion efficiency from laser power into EUV in-band power is 1.0 % into 2p solid angle. 2.0 W EUV radiation is generated at 13.5 nm in 2p sr solid angle. The small source volume of < 0.3 mm diameter will allow large collection angles of 5 sr. The intermediate focus power is estimated to 1 W. Collector mirror lifetime tests showed 5 million pulses lifetime without debris mitigation. With debris mitigation in place lifetimes of more than 1 billion pulses are estimated. For the next generation of higher power EUV LPP sources a laser driver has been tested at 1.3 kW average laser power. This will lead to 5 W EUV power in intermediate focus. The GDPP EUV sources use the Z-pinch principle with efficient sliding discharge pre-ionization. Prototype commercial gas discharge sources with an EUV power of 35W in 2p sr were already delivered for integration into EUV microsteppers. These sources are equipped with a debris-filter which results in an optics lifetime exceeding 100 million discharges at 1 kHz repetition frequency. The same lifetime was achieved for the components of the discharge system itself. The progress in the development of high-power discharge sources resulted in an EUV power of 150 W in continuous operation at 4.5 kHz repetition rate by implementation of porous metal cooling technology. The EUV plasma has a FWHM-diameter of 0.5 mm and a FWHM-length of 1.5 mm. The intermediate focus power is calculated to be in the range of 15 W - 20 W, depending somewhat on the transmission of the optical path to the intermediate focus and on the etendue specification. The typical fluctuations of the EUV energy are standard deviation s

In this paper a very compact device of a very efficient high- power fiber-laser based on a specially designed Ytterbium (Yb)-doped double-clad D-Shape silica fiber with an output power of more than 8 watts will be described. The development, preparation and characterization of rare-earth doped double- clad optical fibers based on silica for the application in high-power fiber-lasers were done at the Optics Division of the Institute for Physical High-Technology e.V. Jena (IPHT) in the last few years. The doping with Ytterbium as the laseractive component was one of the most important questions which were investigated. Many samples had to be made for the optimum concentration of Yb, the optimum codoping and geometry, respectively. As a result of these experiments we realized a double-clad fiber with D-shape geometry of the pump-core. This D-shape resulted from ray-tracing calculations performed at the Lasercentre Hannover e.V. (LZH) as an optimal solution for the high conversion efficiency of the pump-power. Considering these numerical results, such fibers were realized at IPHT by drawing a sidepolished preform by preserving the cross section of the preform. After some basic investigations on the optimum wavelength for the pump-light and the resonator length, respectively, a compact device with a launched pump- power of approx. 13 W and an output-power of more than 8 watts was developed and realized. The maximum output-power was only limited by the pump-power available at our laboratory at the chosen wavelength. Main advantages of the setup are the short length of the laseractive fiber (less than 10 m), the high efficiency (greater than 60%) and the compactness of the device. Additionally, the diameter of the pump-core was reduced to 125 micrometer. These kinds of fibers were tested with a specially designed pump-source of the Fraunhofer Institute for Applied Optics and Precision Engineering in Jena. The first result with a double-clad Yb-doped fiber of only 4 meter length was a fiber-laser with an output-power of about 4 Watts. Last but not least, some basic experiments with Fiber-Bragg-Gratings (FBG) as one of the resonator mirrors were done. A fiber-laser with a FBG for the laser-wavelength had an output-power of about 700 mW with a FWHM of about 0.1 nm.

In this paper the results of the systematical investigation of the basic effects in Nd-doped silica fibers and their application in high-power fiber-lasers will be presented. The development and manufacturing of rare-earth doped double-clad optical fibers based on silica was done at the department 'Moderne Optik' of the Institut fur Physikalische Hochtechnologie e.V. Jena (IPHT). In the last few years at the IPHT Jena rare-earth doped double-clad fibers based on silica for the application in high-power fiber-lasers were developed and characterized. The doping with Neodymium as the laseractive component was one of the most important questions which were investigated. Many samples had to be made for the determination of the optimum concentration of Nd, the optimum codoping and geometry, respectively. As a result we realized a double-clad fiber with D-shape geometry of the pump-core. This D-shape resulted from ray-tracing calculations performed at the Laserzentrum Hannover e.V. (LZH) as an optimal solution for the high conversion efficiency of the pump power. Considering these numerical results, such double-clad fibers with different diameters of the Nd-doped laser-core (multimode or single-mode) was realized at IPHT by drawing of sidepolished preforms with different compositions and geometries by preserving the cross section of the preform. In a tight cooperation with the LZH cw-output powers of more than 30 W (multimode fiber-laser) and approx. 14 W (single-mode fiber-laser), respectively, were realized in the lab. First compact and transportable 19'-devices of high-power fiber- laser with a pumping power of approx. 10 W and an output power of more than two watts were developed and realized.