Epitaxial growth of (2¯01) β-Ga2O3 on (0001) sapphire substrates by halide vapour phase epitaxy

We report on Ga 2 O 3 deposition on c-plane sapphire substrates by hydride vapour phase epitaxy using metallic gallium, hydrogen chloride and dry air as precursors. High deposition rate up to 250 µm/h has been realized. As confirmed by X-ray diffraction and micro-Raman measurements, produced films consisted of pure monoclinic β-Ga 2 O 3 phase and were (−201) oriented. The full width at half maximum (FWHM) for (−201) rocking curve was decreasing with increasing GaCl flow. The narrowest FWHM of 20 arcmin has been detected.