1. Electric bias-induced edge degradation of few-layer MoS2 devices
- Author
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Frank Schwierz, Alexander N. Smirnov, I. A. Eliseyev, Sebastian Thiele, Heiko O. Jacobs, Jörg Pezoldt, and Valery Yu. Davydov
- Subjects
Morphology (linguistics) ,Materials science ,business.industry ,Scanning electron microscope ,Transistor ,Substrate (electronics) ,Edge (geometry) ,law.invention ,law ,Electric field ,Optoelectronics ,Degradation (geology) ,business ,Layer (electronics) - Abstract
In this work, we experimentally investigate the effects of electric bias on the degradation of few-layer MoS2 back-gated field-effect transistors in ambient air. The devices were fabricated using mechanically exfoliated MoS2 flakes, which were transferred to a Si/SiO2 substrate by a PDMS-based transfer. We report an accelerated electric bias-induced degradation of the devices under investigation and used optical and scanning electron microscopy (SEM) to monitor changes of the morphology of the MoS2 channel. In particular, we found a linear dependency of the degradation on the electric field between the Ti/Au source and drain contacts. In addition, we identify four regions in which morphological changes occur, of which the edges of the MoS2 channel are most affected.
- Published
- 2022