60 results on '"Givens, Michael"'
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2. 'Method Of Forming An Epitaxial Layer' in Patent Application Approval Process (USPTO 20240203730)
3. 'Methods For Forming A Metal Silicate Film On A Substrate In A Reaction Chamber And Related Semiconductor Device Structures' in Patent Application Approval Process (USPTO 20240030296)
4. Patent Issued for Methods for forming a metal silicate film on a substrate in a reaction chamber and related semiconductor device structures (USPTO 11798999)
5. 'In situ generation process and system' in Patent Application Approval Process (USPTO 20230032495)
6. 'Methods For Forming A Metal Silicate Film On A Substrate In A Reaction Chamber And Related Semiconductor Device Structures' in Patent Application Approval Process (USPTO 20220367647)
7. Patent Issued for Methods for forming a metal silicate film on a substrate in a reaction chamber and related semiconductor device structures (USPTO 11411088)
8. 'Method Of Forming Structures For Threshold Voltage Control' in Patent Application Approval Process (USPTO 20220123131)
9. Patent Issued for Methods for forming a semiconductor device structure and related semiconductor device structures (USPTO 11164955)
10. 'Titanium Aluminum And Tantalum Aluminum Thin Films' in Patent Application Approval Process (USPTO 20200328285)
11. Patent Issued for Methods For Forming A Transition Metal Nitride Film On A Substrate By Atomic Layer Deposition And Related Semiconductor Device Structures (USPTO 10,720,331)
12. Patent Issued for Methods For Forming A Semiconductor Device And Related Semiconductor Device Structures (USPTO 10,643,904)
13. Patent Issued for Systems And Methods For Dynamic Semiconductor Process Scheduling (USPTO 10,566,223)
14. 'Method and System for Creating and Running Contests on Social Feeds and Other Communication Platforms' in Patent Application Approval Process (USPTO 20180021678)
15. 'Systems and Methods for Dynamic Semiconductor Process Scheduling' in Patent Application Approval Process (USPTO 20170256429)
16. 'Semiconductor Device Dielectric Interface Layer' in Patent Application Approval Process
17. 'Semiconductor Device Dielectric Interface Layer' in Patent Application Approval Process
18. Patent Issued for Semiconductor Device Dielectric Interface Layer
19. Patent Issued for Methods for forming a semiconductor device structure and related semiconductor device structures (USPTO 12166099)
20. Patent Application Titled 'Methods And Systems For Forming Structures Comprising A Threshold Voltage Tuning Layer' Published Online (USPTO 20240234129)
21. Patent Application Titled 'Apparatus For Providing A Gas Mixture To A Reaction Chamber And Method Of Using Same' Published Online (USPTO 20240141486)
22. Patent Issued for Selective deposition of metal oxides on metal surfaces (USPTO 11965238)
23. Patent Issued for Selective deposition of silicon oxide on dielectric surfaces relative to metal surfaces (USPTO 11898240)
24. Patent Application Titled 'Methods And Systems For Forming Dipole Layers In Stacked Gate-All-Around Transistors' Published Online (USPTO 20230386934)
25. Researchers Submit Patent Application, 'Simultaneous Selective Deposition Of Two Different Materials On Two Different Surfaces', for Approval (USPTO 20230203644)
26. Researchers Submit Patent Application, 'Selective Deposition Using Thermal And Plasma-Enhanced Process', for Approval (USPTO 20230139917)
27. Researchers Submit Patent Application, 'Selective Deposition Of Material Comprising Silicon And Oxygen Using Plasma', for Approval (USPTO 20230140367)
28. Patent Application Titled 'Selective Thermal Deposition Method' Published Online (USPTO 20230140812)
29. Patent Issued for Simultaneous selective deposition of two different materials on two different surfaces (USPTO 11608557)
30. 'Method Of Forming Structures Including A Vanadium Or Indium Layer' in Patent Application Approval Process (USPTO 20230078233)
31. Researchers Submit Patent Application, 'Method Of Forming Patterned Structures', for Approval (USPTO 20230059464)
32. 'Method Of Forming Structures For Threshold Voltage Control' in Patent Application Approval Process (USPTO 20220165575)
33. Patent Application Titled 'Silicon Oxide Deposition Method' Published Online (USPTO 20220084817)
34. Researchers Submit Patent Application, 'Method Of Cleaning A Surface', for Approval (USPTO 20220068634)
35. Patent Issued for Methods for depositing a hafnium lanthanum oxide film on a substrate by a cyclical deposition process in a reaction chamber (USPTO 11227763)
36. Researchers Submit Patent Application, 'Titanium Aluminum And Tantalum Aluminum Thin Films', for Approval (USPTO 20210399111)
37. Researchers Submit Patent Application, 'Selective Passivation And Selective Deposition', for Approval (USPTO 20210358745)
38. Patent Issued for Selective passivation and selective deposition (USPTO 11145506)
39. Patent Issued for Titanium aluminum and tantalum aluminum thin films (USPTO 11139383)
40. Patent Application Titled 'Simultaneous Selective Deposition Of Two Different Materials On Two Different Surfaces' Published Online (USPTO 20210301391)
41. Patent Application Titled 'Method Of Forming Structures Including A Vanadium Or Indium Layer' Published Online (USPTO 20210242011)
42. Patent Application Titled 'Substrate Processing Apparatus And Method' Published Online (USPTO 20210033977)
43. Patent Application Titled 'Methods For Forming A Metal Silicate Film On A Substrate In A Reaction Chamber And Related Semiconductor Device Structures' Published Online (USPTO 20210005723)
44. Patent Issued for Sulfur-Containing Thin Films (USPTO 10,854,444)
45. Patent Issued for Methods For Forming A Metal Silicate Film On A Substrate In A Reaction Chamber And Related Semiconductor Device Structures (USPTO 10,818,758)
46. Researchers Submit Patent Application, 'Selective Deposition Of Metal Oxides On Metal Surfaces', for Approval (USPTO 20200325573)
47. Patent Application Titled 'Sulfur-Containing Thin Films' Published Online (USPTO 20200266054)
48. 'Methods For Depositing A Hafnium Lanthanum Oxide Film On A Substrate By A Cyclical Deposition Process In A Reaction Chamber' in Patent Application Approval Process (USPTO 20200266055)
49. 'Methods For Forming A Metal Silicate Film On A Substrate In A Reaction Chamber And Related Semiconductor Device Structures' in Patent Application Approval Process (USPTO 20200161438)
50. Patent Issued for Titanium Aluminum And Tantalum Aluminum Thin Films (USPTO 10,636,889)
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