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This paper demonstrates the first vertical field-effect transistor based on gallium nitride (GaN) fin structures with an inverted p-doped channel layer. A top-down hybrid etching approach combining inductively coupled plasma reactive ion etching and KOH-based wet etching was applied to fabricate regular fields of GaN fins with smooth a-plane sidewalls. The obtained morphologies are explained using a cavity step-flow model. A 3D processing scheme has been developed and evaluated via focussed ion beam cross-sections. The top-down approach allows the introduction of arbitrary doping profiles along the channel without regrowth, enabling the modulation of the channel properties and thus increasing the flexibility of the device concept. Here, a vertical npn-doping profile was used to achieve normally-off operation with an increased threshold voltage as high as 2.65 V. The p-doped region and the 3D gate wrapped around the sidewalls create a very narrow vertical electron channel close to the interface between dielectric and semiconductor, resulting in good electrostatic gate control, low leakage currents through the inner fin core and high sensitivity to the interface between GaN and gate oxide. Hydrodynamic transport simulations were carried out and show good agreement with the performed current–voltage and capacitance–voltage measurements. The simulation indicates a reduced channel mobility which we attribute to interface scattering being particularly relevant in narrow channels. We also demonstrate the existence of oxide and interface traps with an estimated sheet density of 3.2 × 1012 cm−2 related to the Al2O3 gate dielectric causing an increased subthreshold swing. Thus, improving the interface quality is essential to reach the full potential of the presented vertical 3D transistor concept.

Chirped surface acoustic wave (SAW) resonators based on aluminum nitride (AlN) thin films have been designed and fabricated to comprehend the wave propagation characteristics induced by interdigitated transducers (IDTs) deposited on their surfaces. From the simulation results, design and geometry of the metal fingers including their width and pitch play critical roles on the wavelength of the acoustic wave and the mechanical displacement, which subsequently set the device resonant frequency. A single-step metal lift-off process involving photolithography and electron beam metal evaporation has been used to pattern and deposit Cr/Au IDT on AlN-on-Si wafers.

ZnO nanorod-based single quantum well heterostructures were fabricated in a two-step process. Nanorods were first grown using vapour transport. Subsequently, high-quality ZnO/Zn0.85Mg0.15O heterostructures were grown on the nanorods using molecular beam epitaxy. The nanorods are well aligned along the c-axis of ZnO, as indicated by a very narrow rocking curve full width at half maximum. Quantum confinement was clearly observed within the ZnO well for different well widths. The quantum wells show photoluminescence peaks with a full width at half maximum as small as 15 meV.

In this contribution we analyse the structural and optical properties of ZnO as well as ZnMgO nanopillars grown catalyst-free by metalorganic vapour-phase epitaxy. The nanostructures were grown directly onto different substrate materials with various orientations. The nanopillars deposited on a-plane sapphire show the best vertical c-axis alignment and have a typical diameter of about 50 nm and a height of several micrometres, depending on growth time. We achieved well ordered, almost completely c-axis oriented pillars, as confirmed by scanning electron microscopy and high resolution x-ray diffraction. Photoluminescence measurements revealed very narrow donor-bound exciton emission lines with half widths as small as 0.5 meV. In order to investigate the possibility of a combination of band gap engineering and nanopillar growth, ZnMgO nanopillars were also grown. The Mg incorporation was confirmed by photoluminescence measurements and a blue shift of the band gap of up to 170 meV could be achieved for the nanopillars with the highest Mg concentration.

Vertically aligned gallium nitride (GaN) nanowire (NW) arrays have attracted a lot of attention because of their potential for novel devices in the fields of optoelectronics and nanoelectronics. In this work, GaN NW arrays have been designed and fabricated by combining suitable nanomachining processes including dry and wet etching. After inductively coupled plasma dry reactive ion etching, the GaN NWs are subsequently treated in wet chemical etching using AZ400K developer (i.e., with an activation energy of 0.69 ± 0.02 eV and a Cr mask) to form hexagonal and smooth a-plane sidewalls. Etching experiments using potassium hydroxide (KOH) water solution reveal that the sidewall orientation preference depends on etchant concentration. A model concerning surface bonding configuration on crystallography facets has been proposed to understand the anisotropic wet etching mechanism. Finally, NW array-based vertical field-effect transistors with wrap-gated structure have been fabricated. A device composed of 99 NWs exhibits enhancement mode operation with a threshold voltage of 1.5 V, a superior electrostatic control, and a high current output of >10 mA, which prevail potential applications in next-generation power switches and high-temperature digital circuits.

We have investigated the Raman signals of vibrational modes and the phonon sidebands of resonantly excited donor - acceptor-pair recombination in p-doped CdTe and ZnSe. Under resonant excitation of donor - acceptor-pair states we observe an enhanced sensitivity of the optical spectroscopy to the spectrum of local vibrational excitations. The measured signals are interpreted as local vibrational modes of the dopants or as phonons with wavevectors at distinguished points of the Brillouin zone others than the centre point . These latter signals correspond either to the maxima of the phonon density of states of the host crystal or to longitudinal optical phonons with finite but discrete wavevectors defined by the donor - acceptor-pair separations. The results can contribute to the characterization of the materials as well as to the investigation of the processes of the acceptor compensation.

Employing nanofocus x-ray diffraction, we investigate the local strain field induced by a five-fold (In,Ga)N multi-quantum well embedded into a GaN micro-rod in core-shell geometry. Due to an x-ray beam width of only 150 nm in diameter, we are able to distinguish between individual m-facets and to detect a significant in-plane strain gradient along the rod height. This gradient translates to a red-shift in the emitted wavelength revealed by spatially resolved cathodoluminescence measurements. We interpret the result in terms of numerically derived in-plane strain using the finite element method and subsequent kinematic scattering simulations which show that the driving parameter for this effect is an increasing indium content towards the rod tip.

Three-dimensional (3D) InGaN/GaN quantum-well (QW) core–shell light emitting diodes (LEDs) are a promising candidate for the future solid state lighting. In this contribution, we study direct correlations of structural and optical properties of the core–shell LEDs using highly spatially-resolved cathodoluminescence spectroscopy (CL) in combination with scanning electron microscopy (SEM) and scanning transmission electron microscopy (STEM). Temperature-dependent resonant photoluminescence (PL) spectroscopy has been performed to understand recombination mechanisms and to estimate the internal quantum efficiency (IQE).

We report on optical reflection measurements on ternary alloy (CdMg)Te thin films grown by molecular beam epitaxy. Data have been obtained in the spectral range between 1.2 eV and 2.8 eV, and at temperatures between 300 K and 77 K. The reflection coefficient as a function of energy E has been theoretically described taking into account multiple reflections at the interfaces involved. The dispersion relation n2(E)=a+bE2/(1-(E/c)2) has been used. A comparison with the experimental data has yielded the refractive index as a function of energy. The value of the refractive index n is given as a function of energy for the ternary alloy (CdMg)Te for different Mg concentrations and different temperatures. These results are essential for designing efficient waveguides for semiconductor laser structures using (CdMg)Te as a base material.

X-ray photoelectron and Auger electron spectroscopy as well as reflection high energy electron diffraction have been used to investigate the influence of heat treatment and sputtering on the oxygen and carbon contamination of the (100) Cd0.96Zn0.04Te surface. It was found that oxygen contamination can be completely eliminated from the surface at 300 degrees C in an ultra-high vacuum but not carbon. Heating at still higher temperatures decreases the carbon contamination only slightly while increasing the Zn to Cd ratio on the surface considerably. This affects the Cd0.96Zn0.04Te surface structure and hence subsequent molecular beam epitaxial growth. The authors have found that sputtering with argon ions at an incident angle ranging between 20 degrees and 60 degrees at temperatures between 200 and 250 degrees C can remove nearly all carbon contamination from the surface without destroying the (2*1) surface reconstruction.

The paper presents comparison of two different 3D models of vertical, rotating disc MOCVD reactor used for 3D GaN structure growth. The first one is based on the reactor symmetry, while the second, novel one incorporates only single line of showerhead nozzles. It is shown that both of them can be applied interchangeably regarding the phenomena taking place within the processing area. Moreover, the importance of boundary conditions regarding proper modelling of showerhead cooling and the significance of thermal radiation on temperature field within the modelled structure are presented and analysed. The last phenomenon is erroneously neglected in most of the hitherto studies.

Transmission and scanning electron microscopy have been used to characterise GaN/InGaN 3D nanostructures grown on patterned GaN/sapphire substrates by MOVPE. It has been found that the growth of well ordered arrays of such nanostructures, containing multiple quantum wells on non-polar side-facets, can be achieved with a low density of defects. Growth changes and surface morphology play a major role in the nucleation of any defects present. The nanostructure morphology has been investigated and non-uniform growth on adjacent facets studied.

The growth mechanism of catalyst-free self-organized GaN nuclei and three-dimensional columns on sapphire by metal organic vapour phase epitaxy (MOVPE) is investigated. Temperature- and time-dependent growth is performed. The growth behaviour can be characterized by two different kinetic regimes: mass-transport-limited growth and thermodynamically limited growth. The sum of activation energies for thermodynamic barrier of nucleation and for surface diffusion/mass-transport limitation, i.e. Whet +Ed, is 0.57 eV in the ‘low’-temperature region and 2.43 eV in the ‘high’-temperature region. GaN columns grown under the same conditions have very comparable height, which is not dependent on their diameter or the distance to other columns. Therefore, the growth rate is presumably limited by the incorporation rate on the top surface of columns. The height and diameter at the top of the GaN columns increase linearly with time and no height limit is observed. The GaN columns can reach more than 40 µm in height. Moreover, the investigated GaN columns are Ga-polar.

International audience; The existence of intrinsic carrier interface states in heterostructures with no common atom at the interface (such as ZnSe/BeTe) is shown experimentally by ellipsometry and photoluminescence spectroscopy. These states are located on interfaces and lie inside the effective bandgap of the structure; they are characterized by a high density and a long lifetime. A tight binding model confirms theoretically the existence of these states in ZnSe/BeTe heterostructures for a ZnTe-type interface, in contrast to the case of the BeSe-type interface for which they do not exist.

We demonstrate the fabrication of N-face GaN nanorods by metal organic vapour phase epitaxy (MOVPE), using continuous-flux conditions. This is in contrast to other approaches reported so far, which have been based on growth modes far off the conventional growth regimes. For position control of nanorods an SiO(2) masking layer with a dense hole pattern on a c-plane sapphire substrate was used. Nanorods with InGaN/GaN heterostructures have been grown catalyst-free. High growth rates up to 25 microm h(-1) were observed and a well-adjusted carrier gas mixture between hydrogen and nitrogen enabled homogeneous nanorod diameters down to 220 nm with aspect ratios of approximately 8:1. The structural quality and defect progression within nanorods were determined by transmission electron microscopy (TEM). Different emission energies for InGaN quantum wells (QWs) could be assigned to different side facets by room temperature cathodoluminescence (CL) measurements.

We report on a micro-machined resonator for mass sensing applications which is based on a silicon cantilever excited with a sputter-deposited piezoelectric aluminium nitride (AlN) thin film actuator. An inductively coupled plasma (ICP) cryogenic dry etching process was applied for the micro-machining of the silicon substrate. A shift in resonance frequency was observed, which was proportional to a mass deposited in an e-beam evaporation process on top. We had a mass sensing limit of 5.2 ng. The measurements from the cantilevers of the two arrays revealed a quality factor of 155–298 and a mass sensitivity of 120.34 ng Hz−1 for the first array, and a quality factor of 130–137 and a mass sensitivity of 104.38 ng Hz−1 for the second array. Furthermore, we managed to fabricate silicon cantilevers, which can be improved for the detection in the picogram range due to a reduction of the geometrical dimensions.

Concerning optoelectronic devices fabricated by epitaxial methods, the combination of ZnO and GaN has promising aspects regarding their good optical properties and a relatively good lattice matching between both as compared to other foreign substrates like sapphire or silicon. Moreover ZnO nanopillar arrays may serve as a template for GaN nanopillar fabrication or for high quality GaN layers by lateral overgrowth of the ZnO nanopillars. In this work, we investigate the combination of two very different growth methods – aqueous chemical low temperature growth (ACG) for the ZnO nanopillar templates on silicon substrates and metalorganic vapor phase epitaxy (MOVPE) for the GaN overgrowth – in order to show to which extent the very cost efficient ZnO templates suit the high demands of GaN MOVPE. By a combination of annealing and photoluminescence experiments we show that the properties of the heterostructures change significantly with temperature.

Inductively coupled plasma (ICP) cryogenic dry etching was used to etch submicron pores, nano contact lines, submicron diameter pillars, thin and thick cantilevers, membrane structures and anisotropic deep structures with high aspect ratios in silicon for bio-nanoelectronics, optoelectronics and nano-micro electromechanical systems (NMEMS). The ICP cryogenic dry etching gives us the advantage of switching plasmas between etch rates of 13 nm min−1 and 4 µm min−1 for submicron pores and for membrane structures, respectively. A very thin photoresist mask can endure at −75 °C even during etching 70 µm deep for cantilevers and 300 µm deep for membrane structures. Coating the backsides of silicon membrane substrates with a thin photoresist film inhibited the lateral etching of cantilevers during their front release. Between −95 °C and −140 °C, we realized crystallographic-plane-dependent etching that creates facets only at the etch profile bottom. By varying the oxygen content and the process temperature, we achieved good control over the shape of the etched structures. The formation of black silicon during membrane etching down to 300 µm was delayed by reducing the oxygen content.

Zinc oxide (ZnO), with its excellent luminescent properties and the ease of growth of its nanostructures, holds promise for the development of photonic devices. The recent advances in growth of ZnO nanorods are discussed. Results from both low temperature and high temperature growth approaches are presented. The techniques which are presented include metal-organic chemical vapour deposition (MOCVD), vapour phase epitaxy (VPE), pulse laser deposition (PLD), vapour-liquid-solid (VLS), aqueous chemical growth (ACG) and finally the electrodeposition technique as an example of a selective growth approach. Results from structural as well as optical properties of a variety of ZnO nanorods are shown and analysed using different techniques, including high resolution transmission electron microscopy (HR-TEM), scanning electron microscopy (SEM), photoluminescence (PL) and cathodoluminescence (CL), for both room temperature and for low temperature performance. These results indicate that the grown ZnO nanorods possess reproducible and interesting optical properties. Results on obtaining p-type doping in ZnO micro- and nanorods are also demonstrated using PLD. Three independent indications were found for p-type conducting, phosphorus-doped ZnO nanorods: first, acceptor-related CL peaks, second, opposite transfer characteristics of back-gate field effect transistors using undoped and phosphorus doped wire channels, and finally, rectifying I-V characteristics of ZnO:P nanowire/ZnO:Ga p-n junctions. Then light emitting diodes (LEDs) based on n-ZnO nanorods combined with different technologies (hybrid technologies) are suggested and the recent electrical, as well as electro-optical, characteristics of these LEDs are shown and discussed. The hybrid LEDs reviewed and discussed here are mainly presented for two groups: those based on n-ZnO nanorods and p-type crystalline substrates, and those based on n-ZnO nanorods and p-type amorphous substrates. Promising electroluminescence characteristics aimed at the development of white LEDs are demonstrated. Although some of the presented LEDs show visible emission for applied biases in excess of 10 V, optimized structures are expected to provide the same emission at much lower voltage. Finally, lasing from ZnO nanorods is briefly reviewed. An example of a recent whispering gallery mode (WGM) lasing from ZnO is demonstrated as a way to enhance the stimulated emission from small size structures.

We investigated GaN-based heterostructures grown on three-dimensionally patterned Si(111) substrates by metal organic vapour phase epitaxy, with the goal of fabricating well controlled high quality, defect reduced GaN-based nanoLEDs. The high aspect ratios of such pillars minimize the influence of the lattice mismatched substrate and improve the material quality. In contrast to other approaches, we employed deep etched silicon substrates to achieve a controlled pillar growth. For that a special low temperature inductively coupled plasma etching process has been developed. InGaN/GaN multi-quantum-well structures have been incorporated into the pillars. We found a pronounced dependence of the morphology of the GaN structures on the size and pitch of the pillars. Spatially resolved optical properties of the structures are analysed by cathodoluminescence.

Aqueous chemical growth (ACG) is an efficient way to generate wafer-scale and densely packed arrays of ZnO nanopillars on various substrate materials. ACG is a low-temperature growth approach that is only weakly influenced by the substrate and even allows growth on flexible polymer substrates or on conducting materials. The advanced fabrication of wafer-scale and highly vertically aligned arrays of ZnO nanopillars on various substrate materials is demonstrated. Moreover, it is possible to control the morphology in diameter and length by changing the growth conditions. Photoluminescence characterization clearly shows a comparatively strong band-edge luminescence, even at room temperature, that is accompanied by a rather weak visible luminescence in the yellow/orange spectral range.

ZnO nanorods were grown on Si substrates by an aqueous chemical approach and subsequently doped by V implantation. Transmission electron microscopy and photoluminescence spectroscopy reveal a severely defective material directly after the implantation process. Subsequent annealing leads to a partial recovery of the crystal structure. The magnetic features of ZnO:V nanorods were investigated by magnetic force microscopy. Images taken of ensembles as well as of single rods clearly display contrast, which is seen as a strong indication of ferromagnetism at room temperature.