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2. Pre-PDK block-level PPAC assessment of technology options for sub-7nm high-performance logic

Author

V. Gerousis, N. Nakamoto, Chanemougame Daniel, Lars W. Liebmann, K. Sun, Gregory A. Northrop, M. Facchini, Z. Baum, L. Riviere Cazaux, and Han Geng

Subjects
Standard cell, Design objective, Point (typography), Computer science, Process (engineering), Process design, Node (circuits), Routing (electronic design automation), Reliability engineering, Power (physics)
Abstract

This paper describes a rigorous yet flexible standard cell place-and-route flow that is used to quantify block-level power, performance, and area trade-offs driven by two unique cell architectures and their associated design rule differences. The two architectures examined in this paper differ primarily in their use of different power-distribution-networks to achieve the desired circuit performance for high-performance logic designs. The paper shows the importance of incorporating block-level routability experiments in the early phases of design-technology co-optimization by reviewing a series of routing trials that explore different aspects of the technology definition. Since the electrical and physical parameters leading to critical process assumptions and design rules are unique to specific integration schemes and design objectives, it is understood that the goal of this work is not to promote one cell-architecture over another, but rather to convey the importance of exploring critical trade-offs long before the process details of the technology node are finalized to a point where a process design kit can be published.

Published
2018
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6. EUV patterning successes and frontiers

Author

Felix, Nelson, additional, Corliss, Dan, additional, Petrillo, Karen, additional, Saulnier, Nicole, additional, Xu, Yongan, additional, Meli, Luciana, additional, Tang, Hao, additional, De Silva, Anuja, additional, Hamieh, Bassem, additional, Burkhardt, Martin, additional, Mignot, Yann, additional, Johnson, Richard, additional, Robinson, Chris, additional, Breton, Mary, additional, Seshadri, Indira, additional, Dunn, Derren, additional, Sieg, Stuart, additional, Miller, Eric, additional, Beique, Genevieve, additional, Labonte, Andre, additional, Sun, Lei, additional, Han, Geng, additional, Verduijn, Erik, additional, Han, Eunshoo, additional, Kim, Bong Cheol, additional, Kim, Jongsu, additional, Hontake, Koichi, additional, Huli, Lior, additional, Lemley, Corey, additional, Hetzer, Dave, additional, Kawakami, Shinichiro, additional, and Matsunaga, Koichi, additional

Published
2016
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10. Modeling polarization for hyper-NA lithography tools and masks

Author

Lai, Kafai, primary, Rosenbluth, Alan E., additional, Han, Geng, additional, Tirapu-Azpiroz, Jaione, additional, Meiring, Jason, additional, Goehnermeier, Aksel, additional, Kneer, Bernhard, additional, Totzeck, Michael, additional, de Winter, Laurens, additional, de Boeij, Wim, additional, and van de Kerkhof, Mark, additional

Published
2007
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